Systems and methods for dissolving ozone gas in a liquid. An embodiment can comprise a tank having an upper region, a lower region, and a discharge outlet, all disposed in a specified geometry. A pump can be coupled with a liquid inlet in order to receive a liquid therefrom and to deliver the liquid via a pipe to the upper region of the tank. The pump can be coupled with the lower region of the tank in order to receive the liquid from the tank and to recirculate the liquid to the upper region of the tank. The apparatus can include an ozone inlet to receive ozone into the tank. The ozone inlet can comprise a venturi inlet disposed on the pipe downstream of the pump. The liquid can be released from the tank and depressurized, thereby providing for the ozone to emerge from the liquid as gas bubbles. The released liquid can be selected for a two-stage gas and aqueous cleaning process.

Provided are a method for supplying water of specified concentration, including: a step of adding at least two liquids, a conductive first liquid and a non-conductive second liquid, to ultrapure water to produce water of specified concentration containing a first liquid-component and a second liquid-component at specified concentrations, in which a mixed solution in which the first liquid and the second liquid are mixed at a specified mixing ratio in advance is prepared; and the mixed solution is added to the ultrapure water so that a conductivity or specific resistance of the ultrapure water after the addition satisfies a specified value, and an apparatus therefor.

A mixer base assembly is provided comprising: (a) a body having an upper end including a mating face for mixing vessel connection; a lower end including a cavity; a first side wall, a second side wall, a third side wall, and a fourth side wall; an inlet port arranged in the first side wall; an outlet port arranged in the third side wall; a sampling port arranged in the fourth side wall; a probe port arranged in the third side wall; and, a fluid mixing chamber having a bottom wall; (b) an impeller seat arranged in the cavity in the lower end of the body; and, (c) a levitating magnetic impeller arranged in the impeller seat, the impeller comprising a magnet, a base, and at least two blades, wherein the at least two blades extend above the bottom wall of the fluid mixing chamber into the fluid mixing chamber.

The present disclosure provides a chemical solution preparation system and method. The chemical solution preparation system includes: a first mixing system, configured to mix a first chemical solution and a first diluent to obtain a first mixture; a second mixing system, configured to mix a second chemical solution and a second diluent to obtain a second mixture; a third mixing system, configured to mix the first mixture, the second mixture, and a third diluent to obtain a third mixture; an output system, configured to output the third mixture to a spray apparatus of the chemical mechanical polishing device; a sampling system, configured to collect a sample of the third mixture output from the output system; and a monitoring system, configured to monitor a status of the first mixture, a status of the second mixture, and a status of the third mixture.

Disclosed is a method for the batch-based manufacture of a flowable coating material, in particular water-based or solvent-containing paint, from a plurality of components. The method includes feeding batch components into a process mixing container, mixing the components in the process mixing container to form a mixture having a preliminary composition, transferring at least part of the mixture having the preliminary composition from the process mixing container into a reception container, ascertaining an actual state of the mixture having the preliminary composition during transfer into the reception container, determining a deviation of the actual state of the mixture having the preliminary composition from a predefined setpoint state, ascertaining an adjustment quantity for the components required to reach the setpoint state, and topping up the adjustment quantity of the components into the preliminary mixture, while the preliminary mixture is being transferred from the process mixing container into the reception container.

The dilute chemical solution supply device 1 comprises: a dilute chemical solution preparation unit 2 that prepares a dilute chemical solution W1; a reservoir 3 for the prepared dilute chemical solution; a dilute chemical solution adjustment/supply mechanism 4 that supplies, as washing water W2, the dilute chemical solution W1 stored in the reservoir 3 to a plurality of single-wafer type washers 5A, 5B, and 5C; and a return mechanism that is connected to each of the single-wafer type washers 5A, 5B, and 5C and refluxes excess water from the single-wafer type washers to the reservoir 3. According to such a dilute chemical solution supply device, it is possible to accurately adjust the concentration of the solute of the dilute chemical solution and suppress the discharge of excess water, and the dilute chemical solution supply device is thus suitable for washing of wafers, etc.

Embodiments of the present application provide a liquid supply system and a liquid supply method. The liquid supply system includes: a mixing tank, the mixing tank being connected to at least a first injection pipe, a second injection pipe and a replenishing pipe; the first injection pipe and the second injection pipe being configured to inject a first liquid and a second liquid into the mixing tank respectively, so as to form a mixed liquid; a parameter acquisition module configured to acquire a concentration of the first liquid in the mixed liquid; and a treatment module configured to control, based on the acquired concentration of the first liquid and a preset concentration of the first liquid, the replenishing pipe to inject the first liquid with a first flow rate into the mixing tank, or inject the second liquid with a second flow rate into the mixing tank.

The present application discloses a ozonated water delivery system which includes at least one contacting device in communication with at least one ultrapure water source configured to provide ultrapure water, at least one ultrapure water conduit coupled to the ultrapure water source, at least one solution in communication with the contacting device and the ultrapure water source via the ultrapure water conduit, one or more gas sources containing at least one gas in communication with at least one of the ultrapure water source, the ultrapure water conduit, and the solution conduit, at least one mixed gas conduit in communication with the at gas source and the contacting device and configured to provide at least one mixed gas to the contacting device, and at least one ozonated water output conduit may be in communication with the contacting device.

The present disclosure provides a method for generating a solution, comprising receiving a solution order. The solution order may comprise one or more order parameters for the solution. The solution order may be inputted into a trained algorithm that outputs one or more solution parameters for the solution. The one or more solution parameters may be used to generate the solution comprising a liquid from a plurality of liquids and a solid from a plurality of solids. The solution can meet the one or more order parameters at an accuracy of at least 90%. The solution may be dispensed.

The present inventive concept relates to a system for dissolving gas. Specifically, an embodiment of the present inventive concept provides a system for dissolving gas, the system including a water supply unit configured to supply water, a gas supply unit configured to supply gas, a gas solution generation unit connected to the water supply unit and the gas supply unit, and a bubble gas solution generation unit connected to a rear end of the gas solution generation unit, wherein the gas solution generation unit includes a first gas solution generator connected in parallel to the gas supply unit and configured to generate a first gas solution and at least one second gas solution generator connected in parallel to the gas supply unit, connected in series to the first gas solution generator to receive the first gas solution from the first gas solution generator, and configured to generate a second gas solution having a gas concentration higher than a gas concentration of the first gas solution, and the bubble gas solution generation unit is connected to the second gas solution generator to receive the second gas solution from the second gas solution generator and generates a third gas solution containing a gas whose particles are smaller than particles of the gas contained in the second gas solution.