Provided herein is a method and a device for continuous synthesis of graphene. The device includes a container having a space for holding a carbon source, wherein the container has an entry opening for receiving the carbon source material, at least two electrodes for applying an electrical current through the space for joule heating the carbon source, wherein the space for joule heating the carbon source is between the at least to electrodes, and a movement component for moving the carbon source, with respect to the container, into the entry opening in a first direction and the at least two electrodes apply the electrical current in a second direction, wherein the first direction is not the same as the second direction.

Apparatus and systems describe a plasma source to generate cold plasma solution for use in hospital, home, office, and other locations. The plasma source employs air, gas, and/or vapor discharging in a high voltage electric field, which interact to obtain plasma solution for oral health. The plasma source may include power supply, plasma generator, liquid container, liquid aerosolizer/vaporizer or liquid disturber, reservoir, collector, and intelligent control center.

A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.

A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.

Method for transforming a gas mixture into a gas mixture of higher added value, comprising a step of injecting a gas mixture into a pulsed plasma reactor, a dissociation step using pulsed discharges to generate a shock wave between two electrodes to produce gases, and a step of releasing the produced gases to an area where they can be cooled down and/or separated and/or collected. The dissociation step is also designed to provide passive re-ignition of the plasma in the event that the latter is blown out by the continuous stream of gas in the reactor.

Methods and apparatus for producing chemical nanostructures having multiple elements, such as boron and nitride, e.g. boron nitride nanotubes, are disclosed. The method comprises creating a plasma jet, or plume, such as by an arc discharge. The plasma plume is elongated and has a temperature gradient along its length. It extends along its length into a port connector area having ports for introduction of feed materials. The feed materials include the multiple elements, which are introduced separately as fluids or powders at multiple ports along the length of the plasma plume, said ports entering the plasma plume at different temperatures. The method further comprises modifying a temperature at a distal portion of or immediately downstream of said plasma plume; and collecting said chemical nanostructures after said modifying.

A conductive honeycomb structure includes: a pillar honeycomb structure portion including an outer peripheral side wall and partition walls, each of the partition walls extending through the pillar honeycomb structure from a first end face to a second end face to define a plurality of cells forming a through channel of a first fluid; a pair of electrode portions disposed in contact with an outer surface of the outer peripheral side wall across a central axis of the honeycomb structure portion; and a pair of terminal connecting portions formed on the outer peripheral side wall, each of the terminal connecting portions being at least partially covered with each of the electrode portions. Each of the electrode portions includes band-shape first, second and third electrode layers each having a predetermined electrical resistance.

Methods and apparatus for producing chemical nanostructures having multiple elements, such as boron and nitride, e.g. boron nitride nanotubes, are disclosed. The method comprises creating a plasma jet, or plume, such as by an arc discharge. The plasma plume is elongated and has a temperature gradient along its length. It extends along its length into a port connector area having ports for introduction of feed materials. The feed materials include the multiple elements, which are introduced separately as fluids or powders at multiple ports along the length of the plasma plume, said ports entering the plasma plume at different temperatures. The method further comprises modifying a temperature at a distal portion of or immediately downstream of said plasma plume; and collecting said chemical nanostructures after said modifying.

A plasma chemical reactor including an anode having a generally cylindrical shape and an axis of rotational symmetry; a cathode inside the anode and co-axial with the anode; a hot plasma channel between the between the anode and the cathode; a gas input module providing gas flow into the anode; a gas output module at a distal end of the anode; and a high voltage power supply providing with a current in a range of 0.1-1.0 A. The high voltage power supply provides a voltage to the cathode in a range of 0-5 kV, a power of at least 1 kW, and a voltage/current ratio of at least 1000 V/A.

A plasma gate device comprises a housing, a gas inlet, first and second dielectrics, and first, second, and third electrodes. The housing includes an internal reactor chamber. The gas inlet receives a source gas that flows to the reactor chamber. The first and second dielectrics are spaced apart from one another, with each dielectric including an upper surface and a lower surface. The two dielectrics are oriented such that the lower surface of the first dielectric faces the upper surface of the second dielectric. The first and second dielectrics form boundaries of the reactor chamber. The first electrode receives a first electric voltage. The second electrode receives a second electric voltage. The first and second electric voltages in combination generate an electric field in the reactor chamber through which the source gas flows creating a positive ion plasma and a cloud of electrons. The third electrode attracts the electrons.