In a system for depositing a matrix film by nebulizing a matrix solution to a sample plate on which a sample is placed, a chamber is filled with a dry gas by supplying the dry gas into the chamber in a state where the sample plate is housed in the chamber (step S12), thereafter, the supply of the dry gas to the chamber is stopped (step S14), and in this state, a solution containing a matrix substance used for a matrix-assisted laser desorption/ionization method is nebulized toward the sample plate (step S15). As a result, it is possible to enhance the extraction efficiency of the measurement target component in the sample into the matrix solution while suppressing the size of the crystal particles formed on the sample plate, and it is possible to stably achieve high spatial resolution and high detection sensitivity in mass spectrometry imaging.

An electronically regulatable metering pump for use in an automatic washing installation is regulated based on a desired specification of the washing installation and depending on detected sensor data and is configured to deliver a volume flow of the additive such that, when the additive is admixed with the washing fluid, a desired application concentration is provided for feeding into an operating assembly of the washing installation.

A method of controlling a flow rate includes selecting an operating condition defined by an operating flow rate and an operating pressure, comparing the operating flow rate to a threshold flow rate, and executing an adaptive calibration routing if the operating flow rate is greater than or equal to the threshold flow rate. The adaptive calibration routine includes measuring the operating pressure, measuring a first flow rate through a first meter, and modifying a pressure-flow table based on the operating pressure and the first flow rate.

By measuring chemical concentrations of a crop protection fluid based on light transmission through the fluid, chemical concentrations may be determined and more effectively maintained during spray applications. A closed loop control system may be implemented to adjust the amount of chemical being metered based on the amount of light transmitted through the fluid such that an effective concentration may be continuously maintained without operator intervention.

Provided are a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a substrate support portion supporting a substrate, a first discharge unit including a first nozzle discharging a first processing liquid to the substrate, a first measurement unit connected to the first nozzle and measuring a first amount of charges of the first processing liquid discharged from the first nozzle, a bowl disposed around the substrate support portion, a second measurement unit measuring a second amount of charges of the first processing liquid scattered from the substrate to the surface of the bowl, and a second discharge unit including a second nozzle discharging a second processing liquid charged based on a difference between the first amount of charges and the second amount of charges to the substrate.

A method of controlling a flow rate includes selecting an operating condition defined by an operating flow rate and an operating pressure, comparing the operating flow rate to a threshold flow rate, and executing an adaptive calibration routing if the operating flow rate is greater than or equal to the threshold flow rate. The adaptive calibration routine includes measuring the operating pressure, measuring a first flow rate through a first meter, and modifying a pressure-flow table based on the operating pressure and the first flow rate.