A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.

The present disclosure relates to catalytic static mixers comprising catalytic material. The static mixers can be configured for use with continuous flow chemical reactors, for example tubular continuous flow chemical reactors for heterogeneous catalysis reactions. This disclosure also relates to processes for preparing static mixers. This disclosure also relates to continuous flow chemical reactors comprising the static mixers, systems comprising the continuous flow chemical reactors, processes for synthesising products using the continuous flow reactors, and methods for screening catalytic materials using the static mixers.

A carrying device includes a swivel that swivels around a central axis line of a revolution orbit that passes through a workpiece transfer area and a workpiece work area for a workpiece to be worked on by a robot, multiple workpiece holders positioned on the swivel such that when a first one of the workpiece holders is positioned in the workpiece transfer area, a second one of the workpiece holders is positioned in the workpiece work area, a revolution driver that causes the swivel to swivel around the central axis line of the revolution orbit, and a tilting driver that tilts each of the workpiece holders with respect to the central axis line of the revolution orbit.

Systems and methods for semiconductor fabrication are described. A spin coater comprises a spin chuck, a nozzle, a nozzle housing, a purge gas supply, and an organic solvent supply. The nozzle housing includes a lower housing including a solvent storage groove in which the organic solvent is stored, and an upper housing on the lower housing. The upper housing includes a nozzle insert hole on the solvent storage groove and receives the nozzle, and a gas supply hole connected to one side of the nozzle insert hole.

A cleaning device includes: a treatment container; a workpiece carrier arranged in the treatment container and configured to hold at least one workpiece; at least one nozzle configured to discharge a cleaning jet directed onto the workpiece carrier and mounted such that the at least one nozzle is moveable on a circulation track about the workpiece carrier and is pivotable about a pivoting axis extending parallel to an axis of rotation of the workpiece carrier; a pivoting device configured to pivot the at least one nozzle; and a controller configured to control a circulating movement of the at least one nozzle on the circulation track and a pivoting movement of the at least one nozzle, such that a specified point on a surface of the workpiece is impacted repeatedly by the cleaning jet at a respectively different angle, within a specified timeframe.

A holding mechanism holds a substrate horizontally. A rotation mechanism rotates the holding mechanism holding the substrate. A nozzle supplies a processing liquid to the substrate. A nozzle arm holds the nozzle. An arm actuation mechanism moves the nozzle arm between a processing position overlapping the substrate in plan view and a retracted position displaced from the substrate in plan view. A cup portion is disposed around the holding mechanism, and receives the processing liquid from the substrate. A cup actuation mechanism moves the cup portion up and down between an upper position and a lower position. A first container is fixed to the cup portion to be movable up and down integrally with the cup portion, and can accommodate the nozzle at the retracted position.

The invention relates to a system and to a method for coating workpieces using a coating device, which is designed to apply a metal coating to a surface of the workpiece. According to the invention, it is provided that a plurality of coating devices, which are designed as identical coating modules, are provided and are arranged in a module group, that an input measuring station is assigned to the module group, by means of which station a surface of the face of the workpiece to be coated can be detected, that a conveying apparatus is provided, by means of which a workpiece can be supplied to one of the coating modules from the input measuring station, and that an output measuring station is assigned to the module group, by means of which station a surface of the coated face of the workpiece can be detected.

A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method, includes mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution to the substrate.

A portable pool filter cleaning assembly is configured to retain a pool filter on support rod and allow the pool filter to spin from a spray of water. The spinning filter releases debris from the filter surface through centrifugal force. The assembly has drainage features to ensure proper drainage of water collected within the interior of the pool filter and enable proper spinning from the spray of water. The assembly utilizes a support rod with a bottom filter retainer that is conical in shape for engaging with the pool filter aperture. The bottom filter retainer may further have a bearing that enables the pool filter to rotate freely about the rod with very little force. The assembly may include a stand for securing the support rod on a hard surface, such as concrete or on an uneven lawn surface.

Provided are a substrate treatment apparatus and method for treating a substrate while preventing the surface of the substrate from drying out. The substrate treatment method includes: moving a first nozzle to above a first point on a substrate; ejecting a first substrate treatment liquid onto the substrate from the first nozzle; moving a second nozzle to above the first point; and ejecting a second substrate treatment liquid onto the substrate from the second nozzle, wherein the second nozzle is positioned above a second point on the substrate before moving to above the first point.