A compact container having a contamination-preventing cooling plate, includes: a discharge mechanism, inside the compact container, for discharging cosmetics; a discharge plate having a discharge hole and a coupling groove formed in the center thereof; and the cooling plate, which is coupled to the upper part of the discharge plate, has an outlet formed in the center thereof, and is made from a metal material. A contamination guard plate is coupled to the coupling groove of the discharge plate so as to block most of the outlet of the cooling plate while leaving only a discharge gap. The contamination guard plate blocks the outlet of the cooling plate, excluding the discharge gap, so as to prevent bacteria or contaminants from entering the outlet from the puff, and the cooling plate, which is made from the metal material, lowers the temperature of the discharged cosmetics.

The disclosure relates to a cleaning device for cleaning a nozzle applicator, which is designed for applying a coating agent to a component and has a plurality of application nozzles in a nozzle region in order to discharge the coating agent through the application nozzles during application in an application direction. The cleaning device comprises a rinsing agent supply for supplying a rinsing agent for cleaning the nozzle applicator, and a docking interface for docking the nozzle applicator to be cleaned to the cleaning device. The disclosure provides that the docking interface is configured to flush the rinsing agent into the nozzle applicator through the application nozzles of the nozzle applicator in a direction opposite to the normal application direction. Furthermore, the disclosure comprises a corresponding cleaning method.

The disclosure relates to a cleaning device for cleaning a nozzle applicator, which is designed for applying a coating agent to a component and has a plurality of application nozzles in a nozzle region in order to discharge the coating agent through the application nozzles during application in an application direction. The cleaning device comprises a rinsing agent supply for supplying a rinsing agent for cleaning the nozzle applicator, and a docking interface for docking the nozzle applicator to be cleaned to the cleaning device. The disclosure provides that the docking interface is configured to flush the rinsing agent into the nozzle applicator through the application nozzles of the nozzle applicator in a direction opposite to the normal application direction. Furthermore, the disclosure comprises a corresponding cleaning method.

An apparatus for cleaning airless sprayers having an upwardly open container for receiving fresh water, as well as an inlet connectable to a water supply, and is characterized in that the container has a level control by means of which the level of the fresh water in the container can be maintained at a predetermined value, and in that the inlet opens into at least one nozzle, by means of which fresh water can be discharged in a directed manner into the interior of the container.

An apparatus for cleaning airless sprayers having an upwardly open container for receiving fresh water, as well as an inlet connectable to a water supply, and is characterized in that the container has a level control by means of which the level of the fresh water in the container can be maintained at a predetermined value, and in that the inlet opens into at least one nozzle, by means of which fresh water can be discharged in a directed manner into the interior of the container.

The present disclosure relates to a nozzle block applied to an electrospinning device, which includes a radiation nozzle having a hollow radiation needle for discharging a spinning solution to the outside; a means of piercing having a diameter smaller than that of the radiation needle, at least one of which is coaxially disposed inside the radiation needle; and a reciprocating mechanism for reciprocating the means of piercing and the radiation needle relative to each other, thereby preventing the solution from being solidified at the tip of the radiation nozzle or the radiation nozzle from being blocked by external contaminants even if the electrospinning process is temporarily interrupted in the middle.

According to the present disclosure, there is provided a coating determining device of a coating head that can prevent coating defect caused by clogging in multiple successive coatings. The coating determining device according to the present disclosure can determine a coating state of the coating head, wherein the coating head having a plurality of nozzles for ejecting paint, the plurality of nozzles being configured to eject the paint out of the nozzles so as to coat a workpiece with the ejected paint while moving in a direction, the coating determining device of the coating head being characterized by comprising: an image acquiring unit for acquiring an image of the coated workpiece; and a determination unit for determining, based on the image acquired by the image acquiring unit, whether coating the workpiece is implemented normally.

Methods and apparatus are provided for washing pipette tips, including the inside and outside of the pipette tip. Pipette wash devices comprise a main body comprising a wash chamber, a liquid channel, a gas channel, and a nozzle cavity, and a nozzle for providing a washing mist is positioned in the nozzle cavity and fluidically connected with the liquid channel and the gas channel. Methods of washing a pipette tip include inserting a pipette tip in a wash chamber; spraying a mist on an outside surface of the pipette tip; and blowing pressurized air or inert gas on the outside surface of the pipette tip, thereby washing and drying the pipette. Methods of washing a pipette tip also include passing one or more series of liquid slugs separated by gaseous gaps through the inside of the pipette tip.

A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.

A swirler-ferrule assembly includes a radial swirler, a ferrule, a fuel nozzle, and a surface feature. The radial swirler includes a primary swirler vane having a primary air passage and a secondary swirler vane having a secondary air passage. The ferrule may be connected to the radial swirler. The surface feature may be located on the primary swirler vane and/or the ferrule. The surface feature may be configured to direct an air flow through the primary air passage away from a recirculation zone located upstream of the primary swirler vane. The surface feature has a trailing end and a distal end, and the fuel nozzle is axially aligned with the trailing end of the surface feature or is located axially downstream of the trailing end of the surface feature. The surface feature may have a plurality of grooves.