B05B3/085

Cleaning device for atomizing and spraying liquid in two-phase flow

A cleaning device for atomizing and spraying liquid in two-phase flow comprising a nozzle provided with multiple liquid bypass pipelines each having liquid guiding outlets inclined at a predetermined angle and an exhaust mesh plate having vertical gas guiding outlets, which makes the high speed liquid flow and high speed gas flow sprayed out therefrom collide against each other sufficiently to form ultra-micro atomized particles with uniform and adjustable size. The ultra-micro atomized particles are sprayed out downwardly to the wafer surface under the acceleration and vertical orientation effects of an atomized particle guiding outlet to perform a reciprocating cleaning for the wafer. Other components such as an ultrasonic or megasonic generation unit, a gas shielding unit, a self-cleaning unit or a rotating unit can also be provided to perform the multifunction of the nozzle.

Air assistance and drift reduction technology for controlled droplet applicator

A controlled droplet applicator (CDA) system comprising a CDA nozzle cup having an open end; a shroud covering all but a portion of the open end; and an air assist device disposed proximal to the open end, the cup and the air assist device separated by at least a portion of the shroud.

Rotatable shroud for directional control of application area

A controlled droplet application (CDA) nozzle has a CDA nozzle cone having a first axis of rotation in a first position and, after adjustment, a second axis of rotation in a second position orthogonal to the first. A rotationally adjustable directional shroud surrounds at least a portion of the cone, the directional shroud blocking at least a portion of a lip of the cone regardless of whether the cone is positioned in the first or second axis of rotation.

SPREADER ASSEMBLY

A spreader assembly for spreading sand or salt comprised of a molded, double-walled hopper having a bin portion and leg portions. The hopper has an inner wall and an outer wall, wherein the inner wall has a front end section and opposing side sections. The end sections and the side sections define a media-holding chamber within the bin portion of the hopper. The chamber has a generally rectangular upper portion, a funnel-shaped lower portion and a bottom having an opening extending through the bin portion. The funnel-shaped lower portion of the chamber slopes toward the opening. The outer wall of the hopper defines the leg portions, and the leg portions are dimensioned to extend below the opening in the bin portion.

Rotatable Shroud for Directional Control of Application Area
20170181421 · 2017-06-29 ·

A controlled droplet application (CDA) nozzle has a CDA nozzle cone having a first axis of rotation in a first position and, after adjustment, a second axis of rotation in a second position orthogonal to the first. A rotationally adjustable directional shroud surrounds at least a portion of the cone, the directional shroud blocking at least a portion of a lip of the cone regardless of whether the cone is positioned in the first or second axis of rotation.

CLEANING DEVICE FOR ATOMIZING AND SPRAYING LIQUID IN TWO-PHASE FLOW
20170170035 · 2017-06-15 ·

A cleaning device for atomizing and spraying liquid in two-phase flow comprising a nozzle provided with multiple liquid bypass pipelines each having liquid guiding outlets inclined at a predetermined angle and an exhaust mesh plate having vertical gas guiding outlets, which makes the high speed liquid flow and high speed gas flow sprayed out therefrom collide against each other sufficiently to form ultra-micro atomized particles with uniform and adjustable size. The ultra-micro atomized particles are sprayed out downwardly to the wafer surface under the acceleration and vertical orientation effects of an atomized particle guiding outlet to perform a reciprocating cleaning for the wafer. Other components such as an ultrasonic or megasonic generation unit, a gas shielding unit, a self-cleaning unit or a rotating unit can also be provided to perform the multifunction of the nozzle.

Rotatable shroud for directional control of application area

A controlled droplet application (CDA) nozzle has a CDA nozzle cone having a first axis of rotation in a first position and, after adjustment, a second axis of rotation in a second position orthogonal to the first. A rotationally adjustable directional shroud surrounds at least a portion of the cone, the directional shroud blocking at least a portion of a lip of the cone regardless of whether the cone is positioned in the first or second axis of rotation.

Spreader assembly

A spreader assembly for spreading sand or salt comprised of a molded, double-walled hopper having a bin portion and leg portions. The hopper has an inner wall and an outer wall, wherein the inner wall has a front end section and opposing side sections. The end sections and the side sections define a media-holding chamber within the bin portion of the hopper. The chamber has a generally rectangular upper portion, a funnel-shaped lower portion and a bottom having an opening extending through the bin portion. The funnel-shaped lower portion of the chamber slopes toward the opening. The outer wall of the hopper defines the leg portions, and the leg portions are dimensioned to extend below the opening in the bin portion.

Generation and spraying of microscopic water droplets

A method and system for generating and spraying massive amounts of microscopic water droplets with moderate power consumption; according to said method and system a body of water is subjected to fast rotation, and to associated centrifugal acceleration, which gives rise to strong hydrostatic pressure forcing said water to pass through dense microscopic meshes, so that from each hole in said meshes emanates a micro-jets of water; said micro-jets of water keep accelerating in the direction of centrifugal force and break up into a cloud of said microscopic droplets; forced air flow applied to said droplets pushes them out to the free atmosphere; ultrasonic cleaning, integrated into the main operational cycle, removes deposition constituents from the surface of said meshes, preventing their clogging and possible disruption of generation of said water droplets.