Disclosed is a mixed jet flow fire extinguishing system, including a water spray nozzle and a powder spray nozzle. A water spray port of the water spray nozzle and a powder spray port of the powder spray nozzle do not overlap; super absorbent resin powder sprayed from the powder spray nozzle is externally mixed in the air with a water flow sprayed from the water spray nozzle. A powder spray direction A of the powder spray nozzle is inclined relative to a water flow spray direction B of the water spray nozzle. The technical bottleneck of using sodium polyacrylate resin powder as a fire extinguishing agent in the prior art is solved, so that the sodium polyacrylate resin powder can be smoothly and continuously sprayed into a fire, without blocking the powder spray port.

A cleaning device for selectively bombarding a surface with a media sequence, the sequence including at least a first gaseous medium and a second liquid medium, includes a nozzle configured to bombard the surface with the second medium; a cleaning valve with a holding port, a pressure port, a plunger, and a pressure outlet; and a high-pressure accumulator configured to store the first medium. The first medium is loaded with an accumulator pressure. The cleaning device further includes a changeover valve configured to selectively create a connection between a first medium supply line and a holding line connected to the holding port. The pressure outlet is configured to bombard the surface with the first medium in pulse-like fashion.

The disclosure relates to a nozzle device for emitting an emission medium onto a component, preferably for emitting the emission medium onto two side faces and preferably an end face of a fold, an edge or a transition joint of the component. The nozzle device comprises an opening configuration for emitting the emission medium and is distinguished particularly in that the opening configuration comprises at least two openings for emitting at least two jets of the emission medium and the at least two openings are oriented inwardly so that the at least two jets approach one another toward the emission side.

The present disclosure provides a spray device and a cleaning apparatus. The spray device includes an atomization structure, which is configured to atomize a cleaning liquid when the cleaning liquid is sprayed to form liquid droplets, and a jet structure, which is configured to spray a gas along a determined direction to cause the gas sprayed to collide with the liquid droplets to form atomized particles. The spray device provided by the present disclosure may increase cleaning uniformity and cleaning efficiency to improve cleaning process results, and may further reduce an impact force to the to-be-cleaned surface by the liquid droplets to a certain level. Thus, the damage to a surface pattern of a wafer may be reduced.

A spray mist assist assembly for a liquid sprayer utilizes an auxiliary blower positioned below the sprayer's nozzle. The positioning of the blower in vertical alignment with but in vertically spaced relation below the nozzle permits the mist expelled from the nozzle to extend farther from the sprayer to enhance the performance of the sprayer.

The present invention relates to a spray apparatus and a method for controlling the spray apparatus in a system for controlling special effects in a 4D movie theater that are configured to spray water therefrom to provide rain and wind special effects, and more particularly, to a spray apparatus and a method for controlling the spray apparatus that are configured to drain the residual water remaining therein to the outside just after driving stops, while being engagedly operated with a content reproduced in a movie theater to provide rain and wind special effects for customers.

In a spraying process for coating a substrate with a substance atomised in a stream of gas, a spray head is used to generate a stream of gas that acts upon the substrate. The substance is present in a syringe-like application container equipped with an application tip. The application tip of the application container containing the substance is introduced into the stream of gas outside the spray head at a distance therefrom and transversely with respect to the main direction of flow of the stream of gas, and the substance is introduced from the application container into the stream of gas at that location.

Systems and methods for producing consistent spray patterns and for diminishing clogging experienced when applying spray adhesive from a spray gun are provided. One system includes an automatic non-atomizing spray valve operably coupled to a first and second flow valve. The spray and flow valves are electronically controlled using logic running on a processing unit. The logic is programmed to carry out a spray cycle that involves dispensing a first liquid from the spray valve (first phase) and then dispensing a second liquid through the same spray valve (second phase). Because the first liquid (e.g., water-based adhesive) has the potential to clog a nozzle of the spray valve, a short burst of the second liquid (e.g., cleaning fluid) is introduced to prevent the nozzle from clogging. The spray valve is configured as a pulse width modulated spray gun to further reduce clogging and to generate an evenly distributed spray pattern.

A cleaning device for selectively bombarding a surface with a media sequence, the sequence including at least a first gaseous medium and a second liquid medium, includes a nozzle configured to bombard the surface with the second medium; a cleaning valve with a holding port, a pressure port, a plunger, and a pressure outlet; and a high-pressure accumulator configured to store the first medium. The first medium is loaded with an accumulator pressure. The cleaning device further includes a changeover valve configured to selectively create a connection between a first medium supply line and a holding line connected to the holding port. The pressure outlet is configured to bombard the surface with the first medium in pulse-like fashion

The present disclosure provides a spray device and a cleaning apparatus. The spray device includes an atomization structure, which is configured to atomize a cleaning liquid when the cleaning liquid is sprayed to form liquid droplets, and a jet structure, which is configured to spray a gas along a determined direction to cause the gas sprayed to collide with the liquid droplets to form atomized particles. The spray device provided by the present disclosure may increase cleaning uniformity and cleaning efficiency to improve cleaning process results, and may further reduce an impact force to the to-be-cleaned surface by the liquid droplets to a certain level. Thus, the damage to a surface pattern of a wafer may be reduced.