The invention relates to a method for reducing end face stickiness of a roll (1) of adhesive tape, by supplying a precursor (18) to a plasma stream (20), using the plasma stream (20) enriched with the precursor (18) to coat a carrier film (2) with a passivation coat (3) in a plasma process, placing a carrier film section (5) by its passivation-coated side onto an end face (4) of the roll (1) of adhesive tape, removing the carrier film section (5) and leaving at least part of the passivation coat (6) on the end face (4) and reducing its end face stickiness.

A water-resistant film layer, a preparation method therefor, and a product. The water-resistant film layer is formed on a surface of a substrate by one or more compounds shown in general formula (I) by means of a plasma chemical vapor deposition method, i.e., R.sub.1R.sub.2═R.sub.3R.sub.4(I), wherein R.sub.1 and R.sub.2 are each independently selected from one of a group consisting of hydrogen, alkyl, halogen, haloalkyl, and aryl, at least one of R.sub.1, R.sub.2, and R.sub.3 is halogen, and R.sub.4 is a hydrophobic functional group, typically having a fluorine-containing alky structure.

##STR00001##

The specific embodiment of the present disclosure provides a protective coating. An anticorrosive coating having a compact rigid molecular structure is formed by plasma polymerization coating of monomers including alicyclic epoxy structural units, and a hydrophobic coating is simultaneously formed by plasma polymerization coating on the anticorrosive coating, thus, coatings with excellent protective performance to the substrate are formed.

The present application relates to a plasma polymer thin film and a method for preparing the same, the plasma polymer thin film prepared using a first precursor material represented by the following Chemical Formula 1:

##STR00001##

(In Chemical Formula 1,

R.sub.1 to R.sub.9 are each independently H or a C.sub.1-C.sub.5 substituted or unsubstituted alkyl group, and when R.sub.1 to R.sub.9 are substituted, the substituent is an amino group, a hydroxyl group, a cyano group, a halogen group, a nitro group, or a methoxy group).

A method of patterning a substrate. The method may include providing a cavity in a layer, disposed on the substrate, the cavity having a first length along a first direction and a first width along a second direction, perpendicular to the first direction, and wherein the layer has a first height along a third direction, perpendicular to the first direction and the second direction. The method may include depositing a sacrificial layer over the cavity in a first deposition procedure; and directing angled ions to the cavity in a first exposure, wherein the cavity is etched, and wherein after the first exposure, the cavity has a second length along the first direction, greater than the first length, and wherein the cavity has a second width along the second direction, no greater than the first width.

The invention provides a method for detecting one or more analytes, the method comprising: providing a substrate comprising a semiconductor with a porous surface, wherein the porous surface is coated with a fluorocarbon polymeric coating; contacting the porous surface with a fluid or object so that the one or more analytes are retained on the substrate when present in the fluid or on the object; and analysing the substrate by mass spectrometry to detect the one or more analytes if present on the substrate.

An apparatus and to a method for treating layers using a plasma zone sealed from the outer atmospheric pressure are provided. The apparatus and method include a plasma reactor including a substrate carrier in form of a container receiving means, and a closing element that is joined with the substrate carrier by means of a lifting device.

A suspension coating system using an atmospheric pressure plasma generator includes a support that fixedly supports a substrate, a plasma generator that generates active species through plasma discharge, and includes a nozzle unit of which at least a portion is disposed to face the substrate, and a suspension providing device that transfers a suspension including nanoparticles and a binder to one side of the nozzle unit.

Apparatuses and methods for depositing materials on both sides of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition. Also provided are substrates having materials deposited on both sides that may be fabricated by the methods and apparatuses.

The present disclosure relates to coated non-metallic substrates and coated metallic substrates, and methods for producing such coated substrates. A variant of the method is characterized in that a mat or glossy coating is underneath a metallic layer obtained in some cases by way of vapor deposition and/or sputtering. In another variant, the metallic is sufficiently thin so that it remains transparent or translucent to visible light. The coated substrates may include multiple layers such as metallic layers, polysiloxane layers, a color layer, a conversion layer, a primer layer, and/or a transparent or colored layer. An application system for applying a metallic layer to at least one surface of a substrate may include a plasma generator and/or a corona system for treating one or more layers by plasma treatment and/or corona treatment.