An ultraviolet curing apparatus having: a roller for guiding a film coated with a resin; a first nitrogen gas introduction port and a second nitrogen gas introduction port for introducing nitrogen gas; a UV irradiation portion for irradiating the film with ultraviolet rays from between the first nitrogen gas introduction port and the second nitrogen gas introduction port; an oxygen concentration meter for measuring an oxygen concentration between the film and the UV irradiation portion; an air introduction port for introducing air between the film and the UV irradiation portion; and a controller for controlling at least any one of: an amount of air introduced from the air introduction port, an amount of nitrogen gas introduced from the first nitrogen gas introduction port, and an amount of nitrogen gas introduced from the second nitrogen gas introduction port, so that the oxygen concentration is within a preset oxygen concentration set range.

A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A.sup.1 and A.sup.2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L.sup.2 represents —S—, —NR—, or —NA.sup.22-, wherein A.sup.22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom. ##STR00001##

An ultraviolet device is provided, which includes a gas jetting module, a flow rate adjustment module, an ultraviolet module and a first gas channel. The gas jetting module includes an upper panel, a lower panel and a frame. The upper panel is disposed on the upper side of the frame. The lower panel is disposed on the lower side of the frame and includes one or more gas outlets. A gas chamber is formed between the upper panel, lower panel and frame. The first gas channel is connected to the gas jetting module. The flow rate adjustment module is connected to the first gas channel and adjusts the flow rate of the gas inputted into the gas chamber via the first gas channel. The ultraviolet module includes an ultraviolet light source and is connected to the gas jetting module.

A system for manufacturing a thermoplastic prepreg includes a double belt mechanism that is configured to compress a fiber mat, web, or mesh that is passed through the double belt mechanism, a resin applicator that is configured to apply monomers or oligomers to the fiber mat, web, or mesh, and a curing oven that is configured to effect polymerization of the monomers or oligomers and thereby form the thermoplastic polymer as the fiber mat, web, or mesh is moved through the curing oven. The double belt mechanism compresses the fiber mat, web, or mesh and the applied monomers or oligomers as the fiber mat, web, or mesh is passed through the curing oven so that the monomers or oligomers fully saturate the fiber mat, web, or mesh. Upon polymerization of the monomers or oligomers, the fiber mat, web, or mesh is fully impregnated with the thermoplastic polymer.

Disclosed are silicon and carbon containing film forming compositions comprising a polycarbosilazane polymer or oligomer formulation that consists of silazane-bridged carbosilane monomers, the carbosilane containing at least two —SiH.sub.2— moieties, either as terminal groups (—SiH.sub.3R) or embedded in a carbosilane cyclic compound, wherein R is H, a C.sub.1-C.sub.6 linear, branched, or cyclic alkyl- group, a C.sub.1-C.sub.6 linear, branched, or cyclic alkenyl- group, or combination thereof. Also disclosed are methods of forming a silicon and carbon containing film comprising forming a solution comprising a polycarbosilazane polymer or oligomer formulation and contacting the solution with the substrate via a spin-on coating, spray coating, dip coating, or slit coating technique to form the silicon and carbon containing film.

Methods for treating cellulosic materials comprising introducing a liquid treating composition into the cellulosic material, the treating composition comprising a solution prepared from at least: (i) one or more of a copper amine complex or copper ammine complex, such as copper tetraamine carbonate, (ii) one or more of ammonia or a water-soluble amine and (iii) water; and exposing the cellulosic material provided thereby to carbon dioxide and/or carbonic acid to provide treated cellulosic material, and treated cellulosic materials prepared thereby.

A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH-POSS) nanoparticles.

A reactor for coating a device is provided. The reactor comprises a hollow body and a port. The hollow body is for supporting the device. The port is in fluid communication with the hollow body for exchanging a coating fluid. In use, the device is moveable within the hollow body from a stacked orientation to an unstacked orientation. Processes for coating devices and systems thereof are also provided.

A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH—POSS) nanoparticles.

A method of manufacturing a film includes disposing a substrate under one side of a baffle plate in a film manufacturing space, the baffle plate having a plurality of through-holes, and spraying an inert gas toward the substrate through a plurality of nozzle tips branched from a gas distribution pipe that is disposed over an other side of the baffle plate such that the inert gas penetrates the baffle plate through the through-holes.