The present invention provides a multilayer structure that has excellent gas barrier properties and an excellent peel strength between a base and a gas barrier layer after retorting, and that can retain a good appearance with no delamination even after retorting under stress. The present invention also provides packaging materials and products including such a multilayer structure. The present invention relates to a multilayer structure comprising a base (X), a layer (Z) stacked on the base (X), and a layer (Y) stacked on the layer (Z), the layer (Y) containing a reaction product (D) of an aluminum-containing metal oxide (A) and an inorganic phosphorus compound (BI), the layer (Z) containing a polyvinyl alcohol resin (C) and a polyester resin (L).

A liquid repellent structure includes a surface to which liquid repellency is to be imparted, and a liquid repellent layer formed on the surface. In the structure: the liquid repellent layer contains a binder resin containing a fluorine-containing resin, and a filler dispersed in the binder resin; the filler contains a first filler having a BET specific surface area M of 100 m.sup.2/g to 400 m.sup.2/g; and the ratio M/F of the BET specific surface area M of the first filler to a mass F (mass %) of the fluorine-containing resin relative to the total mass of the liquid repellent layer is 4.1 to 20.0.

A film comprising a perforated layer, wherein the perforated layer is characterized by water vapor transmission rate (WVTR) of at least 300 gr/m2/day; and wherein the perforated layer is characterized by a liquid permeability of less than 0.6 gr when measured according to AATCC 35. Further, methods of manufacturing the composition of the invention are provided.

Provided herein is a device for forming a conductive film. The device includes a deposition device and an air supply. The deposition device is configured to form a wet film having conductive nanostructures and a fluid carrier on a web. The web is moved in a first direction while forming the wet film. The air supply is disposed at a side of the web and configured to apply an air flow onto the wet film. The air flow is directed onto the wet film in a second direction perpendicular to the first direction to reorient a direction of some conductive nanostructures in the wet film to define reoriented conductive nanostructures.

Provided herein is a device for forming a conductive film. The device includes a deposition device and an air supply. The deposition device is configured to form a wet film having conductive nanostructures and a fluid carrier on a web. The web is moved in a first direction while forming the wet film. The air supply is disposed at a side of the web and configured to apply an air flow onto the wet film. The air flow is directed onto the wet film in a second direction perpendicular to the first direction to reorient a direction of some conductive nanostructures in the wet film to define reoriented conductive nanostructures.

Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a high refractive index layer, and a low refractive index layer are laminated on a substrate, the film having suppressed curling, and excellent hardness and antireflection performance.

A coated film having good characteristics is manufactured. A method for manufacturing the coated film includes: (a) a step of applying a coating liquid 20a to a first surface of a base material 1 unwound from an unwinding unit UW; (b) a step of forming a coating layer 3b on the first surface of the base material 1 by drying the coating liquid (coating film 3a) on the base material 1; and (c) a step of winding the base material 1 on which the coating layer 3b has been formed in a winding unit WD. Also, the base material 1 is continuously arranged from the unwinding unit UW to the winding unit WD, tension cut of the base material 1 is performed by a first suction roll SR after the base material 1 is taken out from the unwinding unit UW and before the step (b), and tension cut of the base material 1 on which the coating layer 3b has been formed is performed by a second suction roll SR before the step (c).

A gas barrier film that includes at least a film base material including a polyester resin having a butylene terephthalate unit as a main constituent unit, and one or more metal oxide layers wherein the gas barrier film has a heat shrinkage rate in the machine direction (MD direction) after heating for 30 minutes at 150° C. of 0.6% or more but less than 3.0%, the heat shrinkage rate being represented by the following formula: Heat shrinkage rate={(Length before heating−Length after heating)/Length before heating}×100(%).

A gas barrier film that includes at least a film base material including a polyester resin having a butylene terephthalate unit as a main constituent unit, and one or more metal oxide layers wherein the gas barrier film has a heat shrinkage rate in the machine direction (MD direction) after heating for 30 minutes at 150° C. of 0.6% or more but less than 3.0%, the heat shrinkage rate being represented by the following formula: Heat shrinkage rate={(Length before heating−Length after heating)/Length before heating}×100(%).

A wiping sheet includes a patterned part of a fiber assembling base material and a non-patterned part of the fiber assembling base material. The patterned part includes cellulose nanofiber; and the non-patterned part does not include the cellulose nanofiber.