The invention relates to a toilet cleaning tool comprising: a handle; a vibration member attached at a free end of the handle, wherein said vibration member includes an emitting surface for emitting vibrational waves;
wherein the toilet cleaning tool further includes one or more spacers arranged around the vibration member to keep the vibration member free of the toilet bowl during cleaning.

An ultrasonic/megasonic cleaning device includes a cleaning unit including an upper casing and a lower casing connected to form a hollow chamber, an ultrasonic/megasonic generator provided in the hollow chamber, and a bottom quartz component provided with a quartz rod array composed of a plurality of vertically arranged quartz rod-like structures; a spray arm connected to the upper casing; and an ultrasonic/megasonic frequency control unit connected between the at least one signal source and the ultrasonic/megasonic generator, for constantly varying a frequency of the electrical signal output from the at least one signal source and introducing the electrical signal into the ultrasonic/megasonic generator, so as to dynamically vary an oscillation frequency of the ultrasonic/megasonic wave generated by the ultrasonic/megasonic generator; wherein the ultrasonic/megasonic frequency control unit includes a frequency-switching timing control unit configured to trigger am ultrasonic/megasonic frequency switching control unit to switch the oscillation frequency of the ultrasonic/megasonic wave from a first frequency to a second frequency when the ultrasonic/megasonic wave has been generated at the first frequency for a time period, the time period being randomly selected within a time range.

To improve propagation performance and uniformity of ultrasonic waves more easily, even when treating multiple treatment objects. An ultrasonic treatment apparatus according to the present invention includes: a treatment tank capable of containing a treatment object and a treatment liquid for immersing the treatment object; and an ultrasonic application mechanism that applies ultrasonic waves to the treatment liquid, wherein the treatment tank has a long axis where cross-sectional shapes are substantially identical to each other, and a wall surface to a scheduled liquid level height line of the treatment liquid is formed by a concave surface, and the ultrasonic application mechanism is installed at a position where an angle θ formed by a normal line of an oscillation surface of ultrasonic waves and the scheduled liquid level line of the treatment liquid is 5° to 80°.

Provided are an ultrasonic transducer having a state monitoring function, and an ultrasonic cleaning device using the same. The ultrasonic transducer having a state monitoring function is a Langevin ultrasonic transducer for use in an ultrasonic cleaning device configured to clean an object to be cleaned via cleaning liquid to which ultrasonic vibrations are applied, the ultrasonic transducer having a state monitoring function including a plurality of piezoelectric elements, which are arranged to be stacked on each other, and are expandable and contractable in a direction of the stacking, a part of the plurality of piezoelectric elements serving as a vibration exciting piezoelectric element configured to expand and contract by being applied with an AC voltage, another part of the plurality of piezoelectric elements serving as a state monitoring piezoelectric element configured to output a state monitoring voltage by the expansion and contraction of the vibration exciting piezoelectric element.

A driving device is provided. The driving device includes a boost inductor and a resonance circuit. The boost inductor receives a first power via a first terminal of the boost inductor in a first mode and provides a second power via a second terminal of the boost inductor. The resonance circuit stores a stored electric energy from the second power in the first mode, so that the boost inductor does not provide the second power in the second mode and drives a transducer by the stored electric energy in the first mode and the second mode.

A method for effectively cleaning vias (20034), trenches (20036) or recessed areas on a substrate (20010) using an ultra/mega sonic device (1003, 3003, 16062, 17072), comprising: applying liquid (1032) into a space between a substrate (20010) and an ultra/mega sonic device (1003, 3003, 16062, 17072); setting an ultra/mega sonic power supply at frequency f.sub.1 and power P.sub.1 to drive said ultra/mega sonic device (1003, 3003, 16062, 17072); after the ratio of total bubbles volume to volume inside vias (20034), trenches (20036) or recessed areas on the substrate (20010) increasing to a first set value, setting said ultra/mega sonic power supply at frequency f.sub.2 and power P.sub.2 to drive said ultra/mega sonic device (1003, 3003, 16062, 17072); after the ratio of total bubbles volume to volume inside the vias (20034), trenches (20036) or recessed areas reducing to a second set value, setting said ultra/mega sonic power supply at frequency f.sub.1 and power P.sub.1 again; repeating above steps till the substrate (20010) being cleaned.

A method for effectively cleaning vias (20034), trenches (20036) or recessed areas on a substrate (20010) using an ultra/mega sonic device (1003, 3003, 16062, 17072), comprising: applying liquid (1032) into a space between a substrate (20010) and an ultra/mega sonic device (1003, 3003, 16062, 17072); setting an ultra/mega sonic power supply at frequency f.sub.1 and power P.sub.1 to drive said ultra/mega sonic device (1003, 3003, 16062, 17072); after the ratio of total bubbles volume to volume inside vias (20034), trenches (20036) or recessed areas on the substrate (20010) increasing to a first set value, setting said ultra/mega sonic power supply at frequency f.sub.2 and power P.sub.2 to drive said ultra/mega sonic device (1003, 3003, 16062, 17072); after the ratio of total bubbles volume to volume inside the vias (20034), trenches (20036) or recessed areas reducing to a second set value, setting said ultra/mega sonic power supply at frequency f.sub.1 and power P.sub.1 again; repeating above steps till the substrate (20010) being cleaned.

Provided is an automated analyzer comprising an ultrasonic cleaner capable of obtaining a consistent cleaning effect regardless of the operating temperature environment. This automated analyzer comprises: a dispensing mechanism having a nozzle for dispensing a sample or reagent; an ultrasonic cleaner 26 for cleaning the nozzle; and a control unit 28. The ultrasonic cleaner comprises: a cleaning tank 206; an ultrasonic vibrator 205; and a vibration head 209 that extends from the ultrasonic vibrator to the cleaning tank and has a distal end part that is inserted into the cleaning tank. The control unit inserts the nozzle into the cleaning tank and carries out a heating operation for heating the ultrasonic vibrator by driving the ultrasonic vibrator according to a driving condition different from that for a cleaning operation for cleaning the nozzle by driving the ultrasonic vibrator.

Acoustophoretic devices for separating particles from a non-flowing host fluid are disclosed. The devices include a substantially acoustically transparent container and a separation unit, with the container being placed within the separation unit. An ultrasonic transducer in the separation unit creates a planar or multi-dimensional acoustic standing wave within the container, trapping particles disposed within the non-flowing fluid and causing them to coalesce or agglomerate, then separate due to buoyancy or gravity forces.

A treatment method and system using high-frequency ultrasound for treating a waste stream containing per- and polyfluoroalkyl substance (PFAS) is disclosed. The system has one or more reactors including one or more transducers configured to operating at one or more frequencies to destroy or mineralize the per- and polyfluoroalkyl substances (PFAS) in the waste stream using sonolysis.