Patent classifications
B08B1/14
HOT WAX CLEANING DEVICE AND SYSTEM
A device for the mechanical removal of wax residues on vehicle bodies, characterized bya wax absorbing tape (1), a supply spindle (2) for storing and for unwinding unused wax absorbing tape (1), a press-on unit (5) for pressing the wax absorbing tape (1) onto a wax-soiled surface of the body of the vehicle, andone or more motors for transporting the wax absorbing tape (1) from the supply spindle (2) via the deflecting reels (4) to the take-up reel (3), anda control unit for controlling the advance of the wax absorbing tape.
HOT WAX CLEANING DEVICE AND SYSTEM
A device for the mechanical removal of wax residues on vehicle bodies, characterized bya wax absorbing tape (1), a supply spindle (2) for storing and for unwinding unused wax absorbing tape (1), a press-on unit (5) for pressing the wax absorbing tape (1) onto a wax-soiled surface of the body of the vehicle, andone or more motors for transporting the wax absorbing tape (1) from the supply spindle (2) via the deflecting reels (4) to the take-up reel (3), anda control unit for controlling the advance of the wax absorbing tape.
REPROCESSING A SINGLE-USE MEDICAL DEVICE
The present invention provides a method for reprocessing single-use medical devices. The method can include removing a coating from a single-use medical device, validating the removal of the coating, cleaning the single-use medical device, and applying a new coating to the single-use medical device.
SUBSTRATE CLEANING APPARATUS, SUBSTRATE DRYING APPARATUS, SUBSTRATE TRANSPORT APPARATUS, SUBSTRATE PLACING APPARATUS, SUBSTRATE PROCESSING APPARATUS, CHARGE AMOUNT CONTROL METHOD, AND CHARGE AMOUNT CONTROL PROGRAM
Provided is a substrate cleaning apparatus including: a substrate holding and rotating mechanism configured to hold and rotate a substrate; a cleaning liquid supplier configured to supply a cleaning liquid to the substrate; a cleaning member configured to come into contact with the substrate to clean the substrate; a charge amount adjustment apparatus capable of increasing and decreasing a charge amount of the substrate; a charge amount measuring instrument configured to measure the charge amount of the substrate; and a controller configured to control the charge amount adjustment apparatus according to the charge amount measured by the charge amount measuring instrument.
SUBSTRATE CLEANING APPARATUS, SUBSTRATE DRYING APPARATUS, SUBSTRATE TRANSPORT APPARATUS, SUBSTRATE PLACING APPARATUS, SUBSTRATE PROCESSING APPARATUS, CHARGE AMOUNT CONTROL METHOD, AND CHARGE AMOUNT CONTROL PROGRAM
Provided is a substrate cleaning apparatus including: a substrate holding and rotating mechanism configured to hold and rotate a substrate; a cleaning liquid supplier configured to supply a cleaning liquid to the substrate; a cleaning member configured to come into contact with the substrate to clean the substrate; a charge amount adjustment apparatus capable of increasing and decreasing a charge amount of the substrate; a charge amount measuring instrument configured to measure the charge amount of the substrate; and a controller configured to control the charge amount adjustment apparatus according to the charge amount measured by the charge amount measuring instrument.
Substrate cleaning device and substrate cleaning method
A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.
Method of cleaning blade of rotary device
A method of cleaning a blade of a rotary device includes: a first application step of applying a water-soluble cleaning liquid containing a surfactant to the blade; a setting-aside step of setting the blade to which the cleaning liquid has been applied aside; a first wiping step of wiping the blade after the setting-aside step; a second application step of applying water or a dilute cleaning liquid having a lower concentration of the surfactant than that in the cleaning liquid applied in the first application step to the blade after the first wiping step; and a second wiping step of wiping the blade after the second application step.
Cleaning ball and method for manufacturing same
A cleaning ball with a naturally derived material bonded to a surface of the cleaning ball for a condenser in a power plant is capable of performing efficient cleaning, and even if the material bonded to the surface of the ball is discharged to the ocean, the material does not cause damages to a marine environment. The cleaning ball includes a sponge rubber ball configured to deform and clean a heat transfer tube of the condenser; and a skin layer including crushed sand bonded to a surface of the sponge rubber ball. The crushed sand comprises sandstone containing granite particles, and the crushed sand has a particle size between 0.05 mm and 2.00 mm, and the skin layer is formed in concave and convex shapes on a non-deformed shape of the sponge rubber ball, and is configured to deform corresponding to deformation of the sponge rubber ball.
Autonomous floor cleaning with removable pad
An autonomous floor cleaning robot includes a body, a controller supported by the body, a drive supporting the body to maneuver the robot across a floor surface in response to commands from the controller, and a pad holder attached to an underside of the body to hold a removable cleaning pad during operation of the robot. The pad includes a mounting plate and a mounting surface. The mounting plate is attached to the mounting surface. The robot includes a pad sensor to sense a feature on the pad and to generate a signal based on the feature, which is defined in part by a cutout on the card backing. The mounting plate enables the pad sensor to detect the feature. The controller is responsive to the signal to perform operations including selecting a cleaning mode based on the signal, and controlling the robot according to a selected cleaning mode.
Pre-loaded floor wipes with improved pickup
A pre-loaded cleaning substrate, and related systems and methods for picking up particles with an aspect ratio (L/D) greater than 300 (e.g., hair), or greater than 1200 (e.g., particularly long hairs). The substrate (e.g., a nonwoven) may include only a single layer of material. The pre-loaded substrate is loaded (e.g., during manufacture) with a cleaning composition. The fibers of the substrate may have an average diameter less than 15 ?m, the substrate may have an air permeability of 35 ft.sup.3/min to 75 ft.sup.3/min, and the liquid cleaning composition may have a surface tension of less than about 50 dynes/cm. Together, the combination of the particular substrate and cleaning composition may facilitate markedly improved ability to pick up high L/D aspect ratio particle debris (e.g., such as hair), while retaining such particles (e.g., providing hair retention index values of at least 20).