Check valves are described herein. A check valve includes an inlet body, an outlet body, a valve body, a valve member, and a wiping extension. The inlet body defines an inlet portion. The outlet body defines an outlet portion. The valve body is coupled between the inlet bod and the outlet body. The valve body defines a valve cavity. The valve cavity is in fluid communication with the inlet portion and the outlet portion. The valve member is disposed within the valve cavity. The valve member is configured to permit flow from the inlet portion to the outlet portion and prevent flow from the outlet portion to the inlet portion. The wiping extension extends from the valve body toward the valve member. The wiping extension is movable relative to the valve member to dislodge particulate from the valve member.

A deduster is comprised of two sets (pairs) of counter-rotating dedusting brushes in cooperation with a vacuum system for saw dust removal from wooden lumber. In addition to these features, the deduster may feature a separate, movable, top brush assembly that can be easily adjusted for different board thicknesses and raised up to allow for clearing board jams and for pass-through if boards were to be run without dedusting. This deduster apparatus is modular, thereby allowing it to be positioned over an existing machine or a lumber board unscrambler machine such as a lugged unscrambler machine. There is also a deduster for a board handling hopper.

An autonomous floor cleaning system includes an autonomous floor cleaner with a docking station. The docking station is configured to performing maintenance for the robot, such as washing mopping pads or refilling the supply tank. Methods for servicing or performing maintenance on an autonomous floor cleaner by a docking station are disclosed.

To achieve a cleaning module and a substrate processing apparatus that can improve the cleaning capability for a substrate with a simple structure.

A cleaning module includes a first transfer mechanism 210-1, an ultrasonic cleaning tank 440, a transfer machine 420, and a second transfer mechanism 210-2. The first transfer mechanism 210-1 is for transferring a substrate WF with a surface to be polished facing downward up to a substrate grip or release position 418 on a downstream side along a transfer passage 405. The ultrasonic cleaning tank 440 is disposed at a position spaced apart from the transfer passage 405 and is for cleaning a substrate WF with the surface to be polished facing downward. The transfer machine 420 is for transferring the substrate WF between the substrate grip or release position 418 of the transfer passage 405 and the ultrasonic cleaning tank 440. The second transfer mechanism 210-2 is for transferring the substrate WF transferred to the substrate grip or release position 418 from the ultrasonic cleaning tank 440 by the transfer machine 420 to further downstream along the transfer passage 405.

The present disclosure relates to an apparatus for cleaning a transfer plate and a method for cleaning the same. The apparatus for cleaning a transfer plate includes a rack, a cleaning tank, a cleaning roller, at least a part of a cylindrical surface of the cleaning roller is located inside the cleaning tank, and a transfer plate is provided on the cylindrical surface of the cleaning roller fixing mechanism for fixing a transfer plate wound around the cylindrical surface; protrusions are provided on the cylindrical surface, and a vacuum suction hole for sucking the transfer plate is provided on periphery of a protrusion; a friction cleaning device, and the friction cleaning device frictionally cleans the transfer plate through a relative movement between the cleaning roller and the friction cleaning device; a drive device configured to generate a relative movement between the cleaning roller and the friction cleaning device.

In an example, a wiper system includes a first wiper blade, a second wiper blade, and a liquid dispenser. In that example, the liquid dispenser is oriented to eject liquid towards a cloth area across from the first wiper blade when the first wiper blade is in a rest position and the second wiper blade is in a service position.

A system for cleaning a media transport device includes a cleaning substrate sized and configured to fit within at least a portion of a media travel pathway of the transport device. The cleaning substrate includes scarifying holes that scrape debris from media conveyors (belts and/or rollers) of the transport device. Cleaning the transport device may include positioning the cleaning substrate in the section while operating the transport device, or moving the substrate so that the scarifying holes contact the cleaning substrate and clean the belts and/or rollers.

A cleaning device cleans a surface of a sheet conveyance member which conveys a sheet in an image forming apparatus that executes image forming processing using a recording material, the surface carrying a solid substance that originates from the recording material and that adheres to the surface. The cleaning device includes a cleaning member including a contact surface configured to come in contact with the surface of the sheet conveyance member. The contact surface is an irregular surface rougher than the surface of the sheet conveyance member. At cleaning of the surface, the cleaning member makes a relative movement to the surface of the sheet conveyance member. The irregular surface is an irregular surface configured to take away the solid substance adhering to the surface of the sheet conveyance member when the cleaning member makes the relative movement.

A cleaning device includes: a cleaning unit including a cleaning part and a cleaning housing; and a movement mechanism that is capable of moving the cleaning unit between a cleaning position and a mounting and removing position below the cleaning position. The cleaning housing includes a pair of wall portions and a pair of housing shaft portions. The movement mechanism includes a unit housing portion, a pair of support members, a rotation drive unit, and a positioning portion. The positioning portion is configured to be brought into contact with the cleaning unit at the cleaning position and is configured to position the cleaning unit such that the cleaning part is capable of cleaning the conveyance roller.

The present application discloses a cleaning apparatus and system, including: a transmission assembly; a drive assembly, connected to the transmission assembly and located lower than the transmission assembly; a cleaning assembly, located higher than the transmission assembly; and a waterproof structure, located between the drive assembly and the cleaning assembly.