Patent classifications
B08B1/32
CLEANING SYSTEMS FOR ADDITIVE MANUFACTURING APPARATUSES AND METHODS FOR USING THE SAME
Embodiments of the present disclosure are directed to additive manufacturing apparatuses, cleaning stations incorporated therein, and methods of cleaning using the cleaning stations.
Hand Held Rotary Cleaning Tool with Splash Guard
A hand-held rotary cleaning tool includes a housing that encloses an electric motor and a gear set that connects the motor to an output shaft The rotary cleaning tool includes at least one cleaning accessory that is detachably connected to the output shaft, and a flexible splash guard. The splash guard surrounds the output shaft and cleaning accessory so as to prevent liquid splash during tool use. The splash guard includes a reinforcing ring that is formed of a material that is less flexible than the material used to form the splash guard body. The reinforcing ring prevents the splash guard from excessive deformation, whereby interference of the splash guard with the cleaning accessory or the output shaft is minimized or avoided. The reinforcing ring may also include other features which enhance the cleaning function of the rotary cleaning tool.
System for cleaning wafer in CMP process of semiconductor manufacturing fabrication
A system for performing a Chemical Mechanical Polishing (CMP) process is provided. The system includes a CMP module configured to polish a semiconductor wafer. The system further includes a cleaning brush assembly configured to clean the semiconductor wafer. The cleaning brush includes a rotation shaft and a brush member surrounding a segment of the rotation shaft. The system also includes an agitation transducer arranged to be distant from the brush member and configured to produce an agitated cleaning liquid to clean the cleaning brush assembly.
Apparatus for cleaning transfer plate and method for cleaning the same
The present disclosure relates to an apparatus for cleaning a transfer plate and a method for cleaning the same. The apparatus for cleaning a transfer plate includes a rack, a cleaning tank, a cleaning roller, at least a part of a cylindrical surface of the cleaning roller is located inside the cleaning tank, and a transfer plate is provided on the cylindrical surface of the cleaning roller fixing mechanism for fixing a transfer plate wound around the cylindrical surface; protrusions are provided on the cylindrical surface, and a vacuum suction hole for sucking the transfer plate is provided on periphery of a protrusion; a friction cleaning device, and the friction cleaning device frictionally cleans the transfer plate through a relative movement between the cleaning roller and the friction cleaning device; a drive device configured to generate a relative movement between the cleaning roller and the friction cleaning device.
Cleaning device
A cleaning device includes: a lens cover configured to cover an object lens of a camera provided in a machining area of a machine tool, the lens cover being transparent; a motor configured to rotate the lens cover; and a wiping member configured to, when the lens cover rotates, wipe at least an adhering substance that has adhered to a region of the lens cover in an angle-of-view of the camera.
VEHICLE CLEANING SYSTEM
A vehicle cleaning system for cleaning a vehicle including a processor and a memory including computer-executable instructions that, when executed by the processor, cause the processor to perform operations. The operations include determining that a passenger compartment of the vehicle requires cleaning and identifying a type of cleaning required. The operations also include that at least one of a fragrance system, a dry particulate removal system, and a wet particulate removal system is activated in response to the type of cleaning required.
SELF-CLEANING ION GENERATOR DEVICE
A self-cleaning ion generator device includes a housing having a bottom portion and a top portion selectively secured to each other, the top portion contains a base portion extending to an outer edge and having an internal side and an external side, a first pair of opposed sidewalls and a second pair of opposed sidewalls extend from the outer edge of the base portion forming a cavity therein. Ion terminals extend from the housing, and a cleaning apparatus for cleaning the two ion terminals.
Autonomous active waterline scrubbing device principally for swimming pools and spas
Buoyant, autonomous devices for actively scrubbing upstanding walls of swimming pools and spas at and nearby their waterlines are detailed. The devices may be configured to float on and travel along a surface of water of a pool and include at least one brush or scrubber adapted to contact pool walls. An electric motor may cause the scrubber to rotate about a shaft or axle, with frictional contact between the scrubber and the wall dislodging dirt and debris therefrom. In particular, if a scrubber is conically shaped and angled relative to the vertical direction, its rotating blades may lift water from the pool to hydrate dried debris stuck to the wall, thereby facilitating dislodging of the debris.
Flexible rotary brush hub
A rotary cleaning apparatus for underwater cleaning including a housing, a battery, a motor and a flexible hub system. The flexible hub system includes a toroidal brush system coupled to a circular centrifugal pump assembly. The flexible hub system includes a flexible hub allowing the flexible hub system to bend out of plane. When the flexible hub system is rotated underwater at a curved surface, the brush system cleans the surface while the suction of the centrifugal pump assembly flexes the flexible hub system to evenly contact the surface.
Substrate processing apparatus
An upper spin chuck and a lower spin chuck are arranged in a vertical direction. In the lower spin chuck, a substrate holder sucks a center portion of a lower surface of a substrate, so that the substrate is held. In this state, a peripheral portion of the lower surface of the substrate rotated by a spin motor is cleaned by a brush of a first back surface cleaning mechanism. In the upper spin chuck, a plurality of chuck pins abut against an outer peripheral end of the substrate, so that the substrate is held. In this state, a region inward of the peripheral portion of the lower surface of the substrate rotated by the spin motor is cleaned by a brush of a second back surface cleaning mechanism. Receiving and transferring of the substrate are performed by a receiving transferring mechanism between the upper and the lower spin chucks.