A method of removing polyvinyl alcohol (PVA)-based scaffold from a 3D printed part formed by a 3D printing process that renders a finished product for immediate use. The method principally involves preparing an acidic-aqueous cleansing solution comprising a mixture of carboxylic acid and water; immersing the 3D printed part conventionally bonded with PVA-based scaffold into the acidic-aqueous cleansing solution for a select amount of time to break down and remove the PVA-based scaffold from the 3D printed part; and adding to the acidic-aqueous cleansing solution a select quantity of polymeric carbohydrate to crosslink and bond with the PVA-based scaffold to effect dissolution thereof into the acidic-aqueous cleansing solution.

The present disclosure may provide a cleaning apparatus for cleaning parts. The cleaning apparatus may comprise a housing defining a washing chamber having an opening through which parts may be loaded/unloaded into the washing chamber. The cleaning apparatus may also comprise a spray system adapted to direct a washing solution to clean the part in the washing chamber. The spray system may comprise a spray array with at least one rotatable spray head. The spray head may comprise a plurality of nozzles through which the washing solution is directed to clean the part in the washing chamber. The cleaning apparatus may also comprise a closure which may provide controlled access to the washing chamber through the opening and may be movable between a closed position to sealingly close the opening and an open position so as to allow for loading and unloading of parts into the washing chamber without obstruction.

A cleaning liquid composition is provided. More particularly, a cleaning liquid composition includes a transition metal compound represented by Chemical Formula 1 (see the detailed description of the present invention); and a hydrocarbon-based solvent, and a cleaning method of a polymerization apparatus using the same.

The invention is generally a system for drying, recycling, and washing off residual resin from three-dimensionally (3D) printed objects. Exemplary systems may include a system for washing off residual printing material from a surface of a 3D-printed. In an exemplary embodiment, a chamber is adapted to receive the 3D-printed object and a printing material disruption module is adapted to disrupt a composition of residual printing material on a surface of the 3D-printed object. Additionally, a washing force module may be adapted to apply a washing force field to the 3D-printed object and wash off the residual printing material.

The present invention relates to a method of removing a landfill residue that includes (a) forming a treatment composition that includes, (i) an acid functional material comprising at least one of carboxylic acid functional materials, phosphoric acid functional materials, phosphonic acid functional materials, or salts thereof, (ii) water, (iii) optionally an oxidizer including a reactive oxygen, and (iv) optionally a surfactant. The method further includes (b) contacting together said treatment composition and said landfill residue, thereby forming a modified treatment composition including the landfill residue, and (c) removing the modified treatment composition. The landfill residue is selected from a landfill gas extraction residue and a landfill leachate collection residue, and the landfill residue includes an organic substance and optionally a scale-forming salt. The present invention also relates to a treatment composition including the acid functional material, and the oxidizer.

A machine and a method for treating cakes from additive manufacturing processes, wherein the cake contains residual powders and sintered pieces is disclosed. The machine includes a cylindrical vibrating body which is placed in a position above a vibratory finishing or tumbling or vibro-blasting machine and is separated from the vibratory finishing or tumbling or vibro-blasting machine by a remotely operable door and the cylindrical vibrating body obtains its vibration from the machine below. The machine includes means for destructuring the cake in order to obtain the separation of the non-sintered powder from the sintered pieces present in the cake and means for recovering the powder resulting from the destructuring of the cake.

A method for cleaning a substrate with pattern structures comprises the following steps: using gas-liquid atomization to clean a substrate surface (601); using TEBO megasonic to clean the substrate surface (602); and drying the substrate (603). The TEBO megasonic cleaning is used to remove small size particles on the substrate and the gas-liquid atomization cleaning is used to remove large size particles on the substrate. The method enables achieving an effect of cleaning the substrate without or with less device damage. A substrate cleaning apparatus is also provided.

Compositions or finishing solutions configured to remove unwanted material, such as uncured material or resin, from additively manufactured objects are disclosed herein, in one example, the finishing solution includes a first glycol ether and a second glycol ether and/or a high flash point hydrocarbon, wherein the finishing solution has a flash point of at least 93.3° C. In alternative examples, the finishing solution may also include a third glycol ether, a high flash point alcohol, and/or an acetate of a glycol ether.

A roller-type applicator cleaning apparatus includes a lid, a housing, a water inlet valve, a base, a plurality of radial openings, and a central axis. The base includes a platform and an applicator holder. The lid, the housing, and the base are concentrically positioned along the central axis. The applicator holder is adjacently connected onto the platform and function as a storage space for the roller-type applicator. The plurality of radial openings laterally traverses through the applicator holder so that a flow of water can discharge into the applicator holder as the flow of water is entered into the housing through the water inlet. The lid and the base are oppositely positioned of each other about the housing and threadedly attached to the housing. The applicator holder is encircled by the housing so that the flow of water can fully engaged with the inserted applicator that needs to be cleaned.

Removing stimulus responsive polymers (SRPs) includes exposure to high energy metastable species, generated in a noble gas plasma, at an elevated temperature. The metastable species have sufficient energies and lifetimes to scission bonds on the polymer or other residues. At temperatures greater than the ceiling temperature of the SRP, there is a strong thermodynamic driving force to revert to volatile monomers once bond scissioning has occurred. The metastable species are not chemically reactive and do not appreciably affect the underlying surface. The high energy metastable species are effective at removing residues that remain after exposure to other stimuli such as heat.