A crab eviscerating disc is used in a crab processing machine and a method for processing a crab to a market condition. The disc is used to mill a groove along the underside of a crab body without completely cutting the crab body. Each tooth on that disc has a cut clearance angle of zero degree, and a hook angle of zero degree. Because of these teeth, the depth of the groove is limited by a bony plate and a bony ridge in the crab body. The visceral cavities of the crab body are cleaned by high pressure water sprays oriented in the groove while the crab body is still attached.

A device cleans a core engine of a jet engine. The device has: a nozzle installation which is configured for introducing a cleaning medium into the core engine; a connector configured to connect the device in a rotationally fixed manner to a shaft of a fan of the jet engine; and a line connection configured to supply the cleaning medium, which is connected to the nozzle installation by a rotary coupling. The nozzle installation comprises nozzles, comprising at least one flat jet nozzle, and at least one full cone nozzle or hollow cone nozzle.

A link chain cleaning and lubricating device, and lubricants for use therein.

A wafer treatment apparatus includes a wafer supporter for supporting and rotating a wafer, a frontside liquid discharger for discharging a liquid toward a frontside of the wafer, a backside liquid discharger for discharging the liquid toward a backside of the wafer, a treatment chamber for accommodating the wafer supporter, and including liquid collecting inlets stacked on each other and receiving the liquid discharged from at least one of the frontside and backside liquid dischargers, and a controller for controlling a height of an upper end of a first liquid collecting inlet of the liquid collecting inlets to have one of a first height in a process of discharging the liquid to the backside of the wafer adjacent to the wafer supporter and a second height, lower than the first height, in a process of discharging the liquid to the frontside of the wafer.

An apparatus includes: a tank storing a processing liquid; a circulation line; a branch line; a processing part for supplying the processing liquid to a substrate at the branch line; a discharge part for reducing a storage amount of the processing liquid; a supply part for supplying a new processing liquid to the tank; and a controller including: a first determination part for determining whether the storage amount is less than a lower limit value; a first replenishment controller for replenishing the processing liquid to the tank when the storage amount is less than the lower limit value; a calculation part for calculating a replenishment amount of the processing liquid; and a second replenishment controller for reducing the storage amount and replenishing the processing liquid to the tank when a calculation value of the replenishment amount is less than a set value.

A cleaner comes into contact with a lower-surface center region of a substrate held by a first holder, so that the lower-surface center region is cleaned. The cleaner comes into contact with a lower-surface outer region of the substrate rotated by a second holder, so that the lower-surface outer region of the substrate is cleaned. During cleaning of the lower-surface center region, the second holder is rotated about a vertical axis while not holding the substrate. Alternatively, during cleaning of the lower-surface center region, the gas injector arranged between the cleaner and the second holder injects gas toward the substrate from a first height spaced apart from the substrate by a predetermined distance. Further, during drying of the lower-surface center region, the gas injector injects gas toward the substrate from a second height closer to the substrate than the first height.

The present application discloses a cleaning method and a cleaning device. The cleaning method includes the following steps: dividing a cleaning device into at least two regions to control for the same cleaning mode; detecting a width of an object to be cleaned; and turning on the cleaning device of corresponding region according to the width of the object to be cleaned. The cleaning device includes a detection structure, a conveying structure, a washing structure, an air knife structure, and a control structure, where the washing structure is divided into at least two regions, and the air knife structure is also divided into at least two regions.

A device cleans a core engine of a jet engine. The device has: a nozzle installation configured to introduce a cleaning medium into the core engine; a connector configured to connect the device in a rotationally fixed manner to a shaft of a fan of the jet engine; and a line connection configured to supply the cleaning medium, the line connection being connected to the nozzle installation by a rotary coupling. The nozzle installation has first contact faces configured to bear axially on fan blades of the fan, the first contact faces being configured for defined positioning of the nozzle installation relative to the jet engine.

An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; transporting the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having an agitation bath; vacuuming moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume; directing energy at the continuous substrate in the agitation bath using at least one of a megasonic transducer or an ultrasonic transducer; and drying the continuous substrate.

A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.