An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; transporting the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having an agitation bath; vacuuming moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume; directing energy at the continuous substrate in the agitation bath using at least one of a megasonic transducer or an ultrasonic transducer; and drying the continuous substrate.

A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

A continuous cleaning installation 1 of a passing strip S includes a tank 2, an aqueous solution 3 inside the tank 2. It also includes at least a roll 4 immerged in the aqueous solution 3, at least an ultrasound emitter 5, a feed for feeding 6 an aqueous solution and emptying 7 the tank. Moreover, it also includes and estimator for estimating 8 the aqueous solution level, a calculator for calculating 9 for each ultrasound emitter 5 its distance to the aqueous solution level and a controller for controlling the power 10 of the at least one ultrasound emitter 5 and at least an impermeable closable opening 11 on at least a lateral side of the tank through which the at least one ultrasound emitter 5 can pass.

A brushless system for washing a large flat object having a length greater than a width, the width defining a cross-section, said system including a frame defining a longitudinal path and including a first end; a second end; and a wash chamber positioned between said first and second ends. A transport system secured to the frame and adapted to transport said object positioned thereon; said transport system including a plurality of idle rollers located along said longitudinal path and adapted to support said object as it travels along the longitudinal path; a drive system to provide mechanical transport motion to said object along the longitudinal path from said first end of the frame to said second end of the frame, said drive system being positioned outside the wash chamber; and first end including a loading mechanism to position the object on at least one of the plurality of rollers, and said second end including an unloading mechanism to remove the object from at least one of the plurality of rollers; said wash chamber including an entrance located proximate the first end and an exit located proximate the second end, and a series of high pressure water jets positioned within the wash chamber and adapted to spray the entire surface of said object when such transits through the washing chamber. The entire cross-section of said object is untouched by the system at at least one point during its transit through the wash chamber.

An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate.

A method of controlling a moving robot is provided. The method of controlling a moving robot includes the steps of: (a) performing a basic motion of the moving robot which moves on a rotating mop; (b) measuring the slip rate of the moving robot; and (c) controlling the travel of the moving robot.

Disclosed is a drainage system for an automatic cleaning storage base of an electric mop. The automatic cleaning storage base of the electric mop comprises a casing member having a cleaning tank. The drainage system comprises a drain valve; an outlet end of the drain valve is connected to the outside of the casing member, and an inlet end of the drain valve is connected to the cleaning tank; the drain valve has a switch, and the switch is provided with a first rack; the drain valve is further provided with a duplex gear and a second rack; the duplex gear has a gear portion with a larger outer diameter to mesh with the first rack, and the duplex gear has a gear portion with a smaller outer diameter to mesh with the second rack.

A substrate treatment method includes a first gas treating step, a water-repellency treatment step, and a spraying step. In the first gas treating step, a first gas is supplied to the substrate inside the chamber in a state in which the inside of the chamber is decompressed. The first gas includes gas of an organic solvent. The water-repellency treatment step is executed after the first gas treating step. In the water-repellency treatment step, the inside of the chamber is in the decompressed state, and a water-repellent agent is supplied to the substrate inside the chamber. The spraying step is executed after the water-repellency treatment step. In the spraying step, the inside of the chamber is in the decompressed state, and a first liquid is sprayed over the substrate inside the chamber. The first liquid includes liquid of an organic solvent.

A method for cleaning a substrate with pattern structures comprises the following steps: using gas-liquid atomization to clean a substrate surface (601); using TEBO megasonic to clean the substrate surface (602); and drying the substrate (603). The TEBO megasonic cleaning is used to remove small size particles on the substrate and the gas-liquid atomization cleaning is used to remove large size particles on the substrate. The method enables achieving an effect of cleaning the substrate without or with less device damage. A substrate cleaning apparatus is also provided.

An endoscope cleansing accessory is described for use with an automatic endoscope reprocessing (AER) apparatus which utilizes the motive force provided by a flowing cleansing fluid already within the AER to actuate an actuator wheel of the endoscope during the cleansing process. The movement or actuation of the actuator wheel during cleansing in turn imparts a back and forth motion to an elevator platform or forceps raiser within the endoscope to loosen tissue and other particles that are then flushed out by the flowing cleansing fluid.