A coating removal process includes providing a coating removal vessel having a sealable processing volume therein, providing a coating removal fluid, which reacts with the coating, at an elevated temperature above the ambient temperature surrounding the removal vessel, in the sealable processing volume, locating a component having a coating thereon to be removed in the processing volume, sealing the sealable process volume from the ambient surrounding the processing volume, heating the coating removal fluid to a temperature greater than the boiling point thereof at the pressure of the surrounding ambient, removing the coating from the component using the coating removal fluid at the temperature greater than the boiling point thereof at the pressure of the surrounding ambient, reducing the temperature of the coating removal fluid to a temperature less than the boiling point thereof at the pressure of the surrounding ambient, venting the sealable volume to the surrounding ambient, and removing the component from the processing volume.

A roasting and glazing apparatus includes a roaster, an agitator mounted within the roaster bowl for mixing a mixture of nuts and sugar during a roasting or glazing operation, a heater controlled to heat the roaster bowl during the roasting or glazing operation, and a cover removably mounted to the roaster bowl. The cover includes a reservoir for receiving water from a user and restricting water flow from the reservoir into the mixture of nuts and sugar in the roaster bowl. The cover and the roaster bowl together define a vent on a side of the cover opposite the reservoir. The vent is configured to direct steam out of the roaster bowl in a direction away from the reservoir.

An apparatus for removing powder from a powder-based additively manufactured part includes a chamber for locating a powder-based additively manufactured part therein, a support mesh for supporting a powder cake that includes one or more parts therein, an inlet for introducing a gas into the chamber to flow throughout the powder cake and fluidise the powder to disengage from the part, and an outlet to allow the gas to exit the chamber. The apparatus further includes a cryogenic blasting system for spraying a mixture of liquid CO.sub.2 and compressed air at the powder-based additively manufactured part to remove powder therefrom.

An exemplary method of monitoring a bath process includes processing a first wafer by submerging the first wafer within a bath solution; capturing a video of the bath solution containing the first wafer during a first time interval; analyzing the video based on intensity of light captured in a frame of the video; and based on analyzing the video, determining a first metric of the bath solution during the first time interval.

A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.

A chemical mechanical polishing system includes a platen to support a polishing pad, a carrier head, a motor to generate relative motion between the platen and the carrier head, a steam generator including a vessel having a water inlet and one or more steam outlets and a heating element configured to apply heat to a portion of lower chamber to generate steam, a nozzle oriented to deliver steam from the steam generator onto the polishing pad, a tank to hold a cleaning fluid, a first valve in a first fluid line between the vessel and the nozzle to controllably connect and disconnect the vessel and the nozzle, a second valve in a second fluid line between the vessel and the tank to controllably connect and disconnect the vessel and the tank such that steam from the vessel heats fluid in the tank.

The present invention provides apparatus for post-processing an additively manufactured polymer part, comprising a reservoir (402) for containing a liquid solvent; a processing chamber (408) in controllable fluid communication with the reservoir; and a controller (418) configured to controllably post-process an additively manufactured polymer part located in the processing chamber by the solvent responsive to at least one parameter associated with the part. A method for post-processing an additively manufactured polymer part is also provided.

A cleaning device 2 is for performing a preliminary cleaning step 110 to a cleaning step 120 of a cleaning method 100, and includes a preliminary cleaning tank 11 containing a preliminary cleaning agent LQ1, a cleaning tank 12 containing a cleaning agent LQ2, an outer container 21 containing the preliminary cleaning tank 11 and the cleaning tank 12, a temperature adjustment unit 30 for adjusting the temperature of water WT contained in the outer container 21, an ultrasonic unit 40 for applying an ultrasonic wave to the water WT, or to the preliminary cleaning agent LQ1 or the cleaning agent LQ2 through the preliminary cleaning tank 11 or the cleaning tank 12, and a controller 80 controlling each of the units.

A method of cleaning for a chemical mechanical polishing system includes directing a gas that includes steam from an orifice onto a component in the polishing system while the component is spaced away from a polishing pad of the polishing system to clean the component, and moving the component into contact with the polishing pad.

A cleansing and sanitizing water dispensing device and related methods are described herein that includes: a heating mechanism, wherein the heating mechanism heats water to a predetermined temperature, wherein the predetermined temperature is above 130° F. and up to the boiling temperature of the water, and wherein the temperature of the water can sanitize a surface, a cloth or another item; a liquid reservoir coupled to the heating mechanism, wherein the liquid reservoir is designed to hold and store water; a dispensing mechanism coupled to the liquid reservoir; and an integrated safety device, wherein the safety device includes a locking mechanism and wherein the locking mechanism is operatively coupled to the heating mechanism, the dispensing mechanism, or a combination thereof. In some embodiments, a cleansing and sanitizing water dispensing device includes an integrated safety device, wherein the safety device includes an integrated spill tray, wherein the device or the heating mechanism will not operate unless the integrated spill tray is engaged and pulled out, so that it extends away from the dispensing device.