A method for cleaning a semiconductor fabrication equipment part having gas holes used in single-wafer type semiconductor fabrication equipment for processing semiconductor wafers, wherein the semiconductor fabrication equipment part having gas holes is formed of aluminum or an aluminum alloy, and has a distribution plate having a plurality of gas holes, the method including: a step (1) of scanning a gas injection surface of the distribution plate, which is a surface facing the wafer, with a laser beam; and a step (2) of bringing the gas injection surface and insides of the gas holes into contact with a cleaning liquid containing an inorganic acid.

A method for cleaning a receptor layer of a surface stress sensor according to an embodiment of the present invention includes, in a surface stress sensor that detects a change in surface stress of a thin film, the change being caused by a receptor layer disposed on a surface of the thin film, causing at least a part of a surface region of the thin film to generate heat or supplying heat to the receptor layer from the outside of the surface stress sensor. This makes it possible to easily perform efficient cleaning of a surface stress sensor such as a sensor that performs detection using a piezoresistor while avoiding structural complications as much as possible.

A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.

A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system may include a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.

A drone system includes a drone aircraft connected to an air duct that terminates in a nozzle that emits a jet of air with a blowing force from the blower nozzle, such as for cleaning tall and hard to reach surfaces of structures and buildings or to otherwise blow objects, debris, substances and floating materials.

A cleaning recipe creation method includes: an etching process of, for each of predetermined combinations of temperatures and pressures, etching a metal compound stacked on a test substrate loaded into a chamber by using a cleaning gas supplied into the chamber; a measurement process of measuring an etching rate of the metal compound for each of the combinations of the temperatures and the pressures; and a creation process of, based on the etching rate of the metal compound measured for each of the combinations of the temperatures and the pressures, creating a cleaning recipe including the combinations of the temperatures and the pressures in which the etching rate is equal to or higher than a predetermined etching rate.

A method for cleaning a receptor layer of a surface stress sensor according to an embodiment of the present invention includes, in a surface stress sensor that detects a change in surface stress of a thin film, the change being caused by a receptor layer disposed on a surface of the thin film, causing at least a part of a surface region of the thin film to generate heat or supplying heat to the receptor layer from the outside of the surface stress sensor. This makes it possible to easily perform efficient cleaning of a surface stress sensor such as a sensor that performs detection using a piezoresistor while avoiding structural complications as much as possible.

A mask cleaning apparatus includes: a mask holding unit configured to hold a mask; a light source unit configured to irradiate light onto the mask to remove a deposition material accumulated on a surface of the mask; and a material collecting unit configured to collect the deposition material removed from the mask, wherein the material collecting unit includes: a plurality of collecting cases corresponding to kinds of the deposition material; a rotating plate having a suction hole; and a plate driving unit configured to rotate the rotating plate to connect the suction hole to at least one of the collecting cases. Based on the irradiated light, different organic deposition materials may be collected for reuse.

The present invention refers to a storage device for headphones comprising a compartment for non liquid means for cleaning the headphones and/or means for charging electronic devices. It further refers to a cleaning device for headphones.

In a particle beam apparatus and a method for operating a particle beam apparatus, the particle beam apparatus has a column having a particle-beam optical system for generating a particle beam, to thereby expose a desired pattern in a vacuum sample chamber in an exposure operation. In a cleaning operation, a regulable gas stream having photodissociatable gas is fed to the column and/or the vacuum sample chamber via a gas-feed system. The photodissociation of the supplied gas is brought about in the cleaning operation with the aid of a plurality of light sources distributed spatially in the column and/or in the vacuum sample chamber. In the cleaning operation, individual light sources are able to be switched on and off selectively with respect to time via a control unit connected to the light sources, in order to clean individual elements in the column and/or in the vacuum sample chamber in targeted fashion.