A cleaning method for a heat exchanger is a cleaning method for a heat exchanger which includes a header passage and a plurality of internal passages connected to the header passage, that includes: a step of supplying a cleaning fluid, via the header passage, to some of the plurality of internal passages connected to the header passage, selectively.

A device for cleaning items comprises an enclosure defining a wash chamber, a rotor positioned within the wash chamber and selectively rotatable about an axle, a motor for selectively rotating the axle, a dispenser, and a drain. The rotor comprises a plurality of holders spaced about the axle and adapted to selectively receive and hold a respective item to be cleaned. The dispenser at least one liquid input and at least one liquid output and is positioned such that the at least one liquid output directs cleaning fluid at one of the items to clean material out of the cavities. The drain is for draining the cleaning fluid out of the chamber. The rotor is selectively rotatable at a predefined rotational speed for a predefined amount of time to expel cleaning fluid from the cavities of each item to be cleaned.

A method of cleaning a converter, the method including the steps of: providing a heating unit for heating a cleaning fluid; providing a ring main for continuous circulation of heated cleaning fluid around the ring main; connecting the heating unit to the ring main; connecting the ring main to the converter to enable delivery of heated cleaning fluid to the converter; and providing a controllable cleaning fluid valve for delivery of a heated cleaning fluid, and providing a controllable rinsing fluid valve for delivery of a rinsing fluid; providing a controller for controlled delivery of a sequence of the rinsing fluid and the heated cleaning fluid to the converter upon recognition of a rinsing fluid delivery condition and a heated cleaning fluid delivery condition, respectively.

A method for cleaning an electrospray emitter of a mass spectrometer comprises the steps of: (a) changing a mode of operation of the electrospray emitter from a stable jet mode of operation to a dripping mode or a pulsating mode of operation by lowering a magnitude, |V|, of a voltage applied between a counter electrode and the electrospray emitter; and (b) changing the mode of operation of the electrospray emitter from the dripping mode or the pulsating mode of operation to the stable jet mode of operation by increasing the magnitude, |V|, of the applied voltage; wherein the repetitions are performed at a predetermined frequency that depends on one or more of liquid flow rate, an emitter internal diameter, and liquid properties.

A cleaning system includes an explosive subsystem including: a plurality of detonation cords extending along a direction different from a vertical direction; and a locating assembly locating the plurality of detonation cords relative to each other. The locating assembly spaces each of the detonation cords apart from a system to be cleaned. The cleaning system includes a pressurized air blower assembly adjacent a portion of the system to be cleaned, the pressurized air blower assembly being configured to direct pressurized air towards the portion of the system to be cleaned after the detonation cords have been exploded.

A cleaning system and method includes suspending and exploding, adjacent a bank of HRSG finned-tubing, a plurality of generally uniformly spaced detonation cords. Each detonation cord has an explosive grain loading of 18-50 grains per foot. A detonation delay assembly attached to each of the plurality of detonation cords creates a predetermined delay between each detonation cord explosion. After the detonation cords are exploded, a suspended elongated beam, having a transport assembly and a pressurized air blower assembly directs pressurized air towards an adjacent the bank of HRSG finned-tubing as the pressurized air blower assembly is moved along a portion of the beam. A suspension assembly moves the beam, the transport assembly, and the pressurized air blower assembly up or down so that a next portion of the bank of HRSG finned-tubing may be cleaned by the pressurized air.

An apparatus for processing a substrate may include a vacuum suction part including vacuum holes configured to apply a vacuum pressure to a rear face of a substrate while a predetermined process is performed on the substrate, and a cleaning part configured to clean the vacuum holes in a cleaning process of cleaning the vacuum holes. The cleaning part may include a cleaning solution supply part configured to provide a cleaning solution into the vacuum holes, and a cleaning solution discharge part configured to discharge the cleaning solution from the vacuum holes.

An apparatus and method for reprocessing a medical device includes a decontamination basin, a first flush conduit, a second flush conduit, and a manifold. The first and second flush conduits have respective first and second coupling ports configured to fluidly connect to the medical device positioned within the decontamination basin. The manifold is fluidly connected to the first and second flush conduits and configured to distribute the fluid received therein accordingly. The apparatus also includes a first valve, a second valve, and a primary pump configured to discharge the fluid into the manifold at a predetermined supply flow rate. The first and second valve are positioned respectively in the first and second flush conduits for balancing the respective flow rates discharged therefrom at a first predetermined conduit flow rate and a second predetermined conduit flow rate.

A Clean in Place assembly for a food processor includes a self-cleaning valve assembly, wherein the self-cleaning valve assembly is in fluid communication with a food flow path in the food processor. The self-cleaning valve assembly includes a valve receiving chamber and valve configured to selectively fluidly connect a food flow path inlet port to a food flow path outlet port; fluidly connect the food flow path inlet port to a multivalent port; and fluidly connect a treating solution to a dead space between the valve and the valve receiving cavity. Food product can be selectively drained or retained in food flow path, wherein the self-cleaning valve can be continuously or intermittently exposed to a treating solution for treating non-food flow path portions of the self-cleaning valve assembly.

A plurality of bypass lines are configured to selectively engage a corresponding plurality of food flow paths in a food processor. Each bypass line fluidly communicates with an inlet of a pressure regulating valve such that a common pressure occurs at a spaced position in each food flow path providing an equal pressure at the pressure regulating valve.