A pig cleaning and transportation system is disclosed. Exemplary implementations include a platform with a plurality of apertures; a plurality of securing mechanisms, each mechanism within each aperture and configured to hold a pig and allow it to rotate around its longitudinal axis; a base underneath the platform; and a cleaning element connected to the base and positioned on each longitudinal side of the platform in pressure contact with the pigs on the plurality of securing mechanisms, each cleaning element including at least one cleaning material surface.

A particle removal device for a filling machine configured to form, fill, and seal individual packages is provided. The particle removal device comprises an air supply pipe, and a controller being programmed to activate the particle removal device such that a jet of air is directed into a ready-to-fill package passing the particle removal device.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A beverage container washing system may be used for rapid washing and/or sanitizing of beverage containers, e.g., for use in a retail environment to wash and/or sanitize customer-provided beverage containers prior to filling the beverage containers with purchased beverages, among other applications. The beverage container washing system may include a holder that utilizes a base that supports a beverage container in an inverted orientation and a retainer that supports a sidewall of the beverage container and includes a lateral opening through which the beverage container may be passed during insertion into and/or removal from the holder.

A milk cart comprises a chassis, a storage tank coupled to the chassis, and a conveyor system comprising an exit configured to connect to a return line that terminates inside the storage tank. The return line comprises a first portion extending vertically towards a bottom of the inside of the storage tank, a second portion extending vertically in a direction towards a top of the inside the storage tank, and a base portion extending from the first portion to the second portion. The second portion is positioned at a lateral distance from an interior of a wall of the storage tank and further comprises an upper end comprising at least one opening.

A reagent bottle cleaning device is provided, comprising a base, a cleaning assembly, and a cleaning block. The cleaning assembly comprises a pushing cylinder and a mounting plate. A plurality of mounting grooves are disposed on the mounting plate. Each mounting groove is provided with a cleaning motor. The cleaning motor is provided with a cleaning screw rod. The cleaning block is provided with cleaning grooves corresponding to the cleaning screw rods. Injecting pumps are disposed between the cleaning block and the cleaning assembly. The injecting pumps are connected to the base by lifting cylinders. Full-automatic quick cleaning of reagent bottles can be realized under the effect of a main control chip.

A reagent bottle cleaning device is provided, comprising a base, a cleaning assembly, and a cleaning block. The cleaning assembly comprises a pushing cylinder and a mounting plate. A plurality of mounting grooves are disposed on the mounting plate. Each mounting groove is provided with a cleaning motor. The cleaning motor is provided with a cleaning screw rod. The cleaning block is provided with cleaning grooves corresponding to the cleaning screw rods. Injecting pumps are disposed between the cleaning block and the cleaning assembly. The injecting pumps are connected to the base by lifting cylinders. Full-automatic quick cleaning of reagent bottles can be realized under the effect of a main control chip.

An apparatus for removing labels from reusable containers, which includes supporting elements for at least one reusable container, on the outer lateral surface of which at least one label to be removed is applied; the apparatus includes at least one cutting device, which is provided with at least one blade which is configured to be arranged, with its cutting portion in a position that faces at least one portion of the label, and movement elements for moving the aforesaid portion of the label which are adapted to actively impart, on command, to the portion of the label, a movement away from the outer lateral surface of the container, in order to bring the portion of the label against the cutting portion of the blade.

Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.