The present invention provides a uni-compartmental knee joint prosthesis (1) which includes a tibial component (2) and a femoral component (3). The tibial component (2) has a fixation portion (10) adapted to be fixed to an upper end of a prepared tibia (T) in a patient, and a bearing portion (30) presenting an articulation surface (32) formed from a ceramic material, wherein the bearing portion (30) is adapted for movement relative to the fixation portion (10). The femoral component (3) is adapted to be fixed to a lower end of a prepared femur (F) in a patient, and comprises a body portion (50) presenting an articulation surface (56) formed from a ceramic material for engagement with the articulation surface (32) of the tibial component (2). The articulation surfaces (32, 56) of the tibial and femoral components are adapted for essentially congruent engagement over a full range of movement of the prosthesis.

Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.

A method for outer surface finishing of a workpiece may include coaxially placing the workpiece inside a vessel. The exemplary vessel may include at least one baffle that may radially extend from an inner wall of the vessel toward the outer surface of the workpiece. The exemplary method may further include pouring an abrasive medium inside the vessel, rotating the abrasive medium about the longitudinal axis in a first direction within the vessel relative to the outer surface of the workpiece by rotating the vessel about the longitudinal axis, and concurrently rotating the workpiece within the vessel about the longitudinal axis in a second direction, the second direction being opposite the first direction.

Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.

A method for modifying the mechanical and surface properties of a component. The method involves: removably attaching a component to at least one component support that is located within a vibratory trough of a component treatment apparatus, the at least one component support being a support shaft upon which the component is removably mountable within the vibratory trough; supplying the vibratory trough with treatment media; moving the component support or the vibratory trough so that the component is immersed into the treatment media; vibrating the vibratory trough to provide a substantially uniform surface treatment of the component, the vibratory trough being movable by at least one trough vibrating mechanism whose actuation is controlled by a controller in response to signals received from at least one sensor located on or within the vibratory trough; removing the component from the treatment media; and detaching the component from the component support.

A microchannel electrophoresis-assisted micro-ultrasonic machining apparatus based on a 3D printing mold includes a working platform, a power supply, a 3D printing mold, a working solution tank and an ultrasonic vibration system. The working platform is configured to secure the apparatus. The working solution tank is provided with electrophoresis-assisted electrodes. The ultrasonic vibration system is secured to the lower end of the transfer module. The positive electrode of the electrophoretic DC power supply is electrically connected to the tool and the negative electrode is electrically connected to the electrophoresis-assisted electrodes. A workpiece to be processed is assembled with a 3D printing mold. After assembly, the workpiece and the 3D printing mold are placed in the middle of the electrophoresis-assisted electrodes inside the working solution tank and arranged to correspond to the tool.

A method for smoothing and polishing metals via ion transport by free solid bodies comprises connecting a part to be treated to a positive pole (anode) of a current generator and subjecting the part to friction with a set of particles comprising electrically conductive free solid bodies charged with negative electrical charge in a gaseous environment.

Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 .Math.in.

A method for smoothing and polishing metals via ion transport by free solid bodies. The method includes connecting a part to be treated to a pole of a current generator and subjecting the part to friction with a set of particles that includes electrically charged and electrically conductive free solid bodies in a gaseous environment.

A rotor polishing device, including a housing with a space therein for holding rotors in need of polishing, an inlet for pumping a polishing lapper into the housing, and a rotational assembly for rotating the rotors during the polishing process. The rotor polishing device is useful for polishing rotors commonly used by rotary screw compression systems.