Embodiments relate to a porous polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors and a process for preparing the same. According to the embodiments, the size and distribution of the plurality of pores contained in the porous polishing pad can be adjusted in light of the volume thereof. Thus, the plurality of pores have an apparent volume-weighted average pore diameter in a specific range, thereby providing a porous polishing pad that is excellent in such physical properties as polishing rate and the like.

A bonded abrasive article can include a body including a bond material, abrasive particles contained within the bond material, and pores contained within the body. At least a portion of the pores of the body can include a coating. In one aspect, the coating can be a poly(p-xylylene) polymer applied via vapor deposition. The coated abrasive body can maintain a high permeability and pore volume after coating, and the coating can provide an increase in flexural strength and corrosion resistance to the abrasive article, thereby greatly enhancing its life time.

An elastic TPU polishing composite membrane includes a TPU adhesive film layer, an abrasive layer and a lubricant anti-static coating layer, wherein the TPU adhesive film layer is overlappedly adhered to one surface of the abrasive layer and the lubricant anti-static coating layer is evenly coated on other surface of the abrasive layer.

Polycrystalline diamond includes a working surface and a peripheral surface extending around an outer periphery of the working surface. The polycrystalline diamond includes a first volume including an interstitial material and a second volume having a leached region that includes boron and titanium. A method of fabricating a polycrystalline diamond element includes positioning a first volume of diamond particles adjacent to a substrate, the first volume of diamond particles including a material that includes a group 13 element, and positioning a second volume of diamond particles adjacent to the first volume of diamond particles such that the first volume of diamond particles is disposed between the second volume of diamond particles and the substrate, the second volume of diamond particles having a lower concentration of material including the group 13 element than the first volume of diamond particles. Various other articles, assemblies, and methods are also disclosed.

Polycrystalline diamond may include a working surface and a peripheral surface extending around an outer periphery of the working surface. The polycrystalline diamond includes a first volume including an interstitial material and a second volume having a leached region that includes boron and titanium. A method of fabricating a polycrystalline diamond element may include positioning a first volume of diamond particles adjacent to a substrate, the first volume of diamond particles including a material that includes a group 13 element, and positioning a second volume of diamond particles adjacent to the first volume of diamond particles such that the first volume of diamond particles is disposed between the second volume of diamond particles and the substrate, the second volume of diamond particles having a lower concentration of material including the group 13 element than the first volume of diamond particles.

The present invention relates to a grinding disk or wheel, flap disk or cut-off disk which will increase the effectiveness of each battery charge during tool use.

The invention relates to an abrasive support, to an abrasive article comprising such a support, to the method for producing the same, and to the use of the abrasive article. According to at least one embodiment, the abrasive support comprises an impregnated support material based on synthetic fibers. The impregnated support material has at least on one side having a surface roughness R.sub.z of 100 m to 500 m, and having an R.sub.max of 250 m to 600 m. The support has an air permeability of at most 20 l/m.sup.2 s.

An abrasive tool includes a support, on which a plurality of abrasive flaps is arranged. The abrasive flaps each have a base and abrasive material, which is attached to the base by means of a binder. To increase the useful life and total material abrasion, the abrasive flaps are reinforced by a cured filling resin. The reinforcement of the abrasive flaps reduces the cyclical deflection thereof around a zero position due to workpiece machining, thereby avoiding increased wear on the abrasive flaps.

A flexible abrasive (10) with a preset shape corresponding to the shape of the operating head of a machine tool such as a sanding machine and comprising a first support (16) made from a woven or non-woven material where a lower surface can be fixed to a backing plate or a pad of the operating head. The abrasive surface is made from at least two strips (20-23) applied side by side and parallel to each other and where the second support (11) of each strip (20-23) is separately fixed on the first support (16), and where the abrasive surface (18) is shaped so that it can be applied to the backing plate or pad of the operating head.

The invention relates to an abrasive support comprising a support material composed of at least one wet- or dry-laid nonwoven based on natural and/or synthetic fibers. The support material is impregnated with a thermally curable polymer solution on one side and with an aqueous polymer dispersion on the opposite side. The thermally curable polymer solution penetrates at least 50% and at most 80% of the thickness of the support material, while the aqueous polymer dispersion penetrates at least 25% and at most 50% of the thickness of the support material.