According to one embodiment, a template includes a base body, and a first film. The base body has a first surface and a second surface. The first surface includes silicon oxide and spreads along a first plane. The second surface crosses the first plane. The first film includes aluminum oxide. A direction from the second surface toward the first film is aligned with a direction perpendicular to the second surface. A thickness of the first film along the direction perpendicular to the second surface is not less than 0.3 nm and not more than 10 μm. The first surface includes an unevenness.

Systems and methods of shaping a patterned or planarized film layer. Which may include contacting formable material on a substrate with a template during a contacting period, Which may also include reducing, during the contacting period, a pressure in an environment beyond an edge of the substrate from a first pressure to a second pressure, while the template is contacting the formable material.

An attached body production method having a sealing material disposing step for disposing a sealing material on a mold and/or a molded product so that a molded surface of the molded product is surrounded by the sealing material when the mold and the molded product are attached together; a pressure reduction step for reducing the pressure of the atmosphere around the mold and the molded product in a state where the mold and the molded product are separated from each other; a sealing step for putting the mold and the molded product on top of each other, and sealing a space between the mold 1 and the molded product with the sealing material; and a first pressure-application step for applying pressure with a fluid in a state where the space between the mold and the molded product is sealed, wherein the sealing material has fluidity in at least the sealing step, and is configured to attach to only one of the mold and the molded product when the molded product is released from the mold.

An imprint apparatus including an irradiation unit configured to irradiate a peripheral region of a pattern region of a mold with light while the mold is in contact with an imprint material on a substrate so as to make a polymerization degree of the imprint material between the peripheral region and the substrate fall within a range higher than a polymerization degree in an initial state when the imprint material is supplied onto the substrate and lower than a polymerization degree in a final state when the imprint material is cured, and a control unit configured to control, for each shot region on the substrate, a value of a second parameter for controlling irradiation with the light from the irradiation unit based on a value of a first parameter for controlling a contact step.

Provided are a method for producing a composition for forming an imprint pattern, including a filtering step of filtering a precursor composition to obtain a composition for forming an imprint pattern, in which in the filtering step, a speed at which the precursor composition passes through a filter does not continuously exceed 0.9 cm per hour for 10 seconds or longer; a method for producing a cured substance formed of the composition for forming an imprint pattern; an imprint pattern producing method using the composition for forming an imprint pattern; and a method for manufacturing a device, which includes the imprint pattern producing method.

An imprinting, texturing or embossing system for a roll-to-plate process including at least one roller and at least one device capable to exert a resetting force to the starting position of the imprinting process after imprinting wherein the roller is a freely rotating roller.

Curing processing for curing a curable composite is performed in a state where a mold held by a mold holding unit and a substrate held by a substrate holding unit are in contact with each other through a curable composite, and mold release processing of the mold from the substrate is performed after the curing processing. In a case where the mold release processing fails, additional curing processing is performed. This enables releasing the mold even without performing recovery processing by an operator, thereby making it possible to provide a molding apparatus that is beneficial in productivity.

An insulation sheet forming apparatus that forms an insulation sheet having one or more bent regions includes an unwinding module; a preforming module configured to form a preforming region on the insulation sheet supplied from the unwinding module; and a bending module configured to form the bent region on the insulation sheet by bending the insulation sheet supplied from the preforming module, in which the preforming module has a width which is adjustable in a width direction that intersects a movement direction of the insulation sheet.

Techniques herein include methods of patterning a substrate using surface energy differences found in some fluorinated polymers or polymers with long chain alkyl functionality that promotes surface or top layer segregation in a bilayer polymer system to facilitate overburden removal when the polymer mixture is deposited over a relief pattern. The method allows for fast removal of the overburden to expose the anti-spacer region which, after acid diffusion and subsequent deprotection, is also soluble in a developer. Incorporating the highly developer-soluble polymer at the top of the top layer removes the need for the remaining polymer to have a specific dissolution rate in developer.

In order to provide an imprint device and the like that can efficiently maintain a concentration of a gas when imprinting is sequentially performed, the imprint device includes: a mold holding unit configured to a mold; a substrate holding unit configured to holding a substrate; a gas supply unit configured to supply a gas to an imprint space between the mold and the substrate; and a control unit configured to control the gas supply unit and an imprinting operation, wherein the control unit is configured to sequentially perform imprinting on a plurality of imprint regions of the substrate, and the control unit is configured to, when a moving direction of the substrate between the imprint regions is changed from a first direction to a second direction, supply a gas to the imprint space in the first direction and the second direction using the gas supply unit during the imprinting operation on the imprint region before the change in the moving direction.