A method of assembling a display panel includes laminating a back plate to a display layer to form an untrimmed display panel, the back plate including a metal layer that includes a trimming path defined by one or more line segments having reduced metal content compared to other portions of the metal layer. The method further includes trimming the untrimmed display panel along the one or more line segments to define one or more edges of the display panel. For one or more locations along each of the one or more edges defined by the line segments, the metal layer is flush with the corresponding edge of the display panel.

The invention concerns a glazing comprising a first glass sheet having a surface; a printed layer on a part of the surface of the first glass sheet; a conductive coating on a part of the printed layer forming a coated print portion and on a part of the surface of the first glass sheet forming a coated glass portion; first and second busbars in electrical contact with the conductive coating and comprising a first or second busbar portion arranged on a different axis therefrom; a first printed layer portion adjacent the first or second busbar portion forming an adjustable coated print portion between the first and second busbars.

An atomization component includes: a matrix; and a heating film. The matrix includes an atomization surface. The heating film is arranged on the atomization surface, and when energized, heats and atomizes an aerosol-generating substrate on the atomization surface. The heating film includes a metal heating layer and an inorganic protection layer that are stacked, the inorganic protection layer being arranged on a surface of the metal heating layer that is away from the matrix. The metal heating layer includes at least two sub-metal layers that are sequentially stacked. Any two adjacent sub-metal layers have different components.

An atomization component includes: a matrix; and a heating film. The matrix includes an atomization surface. The heating film is arranged on the atomization surface, and when energized, heats and atomizes an aerosol-generating substrate on the atomization surface. The heating film includes a metal heating layer and an inorganic protection layer that are stacked, the inorganic protection layer being arranged on a surface of the metal heating layer that is away from the matrix. The metal heating layer includes at least two sub-metal layers that are sequentially stacked. Any two adjacent sub-metal layers have different components.

A metallic lustrous member with radio wave transmissibility is provided, which is capable of being easily produced, while ensuring a structure in which not only chromium or indium but also any of some other metals such as aluminum is formed as a metal layer on a continuous surface of any of various materials, and also an article using the member is provided. A production method for a metallic lustrous member with radio wave transmissibility, which is capable of easily forming, as a metal layer, not only chromium or indium but also any of some other metals such as aluminum, on a continuous surface of any of various materials. The metallic lustrous member comprises a substrate having radio wave transmissibility, and an aluminum layer formed directly on a continuous surface of the substrate. The aluminum layer has a discontinuous region including a plurality of separated segments which are mutually discontinuous.

A display film includes a transparent glass layer having a thickness of 250 micrometers or less, or in a range from 25 to 100 micrometers. A transparent energy dissipation layer is fixed to the transparent glass layer. The transparent energy dissipation layer has a glass transition temperature of 27 degrees Celsius or less, a Tan Delta peak value of 0.5 or greater, or from 1 to 2 and a Young's Modulus (E′) greater than 0.9 MPa over a temperature range of −40 degrees Celsius to 70 degrees Celsius. In a preferred embodiment, the transparent energy dissipation layer comprises a cross-linked polyurethane layer or a cross-linked polyurethane acrylate layer.

A display film includes a transparent glass layer having a thickness of 250 micrometers or less, or in a range from 25 to 100 micrometers. A transparent energy dissipation layer is fixed to the transparent glass layer. The transparent energy dissipation layer has a glass transition temperature of 27 degrees Celsius or less, a Tan Delta peak value of 0.5 or greater, or from 1 to 2 and a Young's Modulus (E′) greater than 0.9 MPa over a temperature range of −40 degrees Celsius to 70 degrees Celsius. In a preferred embodiment, the transparent energy dissipation layer comprises a cross-linked polyurethane layer or a cross-linked polyurethane acrylate layer.

According to one embodiment, a glass may include from about 50 mol. % to about 70 mol. % SiO.sub.2; from about 12 mol. % to about 35 mol. % B.sub.2O.sub.3; from about 4 mol. % to about 12 mol. % Al.sub.2O.sub.3; greater than 0 mol. % and less than or equal to 1 mol. % alkali metal oxide, wherein Li.sub.2O is greater than or equal to about 20% of the alkali metal oxide; from about 0.3 mol. % to about 0.7 mol. % of Na.sub.2O or Li.sub.2O; and greater than 0 mol. % and less than 12 mol. % of total divalent oxide, wherein the total divalent oxide includes at least one of CaO, MgO and SrO, and wherein a ratio of Li.sub.2O (mol. %) to (Li.sub.2O (mol. %)+(Na.sub.2O (mol. %)) is greater than or equal 0.4 and less than or equal to 0.6. The glass may have a relatively low high temperature resistivity and a relatively high low temperature resistivity.

According to one embodiment, a glass may include from about 50 mol. % to about 70 mol. % SiO.sub.2; from about 12 mol. % to about 35 mol. % B.sub.2O.sub.3; from about 4 mol. % to about 12 mol. % Al.sub.2O.sub.3; greater than 0 mol. % and less than or equal to 1 mol. % alkali metal oxide, wherein Li.sub.2O is greater than or equal to about 20% of the alkali metal oxide; from about 0.3 mol. % to about 0.7 mol. % of Na.sub.2O or Li.sub.2O; and greater than 0 mol. % and less than 12 mol. % of total divalent oxide, wherein the total divalent oxide includes at least one of CaO, MgO and SrO, and wherein a ratio of Li.sub.2O (mol. %) to (Li.sub.2O (mol. %)+(Na.sub.2O (mol. %)) is greater than or equal 0.4 and less than or equal to 0.6. The glass may have a relatively low high temperature resistivity and a relatively high low temperature resistivity.

A thermal insulating glass includes a glass substrate and a thermal insulating layer. The thermal insulating layer includes composite tungsten oxide and a binder. The composite tungsten oxide is represented by formula (1): M.sub.xWO.sub.3-yA.sub.y (1), where M is an alkali metal element or an alkaline earth metal element, W is tungsten, O is oxygen, A is a halogen element, and 0<x≤1 and 0≤y≤0.5. And the binder includes one or more of the following components: silicon dioxide, titanium dioxide, and aluminium oxide. The thermal insulating glass can prevent the occurrence of obscuration. The thermal insulating has infrared reflectivity, high strength and good wear resistance, and can effectively resist high temperature and strong oxidation environment.