Patent classifications
B41F1/26
Process and device for the production of layered materials with synchronous-pore effect
Disclosed is a process for the production of synchronous-pore layered materials. Also disclosed is a device for the conduct of the process. In further aspects, the invention relates to layered materials which can be produced by the process, and also to wood-composite boards equipped with the layered materials produced by the process of the invention.
Process and Device for the Production of Layered Materials with Synchronous-Pore Effect
Disclosed is a process for the production of synchronous-pore layered materials. Also disclosed is a device for the conduct of the process. In further aspects, the invention relates to layered materials which can be produced by the process, and also to wood-composite boards equipped with the layered materials produced by the process of the invention.
Process and device for the production of layered materials with synchronous-pore effect
Disclosed is a process for the production of synchronous-pore layered materials. Also disclosed is a device for the conduct of the process. In further aspects, the invention relates to layered materials which can be produced by the process, and also to wood-composite boards equipped with the layered materials produced by the process of the invention.
Process and Device for the Production of Layered Materials with Synchronous-Pore Effect
Disclosed is a process for the production of synchronous-pore layered materials. Also disclosed is a device for the conduct of the process. In further aspects, the invention relates to layered materials which can be produced by the process, and also to wood-composite boards equipped with the layered materials produced by the process of the invention.
Imprint apparatus and imprint method
An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
Imprint apparatus and imprint method
An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
IMPRINT APPARATUS AND IMPRINT METHOD
An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
IMPRINT APPARATUS AND IMPRINT METHOD
An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.