B81C2201/015

Method and system for fabricating glass-based nanostructures on large-area planar substrates, fibers, and textiles

A method for manufacturing glass-based micro- and nanostructure comprising the step of dewetting a thin-film glass layer on a textured substrate to form the micro- and nanostructure from the thin-film glass layer.

Microfluidic chip and a method for the manufacture of a microfluidic chip

A novel microfluidic chip is proposed for performing a chemical or biochemical test in a metered reaction volume. The microfluidic chip has a body which defines an inner flow volume. An inlet has been provided to the body for connecting the inner flow volume to the ambient space. A waste channel forms part of the inner flow volume and is in fluid communication with the inlet. A sample channel also forms part of the inner flow volume and is in fluid communication with the inlet. The sample channel includes a first hydrophobic stop and a second hydrophobic stop at a distance from the first hydrophobic stop so as to provide a metered reaction volume there between. An expelling channel is in fluid communication with the metered reaction volume of the sample channel through the first hydrophobic stop. A sample reservoir is in fluid communication with the metered reaction volume of the sample channel through the second hydrophobic stop.

METHOD OF MANUFACTURING MOLD, MOLD, IMPRINT METHOD, IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
20210173303 · 2021-06-10 ·

The present invention provides a method of manufacturing a mold including performing a process of processing a surface of a base member so that a mark region where a mark is to be formed on the surface, which is to be a pattern surface of the mold, will be recessed lower than a pattern region, and performing a process of a second process of arranging, on the mark region which has been recessed, a mark member made of a material which has an optical physical property different from an optical physical property of the mold and a protection layer configured to cover the mark member so that a difference between a height of a surface of the mark and a height of a surface of the pattern will fall within a predetermined range.

A microfluidic chip and a method for the manufacture of a microfluidic chip

A novel microfluidic chip is proposed for performing a chemical or biochemical test in a metered reaction volume. The microfluidic chip has a body which defines an inner flow volume. An inlet has been provided to the body for connecting the inner flow volume to the ambient space. A waste channel forms part of the inner flow volume and is in fluid communication with the inlet. A sample channel also forms part of the inner flow volume and is in fluid communication with the inlet. The sample channel includes a first hydrophobic stop and a second hydrophobic stop at a distance from the first hydrophobic stop so as to provide a metered reaction volume there between. An expelling channel is in fluid communication with the metered reaction volume of the sample channel through the first hydrophobic stop. A sample reservoir is in fluid communication with the metered reaction volume of the sample channel through the second hydrophobic stop.

Method and System for Fabricating Glass-Based Nanostructures on Large-Area Planar Substrates, Fibers, and Textiles

A method for manufacturing glass-based micro- and nanostructure comprising the step of dewetting a thin-film glass layer on a textured substrate to form the micro- and nanostructure from the thin-film glass layer.

Imprint lithography method, method for manufacturing master template using the method and master template manufactured by the method

An exemplary embodiment discloses an imprint lithography method including: forming a first imprint pattern on a base substrate in a first area; forming a first resist pattern on the base substrate in a second area, the second area partially overlapping the first area; etching a third area using the first imprint pattern and the first resist pattern as an etch barrier, wherein the third area is a portion of the first area that is not overlapped with the second area; removing the first imprint pattern and the first resist pattern; forming a second imprint pattern on the base substrate in a fourth area which overlaps the second area and partially overlaps the third area; forming a second resist pattern on the base substrate in the third area; and etching the second area using the second imprint pattern and the second resist pattern as an etch barrier.