Patent classifications
B82B3/008
Agglomerating nanoparticles
A method of agglomerating nanoparticles to form larger agglomerates is shown. The nanoparticles are mixed with a resin to form a first mixture (803) of agglomerates, having sizes over a range that includes agglomerates considered to be too large, suspended in the resin. A bead milling cylinder (802) produces a second mixture (808) with fewer large agglomerates. A filter (1001) removes the remaining large agglomerates. The resulting mill base is cut with a solvent before deployment.
METHOD OF FUNCTIONALIZING SURFACES OF CARBON NANOMATERIALS
The invention relates to a method of functionalizing surfaces of carbon nanomaterials using oxygen in the air. The method is clean and eco-friendly with virtually zero chemical usage and zero waste generation. The dispersion of the surface-functionalized carbon nanomaterials is excellent in organic solvents.
LAMINATED CERAMIC CHIP COMPONENT INCLUDING NANO THIN FILM LAYER, MANUFACTURING METHOD THEREFOR, AND ATOMIC LAYER VAPOR DEPOSITION APPARATUS THEREFOR
The present disclosure discloses the laminated ceramic chimp component including an element part having a ceramic main body and an internal electrode placed in the ceramic main body; an external electrode part having a first external electrode and a second external electrode, the first and second external electrodes being provided with side electrodes covering both side surfaces of the ceramic main body, respectively, upper electrodes covering portions of both sides of an upper surface of the ceramic main body, respectively, and lower electrodes covering portions of both sides of a lower surface of the ceramic main body, respectively; and a nano thin film layer formed of electric insulation material and applied to a region including the upper electrodes, the method for manufacturing the same and the atomic layer deposition apparatus for the same.
Fibrous carbon nanostructure dispersion liquid
Provided is a fibrous carbon nanostructure dispersion liquid having excellent fibrous carbon nanostructure dispersibility. The fibrous carbon nanostructure dispersion liquid contains a solvent and one or more fibrous carbon nanostructures having a percentage mass loss of 3.0 mass % or less upon heating from 23° C. to 200° C. at a heating rate of 20° C./min in a nitrogen atmosphere as measured by thermogravimetric analysis.
NANOFLUIDIC DEVICE WITH SILICON NITRIDE MEMBRANE
Embodiments of the present disclosure provide nanopore devices, such as nanopore sensors and/or other nanofluidic devices. In one or more embodiments, a nanopore device contains a substrate, an optional lower protective oxide layer disposed on the substrate, a membrane disposed on the lower protective oxide layer, and an optional upper protective oxide layer disposed on the membrane. The membrane has a pore and contains silicon nitride. The silicon nitride has a nitrogen to silicon ratio of about 0.98 to about 1.02 and the membrane has an intrinsic stress value of about −1,000 MPa to about 1,000 MPa. The nanopore device also contains a channel extending through at least the substrate, the lower protective oxide layer, the membrane, the upper protective oxide layer, and the upper protective silicon nitride layer.
Nano-electromechanical system (NEMS) device structure and method for forming the same
A NEMS device structure and a method for forming the same are provided. The NEMS device structure includes a first dielectric layer formed over a substrate, and a first conductive layer formed in the first dielectric layer. The NEMS device structure includes a second dielectric layer formed over the first dielectric layer, and a first supporting electrode a second supporting electrode and a beam structure formed in the second dielectric layer. The beam structure is formed between the first supporting electrode and the second supporting electrode, and the beam structure has a T-shaped structure. The NEMS device structure includes a first through hole formed between the first supporting electrode and the beam structure, and a second through hole formed between the second supporting electrode and the beam structure.
Nanofluidic device with silicon nitride membrane
Embodiments of the present disclosure provide nanopore devices, such as nanopore sensors and/or other nanofluidic devices. In one or more embodiments, a nanopore device contains a substrate, an optional lower protective oxide layer disposed on the substrate, a membrane disposed on the lower protective oxide layer, and an optional upper protective oxide layer disposed on the membrane. The membrane has a pore and contains silicon nitride. The silicon nitride has a nitrogen to silicon ratio of about 0.98 to about 1.02 and the membrane has an intrinsic stress value of about −1,000 MPa to about 1,000 MPa. The nanopore device also contains a channel extending through at least the substrate, the lower protective oxide layer, the membrane, the upper protective oxide layer, and the upper protective silicon nitride layer.
Agglomerating Nanoparticles
A method of agglomerating nanoparticles to form larger agglomerates is shown. The nanoparticles are mixed with a resin to form a first mixture (803) of agglomerates, having sizes over a range that includes agglomerates considered to be too large, suspended in the resin. A bead milling cylinder (802) produces a second mixture (808) with fewer large agglomerates. A filter (1001) removes the remaining large agglomerates. The resulting mill base is cut with a solvent before deployment.
SUSPENDED TYPE NANOWIRE AND MANUFACTURING METHOD THEREOF
Provided is a suspended type nanowire that is fixed and electrically connected to each of a first electrode disposed on a substrate and a second electrode disposed on the substrate and spaced apart from the first electrode and suspended on the substrate. Here, a cross-section in a direction perpendicular to a longitudinal direction of the suspended type nanowire includes at least one curved part, and the curve part includes a reference surface and at least one side surface extending downward from the reference surface.
Forming nanoscale pores in a semiconductor structure utilizing nanotubes as a sacrificial template
A method of forming a semiconductor structure includes forming two or more catalyst nanoparticles from a metal layer disposed over a substrate in two or more openings of a hard mask patterned over the metal layer. The method also includes growing two or more carbon nanotubes using the catalyst nanoparticles, and removing the carbon nanotubes to form two or more nanoscale pores. The two or more nanoscale pores may be circular nanoscale pores having a substantially uniform diameter. The two or more openings in the hard mask may have non-uniform size, and the substantially uniform diameter of the two or more nanopores may be controlled by a size of the carbon nanotubes.