A device and a method for producing hydrogen and byproduct oxygen by using green electricity electrolyzed water are provided. The device comprises an oxygen purifying system, a heat exchange system, an air separation compression and expansion system, an air separation rectification system and a liquid oxygen storage system. The method comprises the following steps: first, purifying oxygen prepared by electrolyzing water by green electricity to remove impurities such as hydrogen, carbon monoxide, carbon dioxide and water in the oxygen, then feeding the pure oxygen into the heat exchange system, performing heat exchange liquefaction to obtain liquid oxygen, coupling the liquid oxygen generated by rectification of the air separation rectification system, and obtaining pressurized oxygen through the heat exchange system and the air separation compression and expansion system.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

A device and a method for recovering by-product oxygen from water-electrolysis hydrogen production using a low-temperature method are provided, solving the waste problem of by-product oxygen in the green water-electrolysis hydrogen production system. The device according to the present disclosure comprises an oxygen clarifying system, a pressurizing and heat exchanging system, and a circulating gas compression and expansion refrigeration system. The recovering method according to the present disclosure comprises the following steps: first clarifying and purifying the by-product oxygen from water-electrolysis hydrogen production is to remove hydrogen, carbon monoxide, carbon dioxide, water and other impurities in the oxygen; and then, liquefying, pressurizing and heat exchanging the pure oxygen to obtain the product oxygen and liquid oxygen with required pressure. In the whole process, the cooling capacity is provided by the circulating gas expansion refrigeration system.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

A method is provided for refining an argon gas, in which oxygen is added to the argon gas containing hydrogen, carbon monoxide (CO), and oxygen as impurities so that the hydrogen and the CO are converted into water and carbon dioxide in a catalyst tower, or hydrogen is added to the argon gas so that the oxygen is converted into the water; the method including: monitoring the hydrogen, the CO, and the oxygen on an outlet side of the catalyst tower; and at least one of adding the oxygen to the argon gas when any one of the hydrogen and the CO is detected on the outlet side of the catalyst tower, and adding the hydrogen when the oxygen is detected, wherein the oxygen or the hydrogen to be added is intermittently added to the catalyst tower relative to continuous supply of the argon gas to the catalyst tower.

The invention provides a process of purifying a fluid useful in a manufacturing process, particularly in the manufacture of silicon wafers, by removing one or more impurities; and apparatus for use in the process.

A method for extending useful life of a sorbent for purifying a gas by sorption of an impurity is provided. The method generating a electrical discharge within the gas to obtain a spectral emission representative of a concentration of the impurity. The method also includes monitoring the concentration of the impurity according to the spectral emission. The method also includes lowering the concentration of the impurity by conversion of at least a portion of the impurity into a secondary impurity having a greater affinity to the sorbent than the impurity. The method also includes comparing the concentration of the impurity to a polluting concentration and managing the sorption of the gas onto the sorbent according to the comparison.

An apparatus and method for reclaiming and filtering helium for reuse in analytical instruments. The method includes inputting the output gas stream from a gas chromatograph split vent and subjecting the input gas stream to a mini-particulate filter. The gas stream is also subjected to a molecular sieve filter and a finishing filter to isolate the helium carrier gas. The finishing filter removes trace contaminants that are not caught in the previous filters. The method utilizes a pump and controller to maintain a constant pressure, preferably between 80 and 100 psi, to avoid back-flow contamination and to ensure movement of the gas stream through the filters. Additionally, the use of a relief valve prevents back pressure from entering into the gas chromatograph. The filtered helium gas may be stored for future use or re-introduced directly to the input carrier gas stream of a gas chromatograph.

Device and method for purifying a gas mixture to produce a concentrated gas, notably neon, starting from a mixture comprising neon, said device including, in a cold box housing a cryogenic purification circuit comprising, in series, at least one unit for purifying the mixture by cryogenic adsorption at a temperature between 65K and 100K and notably 65K, then a unit for cooling the mixture to a temperature between 25 and 65 K and then a unit for cryogenic distillation of the mixture to produce the concentrated liquid at the outlet of the cryogenic distillation unit, characterized in that the unit for cooling the mixture to a temperature between 25 and 65 K comprises at least one cryocooler that extracts thermal power from the mixture via a heat exchanger.