Patent classifications
C01B2210/0065
Hydrogen purification device and hydrogen purification method
Provided are a hydrogen purification device and a hydrogen purification method whereby hydrogen having a high purity can be purified at a high yield from a starting gas. The hydrogen purification device comprises: a starting gas source that supplies a starting gas, said starting gas containing hydrogen molecules and/or a hydride, to a discharge space; a plasma reactor that defines at least a part of the discharge space; a hydrogen flow channel that is connected to the discharge space; and leads out purified hydrogen from the starting gas source; a hydrogen separation membrane that partitions the discharge space from the hydrogen flow channel defines at least a part of the discharge space by one surface thereof and defines at least a part of the hydrogen flow channel by the other surface thereof; an electrode that is positioned outside the discharge space; and an adsorbent that is filled in the discharge space and adsorbs the starting gas. In the hydrogen purification method according to the present invention, the starting gas is adsorbed by the adsorbent in the discharge space. Hydrogen molecules, which have been desorbed from the adsorbent by discharge, are allowed to penetrate through the hydrogen separation membrane 4 and led out into the hydrogen flow channel.
Gas recovering apparatus, semiconductor manufacturing system, and gas recovering method
According to one embodiment, a gas recovering apparatus includes a casing and a tube. The casing is provided with an inlet through which a gas flows in, a first outlet for discharging a first gas containing a gas to be recovered of the gas, and a second outlet for discharging a second gas other than the first gas of the gas. The casing is evacuated via the first outlet. The tube is provided in the casing from the inlet to the second outlet, and has a high permeability to the first gas and a low permeability to the second gas.
GAS RECOVERING APPARATUS, SEMICONDUCTOR MANUFACTURING SYSTEM, AND GAS RECOVERING METHOD
According to one embodiment, a gas recovering apparatus includes a casing and a tube. The casing is provided with an inlet through which a gas flows in, a first outlet for discharging a first gas containing a gas to be recovered of the gas, and a second outlet for discharging a second gas other than the first gas of the gas. The casing is evacuated via the first outlet. The tube is provided in the casing from the inlet to the second outlet, and has a high permeability to the first gas and a low permeability to the second gas.
Hydrogen Purification Device and Hydrogen Purification Method
Provided are a hydrogen purification device and a hydrogen purification method whereby hydrogen having a high purity can be purified at a high yield from a starting gas. The hydrogen purification device comprises: a starting gas source that supplies a starting gas, said starting gas containing hydrogen molecules and/or a hydride, to a discharge space; a plasma reactor that defines at least a part of the discharge space; a hydrogen flow channel that is connected to the discharge space; and leads out purified hydrogen from the starting gas source; a hydrogen separation membrane that partitions the discharge space from the hydrogen flow channel defines at least a part of the discharge space by one surface thereof and defines at least a part of the hydrogen flow channel by the other surface thereof; an electrode that is positioned outside the discharge space; and an adsorbent that is filled in the discharge space and adsorbs the starting gas. In the hydrogen purification method according to the present invention, the starting gas is adsorbed by the adsorbent in the discharge space. Hydrogen molecules, which have been desorbed from the adsorbent by discharge, are allowed to penetrate through the hydrogen separation membrane 4 and led out into the hydrogen flow channel.