Patent classifications
C01B5/02
Method for producing deuterium-depleted water and method for producing deuterium-enriched water
Water is separated into deuterium-depleted water having a low deuterium concentration and deuterium-enriched water having a high deuterium concentration easily and at low cost. A method for separating water into deuterium-depleted water and deuterium-enriched water, the method including: adsorbing water vapor on an adsorbent including a pore body having pores 6 while supplying water vapor to and allowing the water vapor to pass through the adsorbent for a predetermined period of time; recovering deuterium-enriched water containing a large amount of heavy water 8 from the water vapor not adsorbed on the adsorbent; and then recovering deuterium-depleted water containing a large amount of light water 7 from the water vapor adsorbed on the adsorbent.
Method for producing deuterium-depleted water and method for producing deuterium-enriched water
Water is separated into deuterium-depleted water having a low deuterium concentration and deuterium-enriched water having a high deuterium concentration easily and at low cost. A method for separating water into deuterium-depleted water and deuterium-enriched water, the method including: adsorbing water vapor on an adsorbent including a pore body having pores 6 while supplying water vapor to and allowing the water vapor to pass through the adsorbent for a predetermined period of time; recovering deuterium-enriched water containing a large amount of heavy water 8 from the water vapor not adsorbed on the adsorbent; and then recovering deuterium-depleted water containing a large amount of light water 7 from the water vapor adsorbed on the adsorbent.
APPARATUS AND METHOD FOR CONCENTRATING HYDROGEN ISOTOPES
In an embodiment, a method of concentrating a hydrogen isotope, comprises delivering a fluid comprising the hydrogen isotope to be concentrated and an additional gas other than then hydrogen isotope to an anode of an electrochemical cell comprising a hydron exchange membrane comprising hydrons of the hydrogen isotope, and also comprising said anode on a first side of the hydron exchange membrane, a cathode on a second side of the hydron exchange membrane, and an electrical circuit connection between the anode and the cathode; removing a first stream in fluid communication with the cathode, the first stream comprising concentrated hydrogen isotope; and removing a second stream in fluid communication with the anode, comprising the additional gas delivered to the anode depleted of the hydrogen isotope.
Structurally altered gas molecule produced from water and method of generation thereof
A method for generating a structurally altered gas molecule from water. An example method includes placing an electrolyte solution in a chemical reaction chamber, adding purified water to the chemical reaction chamber, and applying a focused magnetic field and an electric field to a mixture of the purified water and the electrolyte solution to cause generation of the structurally altered gas molecule from the purified water. The structurally altered gas molecule is a combination of two parts of hydrogen and one part of oxygen. The structurally altered gas molecule has a hydrogen-oxygen-hydrogen bond angle between 94 degrees and 104 degrees and hydrogen-oxygen bond length between 0.95 Angstrom and 1.3 Angstrom. The structurally altered gas molecule is stable at a pressure exceeding 300 pounds per square inch gauge.
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
In one embodiment, a semiconductor manufacturing apparatus includes a substrate processor configured to process a substrate with a gas of a first substance and a gas of a second substance, and discharge a first gas including the first substance and/or the second substance. The apparatus further includes a disposer configured to discard the first gas discharged from the substrate processor. The apparatus further includes a recoverer configured to generate a second gas including the second substance by using the first substance in the first gas discharged from the substrate processor, and supply the second gas to the substrate processor.
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
In one embodiment, a semiconductor manufacturing apparatus includes a substrate processor configured to process a substrate with a gas of a first substance and a gas of a second substance, and discharge a first gas including the first substance and/or the second substance. The apparatus further includes a disposer configured to discard the first gas discharged from the substrate processor. The apparatus further includes a recoverer configured to generate a second gas including the second substance by using the first substance in the first gas discharged from the substrate processor, and supply the second gas to the substrate processor.
Device and method for multistage continuous preparation of deuterium depleted water
The present application discloses a method for preparing deuterium depleted water, wherein natural water is fed into the device of the present disclosure, and the liquid phase stream continuously flows backwards stage by stage under the combined action of the low-pressure steam compressors and the stream delivery pumps. In a single-stage system, the deuterium is deprived depending on the difference in vapor pressure between .sup.1H.sub.2O and .sup.2H.sub.2O (and/or .sup.1H.sup.2HO), and finally, the deuterium depleted water is produced.
Process for isolating 170 isotope from water and process for concentrating 170 isotope using the same
A process for isolating .sup.17O from water and a process for concentrating .sup.17O by using the same are provided. The process for isolating .sup.17O from water includes: mixing .sup.17O-containing water with formaldehyde to prepare an aqueous formaldehyde solution; heating the aqueous formaldehyde solution to generate a vapor mixture containing water vapor and formaldehyde vapor; and obtaining .sup.17O-depleted water, residual formaldehyde, and a gas mixture containing hydrogen and .sup.17O-enriched carbon monoxide, through photodissociating the vapor mixture. An .sup.17O-enriched water production process includes: an operation of adding hydrogen to the gas mixture to induce a catalytic methanation reaction to synthesize methane (CH.sub.4) and .sup.17O-enriched water (H.sub.2.sup.17O) through methanation, the operation being carried out following the process for isolating .sup.17O from water.
Process for isolating 170 isotope from water and process for concentrating 170 isotope using the same
A process for isolating .sup.17O from water and a process for concentrating .sup.17O by using the same are provided. The process for isolating .sup.17O from water includes: mixing .sup.17O-containing water with formaldehyde to prepare an aqueous formaldehyde solution; heating the aqueous formaldehyde solution to generate a vapor mixture containing water vapor and formaldehyde vapor; and obtaining .sup.17O-depleted water, residual formaldehyde, and a gas mixture containing hydrogen and .sup.17O-enriched carbon monoxide, through photodissociating the vapor mixture. An .sup.17O-enriched water production process includes: an operation of adding hydrogen to the gas mixture to induce a catalytic methanation reaction to synthesize methane (CH.sub.4) and .sup.17O-enriched water (H.sub.2.sup.17O) through methanation, the operation being carried out following the process for isolating .sup.17O from water.
Systems and methods for separating surface materials from a fluid using acoustic pressure shock waves
A method of separating material, such as foam, sludge, oil or grease, at a fluid's surface, by applying acoustic pressure shock waves to the material and the fluid's surface such that acoustic pressure shock waves are propagated in liquid medium of the fluid and in gas medium above the fluid surface.