Disclosed is a process for treating a gas stream containing hydrochloric acid, hydrofluoric acid, a fluorinated compound and halogenated organic compounds, wherein the gas stream is subjected to: (a) a step of washing with an acid solution to obtain a washed gas stream; (b) a step of adiabatic absorption in an aqueous solution of the hydrochloric acid contained in said washed gas stream, to collect a solution of hydrochloric acid; (c) a step of adsorption on activated carbon of the impurities present in said hydrochloric acid solution, to obtain a purified hydrochloric acid solution and a gas stream containing said fluorinated compound; and (d) a step of bringing said purified hydrochloric acid solution into contact with a silica gel. Also disclosed is a plant for the implementation of this process, and also a process for preparing a fluorinated compound comprising the catalytic pyrolysis of an organofluorine compound.

The invention relates to a method for flexibly controlling the use of hydrochloric acid having an HCl concentration of at least 10 wt %, in particular at a volume flow rate of at least 1 m.sup.3/h, obtained from a continuous chemical production process (A). In the method, purified hydrochloric acid (54) from a hydrochloric acid store (E) is optionally fed to a dispatch station (H), an HCl electrolysis station (F) and a chloralkali electrolysis station (L), which are consumption points for the hydrochloric acid, or to a neutralisation station (G) in that if one or more of said consumption points (H, F, L) is not available or if there are bottlenecks at the consumption points (H, F, L), the hydrochloric acid (54) is fed to the neutralisation station (G) and neutralised with concentrated alkali solution (55), in particular with concentrated sodium hydroxide solution, and the resulting salt solution (56) is fed either to the chloralkali process station (L) or to a disposal station (M).

A process of producing chlorine gas by catalytic oxidation of hydrogen chloride including: incorporating an oxidizing agent such as ozone, hydrogen peroxide solution etc. into a gas stream of hydrogen chloride containing impurities, conducting oxidation pretreatment of the gas stream under the action of ultrasonic wave, such that the impurities contained in the gas stream are oxidized; where the gas stream obtained after the oxidation pretreatment is allowed to pass through a separating device, the oxidized impurities in the form of liquid and/or the oxidized impurities in the form of solid are removed from the gas stream so as to obtain a purified gas stream of hydrogen chloride, and thereafter the purified gas stream of hydrogen chloride is well mixed with a gas stream containing molecular oxygen, the resultant gas mixture is preheated to a reaction temperature, and then catalytically oxidized to produce chlorine gas.

Disclosed is a method and a device for the continuous neutralization of hydrochloric acid at an industrial scale.

A method for processing hydrogen chloride from isocyanate preparation comprises the steps: a) providing hydrogen chloride; b) purifying the hydrogen chloride provided; and furthermore step c) or step d): c) bringing the purified hydrogen chloride into contact with water and/or with hydrochloric acid which is not saturated with respect to uptake of hydrogen chloride, d) further processing the purified hydrogen chloride to chlorine by partial oxidation. The hydrogen chloride provided in step a) contains organic and/or nitrogen-containing impurities and in step b) the purification is carried out by bringing hydrogen chloride into contact with hydrochloric acid which is saturated to the extent of 90% with respect to uptake of hydrogen chloride at least in a first gas scrubber (10) and circulating this hydrochloric acid at least partially through the first gas scrubber (10).

Disclosed is a process for treating a gas stream containing hydrochloric acid, hydrofluoric acid, a fluorinated compound and halogenated organic compounds, wherein the gas stream is subjected to: (a) a step of washing with an acid solution to obtain a washed gas stream; (b) a step of adiabatic absorption in an aqueous solution of the hydrochloric acid contained in said washed gas stream, to collect a solution of hydrochloric acid; (c) a step of adsorption on activated carbon of the impurities present in said hydrochloric acid solution, to obtain a purified hydrochloric acid solution and a gas stream containing said fluorinated compound; and (d) a step of bringing said purified hydrochloric acid solution into contact with a silica gel. Also disclosed is a plant for the implementation of this process, and also a process for preparing a fluorinated compound comprising the catalytic pyrolysis of an organofluorine compound.

A method includes treating a first brine stream including a plurality of minerals with an anti-scalant to produce a treated brine. The first brine stream is provided by a wastewater treatment system. The method also includes directing the treated brine to a first nanofiltration (NF) system disposed downstream from and fluidly coupled to the wastewater treatment system, generating a first NF permeate stream and a first NF non-permeate stream from the treated brine in the first NF system, directing the first NF non-permeate stream to a mineral removal system disposed downstream from and fluidly coupled to the first NF system, and removing the plurality of minerals from the first NF non-permeate stream to generate a first overflow stream in the mineral removal system. The first overflow stream comprises at least a portion of the plurality of minerals. The method also includes routing a first portion of the first overflow stream to a hydrochloric acid (HCl) and sodium hydroxide (NaOH) production system disposed downstream from and fluidly coupled to the mineral removal system. The HCl and NaOH production system includes a second NF system that may receive the first portion of the first overflow stream and may generate a second brine stream from the first portion of the first overflow stream. The method further includes directing the second brine stream to a first electrodialysis (ED) system disposed within the HCl and NaOH production system and fluidly coupled to the second NF system. The first ED system may generate HCl and NaOH from the second brine stream.

Modular, portable processes and apparatus for the production of tight gas (including shale gas) and tight oil (including shale oil) and for the conversion of tight oil into a plurality of marketable fuels are described which enable easy deployment and start-up and are specifically useful in remote areas. Furthermore, these modular processes and apparatus are configured to use co-produced tight gas as a source of processing energy. Another feature of the modular processes is to substantially reduce the use of fracking water and process water. In some embodiments modular processes include (A) Purified Salt Production; (B) Modular Hydrochloric Acid (HCl) Production; (C) Hydrogen Production by Autothermal Reformer; (D) Optimized Hydraulic Fracturing; (E) Desalting with Bi-Electric Configuration with an Interchanger; (F) Desalter Water Recovery and Recyclling; (G) Precut Column with a Gas-Fired Heater; (H) Crude Distillation with a Gas-Fired Heater; (I) Hydrodesulfurization using Reactive Distillation; and (J) Vacuum Distillation.

Impure gaseous hydrogen chloride from organochlorosilane hydrolysis is freed of impurities by first scrubbing with an organochlorosilane, which may be the same or different from the organochlorosilane(s) hydrolyzed, and then further scrubbing with chloromethane. The purified gaseous hydrogen chloride is preferably used in chlorosilane synthesis.

There is provided a hydrogen chloride mixture hardly corroding a metal. The hydrogen chloride mixture contains hydrogen chloride and water. The hydrogen chloride mixture is filled into a filling container so that a part of the hydrogen chloride mixture is liquid. The concentration of water in a gas phase in the hydrogen chloride mixture is 0.001 mol ppm or more and less than 4.5 mol ppm.