Patent classifications
C01F5/04
Explosive formulations of mixture of carbon dioxide and a reducing agent and methods of using same
The disclosure relates to embodiments of an explosive formulation comprising a detonable mixture of an oxidizing agent such as carbon dioxide, and a material that decomposes the oxidizing agent exothermically (a reducing agent), and additives that increase the mixture's shock sensitivity. The formulations may be used in a method to produce diamonds or nano oxides or in other applications that use traditional explosives such as, but not limited to: ammonium nitrate and fuel oil combinations (ANFO), watergel explosives, emulsion explosives and RDX.
Explosive formulations of mixture of carbon dioxide and a reducing agent and methods of using same
The disclosure relates to embodiments of an explosive formulation comprising a detonable mixture of an oxidizing agent such as carbon dioxide, and a material that decomposes the oxidizing agent exothermically (a reducing agent), and additives that increase the mixture's shock sensitivity. The formulations may be used in a method to produce diamonds or nano oxides or in other applications that use traditional explosives such as, but not limited to: ammonium nitrate and fuel oil combinations (ANFO), watergel explosives, emulsion explosives and RDX.
Monolayer-by-monolayer growth of MgO layers using mg sublimation and oxidation
A MgO layer is formed using a process flow wherein a Mg layer is deposited at a temperature <200° C. on a substrate, and then an anneal between 200° C. and 900° C., and preferably from 200° C. and 400° C., is performed so that a Mg vapor pressure >10.sup.−6 Torr is reached and a substantial portion of the Mg layer sublimes and leaves a Mg monolayer. After an oxidation between −223° C. and 900° C., a MgO monolayer is produced where the Mg:O ratio is exactly 1:1 thereby avoiding underoxidized or overoxidized states associated with film defects. The process flow may be repeated one or more times to yield a desired thickness and resistance×area value when the MgO is a tunnel barrier or Hk enhancing layer. Moreover, a doping element (M) may be added during Mg deposition to modify the conductivity and band structure in the resulting MgMO layer.
METHOD FOR STRENGTHENING BIOLOGICAL MANGANESE OXIDATION USING MAGNETIC FIELD AND USE THEREOF
The present disclosure discloses a method for strengthening a biological manganese oxidation using a magnetic field and use thereof. The method includes steps of inoculating a manganese-oxidizing microorganism into a culture medium containing Mn.sup.2+, performing magnetization treatment in a culture process, and then collecting a biogenic manganese oxide. The method includes steps of performing a primary magnetic field treatment at a magnetic field intensity of 0.2-50 mT for 1-5 h when culturing is performed for 6-12 h, continuing culturing after the primary magnetization treatment, and performing magnetization treatment once every other 24 h for culture time of 72 h. A magnetic field is applied to accelerate an oxidation rate of a manganese-oxidizing microorganism to Mn.sup.2+and a biological manganese oxidation rate is respectively improved by 36.4% and 23.8% under an action of an alternating magnetic field or a constant magnetic field within 72 h.
METHOD FOR STRENGTHENING BIOLOGICAL MANGANESE OXIDATION USING MAGNETIC FIELD AND USE THEREOF
The present disclosure discloses a method for strengthening a biological manganese oxidation using a magnetic field and use thereof. The method includes steps of inoculating a manganese-oxidizing microorganism into a culture medium containing Mn.sup.2+, performing magnetization treatment in a culture process, and then collecting a biogenic manganese oxide. The method includes steps of performing a primary magnetic field treatment at a magnetic field intensity of 0.2-50 mT for 1-5 h when culturing is performed for 6-12 h, continuing culturing after the primary magnetization treatment, and performing magnetization treatment once every other 24 h for culture time of 72 h. A magnetic field is applied to accelerate an oxidation rate of a manganese-oxidizing microorganism to Mn.sup.2+and a biological manganese oxidation rate is respectively improved by 36.4% and 23.8% under an action of an alternating magnetic field or a constant magnetic field within 72 h.
LITHIUM-ION BATTERY
A lithium-ion battery includes: a cathode; an anode; and a non-aqueous electrolyte solution, in which the cathode includes a current collector and a cathode mixture applied on at least one side of the current collector, the cathode mixture includes a lithium transition metal oxide as a cathode active material, the anode includes a lithium titanium complex oxide as an anode active material, and the non-aqueous electrolyte solution includes a fluorine-containing boric acid ester.
ENGINEERING PROCESS FOR HALOGEN SALTS, USING TWO IDENTICAL ELECTRODES
The invention relates to a process and devices for reducing impurities in molten salts, a molten salt being purified in an electrochemical process by applying a voltage between two electrodes. According to the invention, the voltage is varied so that in different phases different electrodes act as cathode or anode.
Monolayer-By-Monolayer Growth of MgO Layers Using Mg Sublimation and Oxidation
A MgO layer is formed using a process flow wherein a Mg layer is deposited at a temperature <200° C. on a substrate, and then an anneal between 200° C. and 900° C., and preferably from 200° C. and 400° C., is performed so that a Mg vapor pressure >10.sup.−6 Torr is reached and a substantial portion of the Mg layer sublimes and leaves a Mg monolayer. After an oxidation between −223° C. and 900° C., a MgO monolayer is produced where the Mg:O ratio is exactly 1:1 thereby avoiding underoxidized or overoxidized states associated with film defects. The process flow may be repeated one or more times to yield a desired thickness and resistance×area value when the MgO is a tunnel barrier or Hk enhancing layer. Moreover, a doping element (M) may be added during Mg deposition to modify the conductivity and band structure in the resulting MgMO layer.
Monolayer-by-monolayer growth of MgO layers using Mg sublimation and oxidation
A MgO layer is formed using a process flow wherein a Mg layer is deposited at a temperature <200° C. on a substrate, and then an anneal between 200° C. and 900° C., and preferably from 200° C. and 400° C., is performed so that a Mg vapor pressure >10.sup.−6 Torr is reached and a substantial portion of the Mg layer sublimes and leaves a Mg monolayer. After an oxidation between −223° C. and 900° C., a MgO monolayer is produced where the Mg:O ratio is exactly 1:1 thereby avoiding underoxidized or overoxidized states associated with film defects. The process flow may be repeated one or more times to yield a desired thickness and resistance x area value when the MgO is a tunnel barrier or Hk enhancing layer. Moreover, a doping element (M) may be added during Mg deposition to modify the conductivity and band structure in the resulting MgMO layer.
Method of producing hydrogen gas from water
The invention is a method for coproducing Hydrogen and certain metals by reducing a metal oxide(s) with MgH.sub.2 or with metal and water, wherein the non-water oxides used in the method include SiO.sub.2, Cr.sub.2O.sub.3, TiO.sub.2, SnO.sub.2, ZrO.sub.2, CuO, ZnO, WO.sub.3, Ta.sub.2O.sub.5, Cs.sub.2Cr.sub.2O.sub.7 or CsOH. The method reacts the MgH.sub.2 with a metal oxide or directly uses metal and water instead of a hydride, and initiates a reaction with the metal oxide. The reaction releases Hydrogen and reduces the subject oxide to metal.