C01P2004/62

LITHIUM-STUFFED GARNET ELECTROLYTES WITH SECONDARY PHASE INCLUSIONS

The instant disclosure sets forth multiphase lithium-stuffed garnet electrolytes having secondary phase inclusions, wherein these secondary phase inclusions are material(s) which is/are not a cubic phase lithium-stuffed garnet but which is/are entrapped or enclosed within a lithium-stuffed garnet. When the secondary phase inclusions described herein are included in a lithium-stuffed garnet at 30-0.1 volume %, the inclusions stabilize the multiphase matrix and allow for improved sintering of the lithium-stuffed garnet. The electrolytes described herein, which include lithium-stuffed garnet with secondary phase inclusions, have an improved sinterability and density compared to phase pure cubic lithium-stuffed garnet having the formula Li.sub.7La.sub.3Zr.sub.2O.sub.12.

MODIFIED METAL OXIDE PARTICLE MATERIAL AND METHOD FOR PRODUCING SAME

A modified metal oxide particle material includes: a metal oxide particle material having, on a surface thereof, a functional group other than a phenyl group; and a modifying material formed of a silicon-containing compound having a phenyl group. The modifying material is adhered to the surface of the metal oxide particle material. When the modified metal oxide particle material is washed with methyl ethyl ketone, a ratio (C/H) of a carbon content C (% by mass) to a surface area H (m.sup.2) per 1 g is 0.05 or less, after the washing. The ratio (C/H) is reduced by 0.1 or more, and the modifying material is removed by 50% or more by mass, after the washing compared with before the washing.

ELECTROMAGNETIC WAVE ABSORBING PARTICLES, ELECTROMAGNETIC WAVE ABSORBING PARTICLE DISPERSION LIQUID, AND METHOD FOR MANUFACTURING ELECTROMAGNETIC WAVE ABSORBING PARTICLES
20230052771 · 2023-02-16 ·

Electromagnetic Electromagnetic wave absorbing particles including cesium tungsten oxide represented by a general formula Cs.sub.xW.sub.1-yO.sub.3-z (0.2≤x≤0.4, 0<y≤0.4, and 0<z≤0.46) and having an orthorhombic crystal structure or a hexagonal crystal structure are provided.

METHOD FOR REUSING ACTIVE MATERIAL USING POSITIVE ELECTRODE SCRAP
20230051670 · 2023-02-16 ·

There is provided a method for collecting and reusing an active material from positive electrode scrap. The method of reusing a positive electrode active material of the present disclosure includes (a-1) immersing a positive electrode scrap comprising an active material layer on a current collector into a basic solution to separate the active material layer from the current collector, (a-2) thermally treating the active material layer in air for thermal decomposition of a binder and a conductive material in the active material layer, and collecting an active material in the active material layer, (b) washing the active material collected from the step (a-2) with a lithium compound solution which is basic in an aqueous solution and drying, and (c) annealing the active material washed from the step (b) with a lithium precursor to obtain a reusable active material.

Biological inks and coatings and associated methods

The disclosed method and related systems and devices relate to producing a pigment from microbial biomass. The pigment may be an engineered black pigment. The method may include a thermal processing step where the microbial biomass is charred. The biomass in the charred and pre-charred state can be washed chemically and/or mechanically. In another step the biomass is ground via a grinding of milling process. The grinding/milling may occur at any various points in the process. In some embodiments the biomass has a particle size between 0.01 and 100 microns.

Cerium based particles
11578235 · 2023-02-14 · ·

The present invention relates to cerium-based particles and their use as a component of a composition for polishing. The present invention also relates to the method of preparation of the cerium-based particles.

Carbonate apatite with high carbonate content

A carbonate apatite highly containing carbonate groups, having excellent heavy metal adsorption capacity is provided. The carbonate apatite contains not less than 15.6% by weight carbonate groups, preferably contains at least one of copper (Cu), zinc (Zn), strontium (Sr), magnesium (Mg), potassium (K), iron (Fe), and sodium (Na), and preferably has a Ca/P molar ratio of not less than 1.5.

Electrothermic compositions
11578213 · 2023-02-14 · ·

According to the invention there is provided an electrothermic composition comprising: a carbon component; a graphite component having a crystallinity of 99.9% and wherein the graphite is heat treated at a temperature of 2500° C. to 3000° C., and a binder, whereby the composition has a thermal coefficient of electrical resistance (TCR) of ±0.0001 to 0.0010 per ° C. over a temperature range of from about 20° C. to 60° C. in an airborne environment, wherein the ratio of the first conductive component and the second resistor component is selected between 10:1 to 1:10.

Submicron sized silicon powder with low oxygen content
11581529 · 2023-02-14 · ·

A submicron sized Si based powder having an average primary particle size between 20 nm and 200 nm, wherein the powder has a surface layer comprising SiO.sub.x, with 0<x<2, the surface layer having an average thickness between 0.5 nm and 10 nm, and wherein the powder has a total oxygen content equal or less than 3% by weight at room temperature. The method for making the powder comprises a step where a Si precursor is vaporized in a gas stream at high temperature, after which the gas stream is quenched to obtain Si particles, and the Si particles are quenched at low temperature in an oxygen containing gas.

Semiconductor particles, dispersion, film, optical filter, building member, and radiant cooling device
11579347 · 2023-02-14 · ·

Provided are semiconductor particles including a Group 12-16 semiconductor including a Group 12 element and a Group 16 element, a Group 13-15 semiconductor including a Group 13 element and a Group 15 element, or a Group 14 semiconductor including a Group 14 element, the semiconductor particles having a plasma frequency of 1.7×10.sup.14 rad/s to 4.7×10.sup.14 rad/s and a maximum length of 1 nm to 2,000 nm; and a dispersion, a film, an optical filter, a building member, or a radiant cooling device, in all of which the semiconductor particles are used.