A water treatment system includes: EDI having deionization chamber that deionizes water that contains boron and concentration chambers in which concentrated water flows; and a cooler to cool the water supplied to deionization chamber or the concentrated water supplied to concentration chambers. Alternatively, water treatment system includes EDI having deionization chamber that deionizes water that contains boron, concentration chambers in which concentrated water flows, and electrode chambers in which electrode water flows; a cooler that adjusts temperature of the water or temperature of the concentrated water supplied to concentration chamber; and a controller that controls the cooler such that the cooler adjusts the temperature of the water supplied to deionization chamber or the temperature of the concentrated water supplied to the concentration chambers within a range of 10-23° C., based on the temperature of the water, temperature of treated water of EDI, the temperature of the concentrated water, or temperature of the electrode water.

The present application discloses a ozonated water delivery system which includes at least one contacting device in communication with at least one ultrapure water source configured to provide ultrapure water, at least one ultrapure water conduit coupled to the ultrapure water source, at least one solution in communication with the contacting device and the ultrapure water source via the ultrapure water conduit, one or more gas sources containing at least one gas in communication with at least one of the ultrapure water source, the ultrapure water conduit, and the solution conduit, at least one mixed gas conduit in communication with the at gas source and the contacting device and configured to provide at least one mixed gas to the contacting device, and at least one ozonated water output conduit may be in communication with the contacting device.

A metal-chelating resin includes (a) a compound represented by Formula (I):

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or a stereoisomeric form thereof or a salt thereof, wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.a, R.sup.b, R.sup.c and R.sup.d are as defined herein; and (b) an organic polymer resin having at least one complementary reactive functional group covalently linked with at least one linking group of the compound represented by Formula (I).

Methods and devices are disclosed for passing Chronic Total Occlusion (CTO) from subintimal location and re-entry into a true-lumen of the patient using transient fenestration approach. The transient fenestration is induced by balloon dilatation within the CTO, and a guidewire quickly trails into a true lumen.

A gas dissolved liquid manufacturing device includes: a pump configured to pressurize a liquid; a pipe communicating with the pump; a nozzle disposed in the pipe, the nozzle being configured to generate micro bubbles using a supplied gas; and a gas-liquid separation tank whose upper part communicates with the pipe, the gas-liquid separation tank being configured to separate a gas-liquid mixture generated by the nozzle into a gas and a liquid.

An ultrapure water (UPW) generation and verification system can include a cleaning chemical station, a cleanup column, a conductivity verification station, and a holding reservoir, in fluid communication with one another. The cleaning chemical station can be configured to selectably permit a flow of water to pass therethrough to the cleanup column or to block the flow of water and instead deliver a cleaning chemical to the cleanup column. The conductivity verification station can be configured to selectably perform at least one of the following: permit water to flow from the cleanup column to the holding reservoir; direct fluid to waste; or test the conductivity of the water for a purity level.

The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 μg/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 MΩ.Math.cm.

A control system has a water purification module and a control module. The water purification module has a preliminary filter and a reverse osmosis filter. The control module regularly controls the purification and the drainage of the water purification module, and solves the problem that the TDS value of the water on both sides of the reverse osmosis membrane is too high after the water purifier is on standby for a period of time. The control system regularly drains high concentration water on both sides of the reverse osmosis membrane to improve water purification efficiency.

The present invention relates to a method for disinfection and/or function control of a chlorine sensor, which is preferably used in water conditioning for medical or pharmaceutical purposes, a chlorine-containing solution different from the measurement solution being specifically supplied to the chlorine sensor at time intervals.

A method and system is provided for treating waste generated from manufacturing operations including at least one of Printed Circuit Boards Fabrication (PCB FAB), General Metal Finishing (GMF), semiconductors manufacturing, chemical milling, and Physical Vapour Deposition (PVD). The method and system are used to create zero liquid discharge recycling.