One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m.sup.2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. On aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

The present invention relates to a silica glass including bublles in the number of 1×10.sup.7/cm.sup.3 to 1×10.sup.15/cm.sup.3 and having a density of 0.5 g/cm.sup.3 to 1.95 g/cm.sup.3. The present invention also relates to a method for producing a silica glass, including: a step of depositing SiO.sub.2 fine particles generated by flame hydrolysis of a silicon compound, to obtain a silica glass porous body; a step of heating and sintering the silica glass porous body in an inert gas atmosphere, to obtain a silica glass dense body; and a step of performing a foaming treatment to heat the silica glass dense body under a reduced pressure condition.

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing silicon dioxide particles, making a glass melt out of the silicon dioxide particles in an oven and making a quartz glass body out of at least part of the glass melt. The oven has a gas outlet through which gas is removed from the oven, wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0° C. One aspect further relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, making a glass melt out of silicon dioxide granulate, and making a quartz glass body out of at least part of the glass melt. The size of the quartz glass body is reduced to obtain a quartz glass grain. The quartz glass body is processed to make a preform and an opaque quartz glass body is made from the preform. One aspect further relates to an opaque quartz glass body which is obtainable by this process. One aspect further relates to a reactor and an arrangement, which are each obtainable by further processing of the opaque quartz glass body.

An apparatus and related process for producing a high-strength weld between two glass components. Chucks clamp and move respective first ends of the glass components toward each other inside an enclosure, where the second ends are heated, softened, and welded together in a weld zone. The enclosure has layers of stacked quartz glass bricks and allows the weld zone to cool slowly and avoid stress. A propane quartz melting torch directs a flame inside the enclosure and toward the second ends as the glass components move toward each other. The flame softens the second ends and creates substantially smooth polished surfaces in the weld zone having an increased hydroxide content. At least 80% of the weld zone has a hydroxide content greater than about 10 ppm average in a 10 μm depth from the surface and the tensile strength of the weld zone is above about 10 MPa.

Provided are such a method of manufacturing a hollow synthetic quartz glass porous preform and method of manufacturing a synthetic quartz glass cylinder as described below: even a soot body having an outer diameter of more than 300 mm can be produced without significantly increasing a load on an apparatus, such as a centrifugal force generated during growth; even when manufactured at low-speed rotation, the soot body is free of any crack or rupture; and a target can be easily extracted. Specifically, provided is a method of manufacturing a hollow porous quartz glass preform by an OVD method, wherein the rotation peripheral speed of the soot body is controlled so as to be practically constant by fluctuating the rotation number of the soot body on the basis of a fluctuating outer diameter of the soot body during growth, and wherein a frequency factor γ calculated by the following equation is set so as to fall within the range of 0.13≤γ<1.0 in a range in which the outer diameter of the soot body is more than 250 mm: γ=S/(L.Math.N.sub.m), where S represents the moving speed (mm/min) of the burners, L represents the moving distance (mm) of the burners, and N.sub.m represents the lowest value (rpm) of the rotation number of the soot body, which is fluctuated.

Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.

The invention relates to a process for preparing a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt from the silicon dioxide granulate in a melting crucible, and iii.) Making a quartz glass body from at least a part of the glass melt, wherein the melting crucible is comprised in an oven and is made of at least one material comprising tungsten or molybdenum or a combination thereof. The invention further relates to a quartz glass body which can be obtained by this process. Further, the invention relates to a light guide, an illuminant and a formed body, each of which can be obtained by processing the quartz glass body further.

Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.