Patent classifications
C03C13/005
Holding material for gas treatment device, gas treatment device, and production processes therefor
Provided are a holding material for a gas treatment device, which is inexpensive, has a simple structure, and exhibits high holding force, a gas treatment device, and a method for manufacturing the same. A holding material for a gas treatment device according to the present invention is a holding material, which is a holding material to be arranged, in a gas treatment device including a treatment structure and a casing for housing the treatment structure, between the treatment structure and the casing, the holding material including silica fibers and an alumina sol in an amount of 3 parts by mass or more in terms of a solid content with respect to 100 parts by mass of the silica fibers.
GLASS COMPOSITION RESISTANT TO ION BOMBARDMENT, CLADDING GLASS OF MICROCHANNEL PLATE, MICROCHANNEL PLATE AND PREPARING METHOD THEREOF
The present invention relates to the field of special glass materials and preparation, in particular to a glass composition resistant to ion bombardment, a cladding glass of microchannel plate, a microchannel plate and a preparing method thereof. The coordination between the components and the adjustment of the dosage, in particular, oxides with high bond energy containing scandium and/or strontium and/or zirconium and/or molybdenum, can be introduced into the glass material, so as to improve the surface binding energy (SBE), thereby improving the ion bombardment resistance of the glass material and significantly prolonging the working life of the microchannel plate during detecting high-energy ions directly, while meeting other necessary properties such as good anti-crystallization, good acid and alkali resistance, appropriate softening temperature, thermal expansion coefficient, and bulk resistance, etc.
SURFACE-MODIFIED GLASS FIBER WITH BI-COMPONENT CORE-SHEATH STRUCTURE
Surface-modified glass fiber, comprising: a core made of a first glass fiber material; a surface layer that encloses the core completely in a sheath-like way; wherein the surface layer has a higher silicon dioxide percentage and a higher porosity compared to the core.