The present invention relates to a silica glass including bublles in the number of 1×10.sup.7/cm.sup.3 to 1×10.sup.15/cm.sup.3 and having a density of 0.5 g/cm.sup.3 to 1.95 g/cm.sup.3. The present invention also relates to a method for producing a silica glass, including: a step of depositing SiO.sub.2 fine particles generated by flame hydrolysis of a silicon compound, to obtain a silica glass porous body; a step of heating and sintering the silica glass porous body in an inert gas atmosphere, to obtain a silica glass dense body; and a step of performing a foaming treatment to heat the silica glass dense body under a reduced pressure condition.

A glass composition includes: 50 mol % to 69 mol % SiO.sub.2; 12.5 mol % to 25 mol % Al.sub.2O.sub.3; 0 mol % to 8 mol % B.sub.2O.sub.3; greater than 0 mol % to 4 mol % CaO; greater than 0 mol % to 17.5 mol % MgO; 0.5 mol % to 8 mol % Na.sub.2O; 0 mol % to 2.5 mol % La.sub.2O.sub.3; and greater than 8 mol % to 18 mol % Li.sub.2O, wherein (Li.sub.2O+Na.sub.2O+MgO)/Al.sub.2O.sub.3 is from 0.9 to less than 1.3; and Al.sub.2O.sub.3+MgO+Li.sub.2O+ZrO.sub.2+La.sub.2O.sub.3+Y.sub.2O.sub.3 is from greater than 23 mol % to less than 50 mol %. The glass composition may be characterized by at least one of the following: a K.sub.1C value measured by a chevron short bar method of at least 0.75; and a K.sub.1C value measured by a double torsion method of at least 0.8. The glass composition is chemically strengthenable. The glass composition may be used in a glass article or a consumer electronic product.

A glass composition includes: 50 mol % to 69 mol % SiO.sub.2; 12.5 mol % to 25 mol % Al.sub.2O.sub.3; 0 mol % to 8 mol % B.sub.2O.sub.3; greater than 0 mol % to 4 mol % CaO; greater than 0 mol % to 17.5 mol % MgO; 0.5 mol % to 8 mol % Na.sub.2O; 0 mol % to 2.5 mol % La.sub.2O.sub.3; and greater than 8 mol % to 18 mol % Li.sub.2O, wherein (Li.sub.2O+Na.sub.2O+MgO)/Al.sub.2O.sub.3 is from 0.9 to less than 1.3; and Al.sub.2O.sub.3+MgO+Li.sub.2O+ZrO.sub.2+La.sub.2O.sub.3+Y.sub.2O.sub.3 is from greater than 23 mol % to less than 50 mol %. The glass composition may be characterized by at least one of the following: a K.sub.1C value measured by a chevron short bar method of at least 0.75; and a K.sub.1C value measured by a double torsion method of at least 0.8. The glass composition is chemically strengthenable. The glass composition may be used in a glass article or a consumer electronic product.

A method for manufacturing an SiO.sub.2—TiO.sub.2 based glass upon a target by a direct method, includes a first process of preheating the target and a second process of growing an SiO.sub.2—TiO.sub.2 based glass ingot to a predetermined length upon the target which has been preheated, wherein the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature.

A method for producing titanium-doped synthetic quartz glass includes: (A) providing a liquid SiO.sub.2 feedstock material that comprises more than 60% by weight of the polyalkylsiloxane D4; (B) evaporating the liquid SiO.sub.2 feedstock material to produce a gaseous SiO.sub.2 feedstock vapor; (C) evaporating a liquid TiO2 feedstock material to produce a gaseous TiO2 feedstock vapor; (D) converting the SiO.sub.2 feedstock vapor and the TiO2 feedstock vapor into SiO2 particles and TiO2 particles, respectively; (E) depositing the SiO2 particles and the TiO2 particles on a deposition surface while forming a titanium-doped SiO.sub.2 soot body; (F) vitrifying the titanium-doped SiO.sub.2 soot body while forming the synthetic quartz glass, whereby the TiO2 concentration of the synthetic quartz glass is between 5% by weight and 11% by weight. The liquid SiO.sub.2 feedstock material comprises at least one additional component made of the polyalkylsiloxane D3 having a weight fraction of mD3 and one additional component made of the polyalkylsiloxane D5 having a weight fraction of mD5 at a weight ratio of mD3/mD5 in a range of 0.01 to 1, and the liquid SiO.sub.2 feedstock material provided is evaporated while maintaining the weight ratio of mD3/mD5 and at least 99% by weight thereof are evaporated to form the gaseous SiO.sub.2 feedstock vapor.

A high-density optical fiber ribbon is formed by two or more cladding-strengthened glass optical fibers each having an outer surface and that do not individually include a protective polymer coating. A common protective coating substantially surrounds the outer surfaces of the two or more cladding-strengthened glass optical fibers so that the common protective coating is common to the two or more cladding-strengthened glass optical fibers. A fiber ribbon cable is formed by adding a cover assembly to the fiber ribbon. A fiber ribbon interconnect is formed adding one or more optical connectors to the fiber ribbon or fiber ribbon cable. Optical data transmission systems that employ the fiber ribbon to optically connect to a photonic device are also disclosed. Methods of forming the cladding-strengthened glass optical fibers and the high-density optical fiber ribbons are also disclosed.

A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO.sub.2—SiO.sub.2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO.sub.2—SiO.sub.2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO.sub.2—SiO.sub.2-soot particles.

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm.sup.4 or less at a spatial frequency of 0.1 μm.sup.−1 or more and 20 μm.sup.−1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 μm×10 μm with an atomic force microscope.

Provided is a titanium-containing quartz glass having excellent UV absorption. The quartz glass absorbs ultraviolet rays having a wavelength of 250 nm or less, ozone generation-related adverse effects on the human body, are prevented, a decrease in transmittance of the quartz glass in the range from near-ultraviolet to visible light due to being colored when irradiated with ultraviolet rays does not occur, absorption build-up or lamp burst-inducing deformation build-up, which is caused by a structural change in the quartz glass that occurs in the range of 200-300 nm when irradiated with ultraviolet rays, is suppressed, and a decrease in transmittance at intended wavelength ranges does not occur even when exposed to ultraviolet rays. The titanium-containing quartz glass having excellent UV absorption is colorless, wherein the average concentration of titanium is 10-500 ppm, the concentration of OH group is 10-350 ppm.

Doped quartz glass components for use in a plasma-assisted manufacturing process contain at least one dopant which is capable of reacting with fluorine to form a fluoride compound, and the fluoride compound has a boiling point higher than that of SiF.sub.4. The doped quartz glass component has high dry-etch resistance and low particle formation, and has uniform etch removal when used in a plasma-assisted manufacturing process. The doped quartz glass has a microhomogeneity defined by (a) a surface roughness with an R.sub.a value of less than 20 nm after the surface has been subjected to a dry-etching procedure as specified in the description, or (b) a dopant distribution with a lateral concentration profile in which maxima of the dopant concentration are at an average distance apart of less than 30 μm.