Patent classifications
C03C2217/258
Interior coatings for glass structures in electronic devices
An electronic device may include electrical components and other components mounted within a housing. The device may have a display on a front face of the device and may have a glass layer that forms part of the housing on a rear face of the device. The glass layer and other glass structures in the electronic device may be provided with coatings. An interior coating on a glass layer may include multiple layers of material such as an adhesion promotion layer, thin-film layers of materials such as silicon, niobium oxide and other metal oxides, and metals to help adjust the appearance of the coating. A metal layer may be formed on top of the coating to serve as an environmental protection layer and opacity enhancement layer. In some configurations, the coating may include four layers.
SELF-CLEANING, ANTI-SOILING COATINGS WITH ADDITIONAL FUNCTIONALITIES AND METHOD OF PRODUCTION THEREOF
Mesoporous nanostructured coatings are disclosed. The coatings comprise particles of a refractory material, the particles having diameters <200 nm, connected by a material that is formed from a precursor that is deposited on the substrate with the particles, typically by oxidation of the precursor. The material that connects the particles enhances their necking and adhesion to the substrate. In preferred embodiments, the coatings are multi-functional, combining anti-reflective properties with a second property such as self-cleaning or anti-soiling. A novel method for making the coatings, based on inkjet technology, is also disclosed.
Method for Producing a Semi-Transparent Motor-Vehicle Design Element
The invention relates to a method for producing a semi-transparent motor vehicle design element (3), comprising the following steps:
A providing a dimensionally stable, at least partially light-permeable substrate (1) which is heat-resistant for a temperature of at least 60° C., the substrate (1) having a front side (1a) and a rear side (1b),
B introducing the substrate (1) into a vacuum chamber (2) and applying a first metallic semi-transparent layer (L1) by means of a PVD process to the substrate (1) according to step a) which is situated in the vacuum chamber (2), and
C applying a light-impermeable cover layer (LD) to the front or rear side (1a, 1b) of the substrate (1), the light-impermeable cover layer (LD) containing at least one light-permeable opening (8) for reproducing at least one graphical symbol (SYM),
steps B and C being carried out such that light (LSQ) passing through the at least one opening (8) in the light-impermeable cover layer (LD) from the rear side (1b) towards the front side (1a) of the substrate (1) is incident on the first metallic semi-transparent layer (L1) and at least partially passes outwards through the first metallic semi-transparent layer (L1) in order to project the at least one graphical symbol (SYM) represented by the at least one opening (8).
PREPARATION METHOD OF HYDROGENATED COMPOSITE FILM AND OPTICAL FILTER
The present application provides a preparation method of a hydrogenated composite film and an optical filter, and relates to the field of optical film filter technologies. The preparation method includes: introducing inert gas and hydrogen into a reaction chamber, and bombarding at least two materials in the reaction chamber and the introduced hydrogen using plasma formed by the inert gas, such that the at least two materials are sputtered onto a substrate and react with hydrogen ions generated by the hydrogen to form a hydrogenated composite film layer. The hydrogenated composite film layer includes at least two materials which are co-sputtered onto the same substrate using the sputtering technology to obtain a required material performance, so as to obtain the hydrogenated composite film layer with a refractive index greater than 3.5 and an extinction coefficient less than 0.005 under a wavelength of 700 nm to 1800 nm.
LOW EMISSIVITY COATING FOR WINDOWS IN COLD CLIMATES
A low emissivity coating 30 includes a plurality of phase adjustment layers 40, 50, 62; a first metal functional layer 46; and a second metal functional layer 58 located over and spaced from the first metal functional layer 48. A ratio of the geometric thickness of the first metal functional layer divided by the geometric thickness of the second metal functional layer is in the range of 0.6 to 1. The low emissivity coating 30 provides a reference IGU summer/day SHGC of at least 0.4 and a reference IGU winter/night U factor of no greater than 0.4 BTU/hr-ft-° F. (2.27 W/m2-K).
SUBSTRATE PROVIDED WITH A STACK HAVING THERMAL PROPERTIES AND A METALLIC TERMINAL LAYER
A substrate is coated on one face with a thin-films stack having reflection properties in the infrared and/or in solar radiation including at least one metallic functional layer, based on silver or on a metal alloy containing silver, and at least two antireflection coatings. The coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflection coatings. The stack also includes a terminal layer which is the layer of the stack which is furthest from the face. The terminal layer is a metallic layer consisting of zinc and tin, made of Sn.sub.xZn.sub.y with a ratio of 0.1≦x/y≦2.4 and having a physical thickness of between 0.5 nm and 5.0 nm excluding these values, or even between 0.6 nm and 2.7 nm excluding these values.
Coupled transmission line resonate RF filter
The present invention includes a method of creating electrical air gap low loss low cost RF mechanically and thermally stabilized interdigitated resonate filter in photo definable glass ceramic substrate. Where a ground plane may be used to adjacent to or below the RF filter in order to prevent parasitic electronic signals, RF signals, differential voltage build up and floating grounds from disrupting and degrading the performance of isolated electronic devices by the fabrication of electrical isolation and ground plane structures on a photo-definable glass substrate.
METHOD FOR OBTAINING A SUBSTRATE COATED WITH A FUNCTIONAL LAYER
A process for obtaining a material including a substrate coated on one of its sides with a coating including a functional layer, includes depositing the functional layer on the substrate, then depositing an absorbent layer on top of the functional layer, then performing a heat treatment by radiation, the radiation having at least one treatment wavelength between 200 and 2500 nm, the absorbent layer being in contact with air during the heat treatment, wherein the ab sorb ent layer ab sorbs at least 80% of the radiation used during the heat treatment and transmits less than 10% thereof.
Interior coatings for glass structures in electronic devices
An electronic device may include electrical components and other components mounted within a housing. The device may have a display on a front face of the device and may have a glass layer that forms part of the housing on a rear face of the device. The glass layer and other glass structures in the electronic device may be provided with coatings. An interior coating on a glass layer may include multiple layers of material such as an adhesion promotion layer, thin-film layers of materials such as silicon, niobium oxide and other metal oxides, and metals to help adjust the appearance of the coating. A metal layer may be formed on top of the coating to serve as an environmental protection layer and opacity enhancement layer. In some configurations, the coating may include four layers.
Fabrication method of semiconductor device
A method of fabricating a semiconductor device, which includes a separation step and has a high yield, is provided. A metal layer is formed over a substrate, fluorine is supplied to the metal layer, and the metal layer is then oxidized, whereby a metal compound layer is formed. A functional layer is formed over the metal compound layer, heat treatment is performed on the metal compound layer, and the functional layer is separated from the substrate with use of the metal compound layer. By performing first plasma treatment using a gas containing fluorine, fluorine can be supplied to the metal layer. By performing second plasma treatment using a gas containing oxygen, the metal layer supplied with fluorine can be oxidized.