Patent classifications
C03C2217/27
Metallic lustrous member with radio wave transmissibility, article using same, and production method therefor
A metallic lustrous member with radio wave transmissibility is provided, which is capable of being easily produced, while ensuring a structure in which not only chromium or indium but also any of some other metals such as aluminum is formed as a metal layer on a continuous surface of any of various materials, and also an article using the member is provided. A production method for a metallic lustrous member with radio wave transmissibility, which is capable of easily forming, as a metal layer, not only chromium or indium but also any of some other metals such as aluminum, on a continuous surface of any of various materials. The metallic lustrous member comprises a substrate having radio wave transmissibility, and an aluminum layer formed directly on a continuous surface of the substrate. The aluminum layer has a discontinuous region including a plurality of separated segments which are mutually discontinuous.
GLAZING COMPRISING A PROTECTIVE UPPER LAYER MADE FROM HYDROGENATED CARBON
A material including a transparent substrate coated with a stack acting on infrared radiation includes at least one functional layer and at least one upper protective layer deposited above at least a part of the functional layer. The upper protective layer is a hydrogenated carbon layer, within which layer the carbon atoms form carbon-carbon and carbon-hydrogen bonds and are essentially in an sp.sup.2 hybridization state.
TRANSPARENT SUBSTRATE WITH THIN FILM MULTILAYER COATING
A transparent substrate with a thin film multilayer coating, and the thin film multilayer coating includes a lower dielectric layer, a lower metal protective layer, a metal functional layer having an infrared reflecting function, an upper metal protective layer, and an upper dielectric layer, which are sequentially laminated on the transparent substrate, wherein the lower metal protective layer is thicker than the upper metal protective layer, and the thickness of the upper metal protective layer is 0.3 nm to 0.7 nm.
METHOD FOR PROTECTING LOW-E GLASS PLATE, METHOD FOR PRODUCING GLASS UNIT, LAMINATE AND PROTECTIVE SHEET FOR LOW-E GLASS PLATE
Provided is a Low-E glass plate protection method capable of preventing or inhibiting Low-E layer alteration. In the protection method, a protective sheet having a substrate and a PSA layer provided to at least one face of the substrate is applied for protection via the PSA layer to a Low-E glass plate having a Low-E layer that comprises a zinc component. The method is characterized by using the protective sheet wherein the PSA layer is formed from a water-dispersed PSA composition and includes less than 850 μg ammonia per gram of PSA layer weight.
ANTIREFLECTION STRUCTURE AND MANUFACTURING METHOD THEREOF
An antireflection structure comprising a transparent substrate having a plurality of holes with U-shaped or V-shaped cross-sectional shapes perpendicular to a flat surface portion and a metal oxide film disposed on the surface portion of the transparent substrate and in the space portions formed in an upward direction from the bottom portions of holes in the transparent substrate, wherein the average diameter of the openings of the holes is 50 nm to 300 nm, the average distance between the center points of openings of the adjacent holes is 100 nm to 400 nm, and the depth of each hole from the surface portion of the substrate is 80 nm to 250 nm; and the thickness of the metal oxide film disposed in each of the space portions increases as the depth of each of the holes becomes larger, thereby reducing the difference in depth between the holes from the uppermost surface portion of the metal oxide film disposed on the surface portion to the surface portions of the metal oxide films in the space portions.
GLAZING COMPRISING A CARBON-BASED UPPER PROTECTIVE LAYER
A material includes a transparent substrate coated with a stack of thin layers acting on infrared radiation including at least one functional layer. The stack includes a carbon-based upper protective layer within which the carbon atoms are essentially in an sp.sup.2 hybridization state and the upper protective layer is deposited above at least a part of the functional layer and exhibits a thickness of less than 1 nm.
SOLAR CONTROL GLAZING AND METHOD OF ITS PRODUCTION
The present document discloses a glazing in the form of a window glass or vehicle glass which comprises a transparent substrate, and a coating. The coating comprises, in order outward from the transparent substrate, an optional diffusion barrier layer, a first anti-reflective layer, an optional first seed layer, a first functional metal layer, at least one optional first blocker layer, a second anti-reflective layer, an optional second seed layer, a second functional metal layer, at least one optional second blocker layer, a third anti-reflective layer, and an optional top layer, wherein at least one of the first functional metal layer and the second functional metal layer comprises a Ag alloy consisting essentially of Ag with an alloying agent selected from a group consisting of Li, C, Na, Mg, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, Pd, In, Sn, Sb, Hf, Ta, W, Pt or Au.
GLAZING COMPRISING A PROTECTIVE COATING
A material includes a transparent substrate coated with a stack of thin layers acting on infrared radiation including at least one functional layer. The stack includes a protective coating deposited above at least a part of the functional layer. The protective coating includes at least one lower protective layer based on titanium and zirconium, these two metals being in the metal, oxidized or nitrided form, and at least one upper protective layer of carbon, within which layer the carbon atoms are essentially in an sp.sup.2 hybridization state, located above the layer based on titanium and zirconium.
Composition for forming a conductive film, a conductive film, a method for producing a plating film, a plating film, and an electronic device
A composition for forming a conductive film includes at least one of a metal salt (A1) and a metal particle (A2) as component (A) that serves as a metal source of the conductive film, and a metalloxane compound (B). The metal salt (A1) and the metal particle (A2) contain one or more metals selected from the group consisting of Ni, Pd, Pt, Cu, Ag, and Au. The metalloxane compound (B) has at least one metal atom selected from the group consisting of Ti, Zr, Sn, Si, and Al in its main chain. Preferably, the metal salt (A1) is a carboxylate containing a metal selected from the group consisting of Cu, Ag, and Ni. Preferably, the metal particle (A2) has an average particle diameter of 5 nm to 100 nm and comprises a metal selected from the group consisting of Cu, Ag, and Ni.
SUBSTRATE PROVIDED WITH A STACK HAVING THERMAL PROPERTIES AND A METALLIC TERMINAL LAYER
A substrate is coated on one face with a thin-films stack having reflection properties in the infrared and/or in solar radiation including at least one metallic functional layer, based on silver or on a metal alloy containing silver, and at least two antireflection coatings. The coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflection coatings. The stack also includes a terminal layer which is the layer of the stack which is furthest from the face. The terminal layer is a metallic layer consisting of zinc and tin, made of Sn.sub.xZn.sub.y with a ratio of 0.1≦x/y≦2.4 and having a physical thickness of between 0.5 nm and 5.0 nm excluding these values, or even between 0.6 nm and 2.7 nm excluding these values.