A metallic lustrous member with radio wave transmissibility is provided, which is capable of being easily produced, while ensuring a structure in which not only chromium or indium but also any of some other metals such as aluminum is formed as a metal layer on a continuous surface of any of various materials, and also an article using the member is provided. A production method for a metallic lustrous member with radio wave transmissibility, which is capable of easily forming, as a metal layer, not only chromium or indium but also any of some other metals such as aluminum, on a continuous surface of any of various materials. The metallic lustrous member comprises a substrate having radio wave transmissibility, and an aluminum layer formed directly on a continuous surface of the substrate. The aluminum layer has a discontinuous region including a plurality of separated segments which are mutually discontinuous.

An electrochromic aperture, which comprises a first transparent substrate (11), a first transparent conductive layer (12), an ion storage layer (13), an ion transfer layer (14), an electrochromic layer (15), a second transparent conductive layer (16), and a second transparent substrate (17). The ion transfer layer (14) is a solid electrolyte layer. Also provided is a method for manufacturing the electrochromic aperture, relating to an etching operation after coating on the ion storage layer (13) and the electrochromic layer (15) is finished. Also provided is a lens modules having the electrochromic aperture.

A vehicle pane with reduced emissivity and light reflection, includes a substrate having an exposed interior-side surface, an emissivity-reducing coating containing at least one layer based on a transparent conductive oxide (TCO) on the interior-side surface, and an anti-reflection coating based on nanoporous silicon oxide on the emissivity-reducing coating.

The invention relates to the manufacturing method of high performance electro-chromic devices containing transition metal oxide based compounds, wherein it comprises the steps of enlarging of the metal contact with Pt (Platinum) (1) sputtering method on one edge of the 80-150 nm thick Indium-Tin oxide alloy (ITO) (2), which was previously enlarged on the glass (3) by the sputter method, growing vertical nano-wall structures at 15-25 mTorr, 300-500° C. substrate temperature and at 3-45 minutes intervals on glass (3) with sputter method, by using transition metal chalcogen targets on previously enlarged ITO (2) with a thickness of 80-150 nm, oxidizing the grown structures in the oxidizing furnace for 10-60 minutes under oxygen gas in the temperature range 300-450° C., preparing the electro-chromic device by placing a counter glass/ITO (80-150 nm) in propylene carbonate (PC) to face 1 Mole/Liter Lithium perchlorate (LiClO4) ion-conducting electrolyte (6) with a 0.5-1 mm distance between them and closing it.

A process for manufacturing an electrochromic glazing unit includes forming, on one face of a glass sheet, a complete all-solid-state electrochromic stack including in succession a first layer of a transparent conductive oxide; a layer of a cathodically colored mineral electrochromic material to form an electrochromic electrode; a layer of an ionically conductive mineral solid electrolyte; a layer of a cation intercalation material to form a counter electrode; and a second layer of a transparent conductive oxide; then heat treatment of the complete electrochromic stack by irradiation with radiation having a wavelength comprised between 500 and 2000 nm, the radiation originating from a radiating device placed facing the electrochromic stack, a relative movement being created between the radiating device and the substrate so as to raise the electrochromic stack to a temperature at least equal to 300° C. for a brief duration, for example shorter than 100 milliseconds.

A glazing can be used as a constituent element of a heating device or of a fireproof door. The glazing includes a transparent substrate coated with a stack of thin layers including at least one silver-based functional metal layer and an upper protective layer based on zirconium titanium oxide.

Provided is a transparent conductive film-equipped substrate that makes it difficult for an insulating film provided on a portion from which a transparent conductive film has been removed to peel off. The transparent conductive film-equipped substrate 10 includes a substrate 1 and a transparent conductive film 2 provided on the substrate 1 and subjected to patterning, wherein the transparent conductive film-equipped substrate is made up so that: a removal region A1 where the transparent conductive film 2 has been removed by patterning, a non-removal region A2 where the transparent conductive film is left unremoved, and a boundary region A3 provided between the removal region A1 and the non-removal region A2 are formed on the substrate 1; and the boundary region A3 is formed with insular portions 2b in which the transparent conductive film 2 is formed in insular shapes.

A glass plate includes a first surface provided with a first film; and a second surface provided with a second film and opposite to the first surface. Each of the first film and the second film includes mainly tin oxide and has a sheet resistance value of 20 Ω/□ or less. When film thicknesses of the first and second films are θ.sub.1 nm and θ.sub.2 nm respectively, and when, in the glass plate, a haze value measured from the first surface side for a configuration provided with the first film only is H.sub.1 (%), and a haze value measured from the second surface side for a configuration provided with the second film only is H.sub.2 (%), a value of θ.sub.1 divided by H.sub.1 is 500 or more but 1200 or less, and a value of θ.sub.2 divided by H.sub.2 is 300 or more but 750 or less.

Certain example embodiments of this invention relate to techniques for converting sputter-deposited TiNx or TiOxNy layers into TiOx layers via activation with electromagnetic radiation. An intermediate layer including TiOxNy, 0<y≦1 is formed on a substrate. The intermediate layer is exposed to the radiation, which is preferentially absorbed by the intermediate layer in an amount sufficient to heat the intermediate layer to a temperature of 500-650 degrees C. while keeping the substrate at a significantly lower temperature. A flash light operated with a series of millisecond or sub-millisecond length pulses may be used in this regard. The converting removes nitrogen from, and introduces oxygen into, the intermediate layer, causing the layer to expand beyond its initial thickness. At least some of the final layer may have an anatase phase, and it may be photocatalytic. These layers may be used in low-maintenance glass, antireflective, and/or other applications.

The present embodiments provide a transparent electrode having a laminate structure of: a metal oxide layer having an amorphous structure and electroconductivity, and a metal nanowire layer; and further comprising an auxiliary metal wiring. The auxiliary metal wiring covers a part of the metal nanowire layer or of the metal oxide layer, and is connected to the metal nanowire layer.