Patent classifications
C03C3/087
TILES OR SLABS OF COMPACTED CERAMIC MATERIAL
The disclosure relates to tiles or slabs comprising a fired ceramic material which has a chemical composition with a particular combination of oxides; to a method for the manufacture of said tiles or slabs; and to the use thereof for construction or decoration applications.
Crystallized glass substrate
To provide a crystallized glass substrate including a surface with a compressive stress layer, where a stress depth DOL.sub.zero of the compressive stress layer, at which the compressive stress is 0 MPa, is 45 to 200 μm, a compressive stress CS on an outermost surface of the compressive stress layer is 400 to 1400 MPa, and a central stress CT determined by using curve analysis is 55 to 300 MPa.
Method of manufacturing curved thin glass sheet having functional layer and method of manufacturing curved joined glass sheet having functional layer
The present invention relates to a method capable of easily manufacturing a curved thin glass sheet and a curved joined glass sheet to which functionality is added.
Glass fiber and method for producing same
Provided is a glass fiber having a low spinning temperature and a low liquidus temperature, and besides, having a large difference between the liquidus temperature and the spinning temperature, and a method of manufacturing the same. The glass fiber of the present invention includes as a glass composition, in terms of mass % on an oxide basis, 50% to 65% of SiO.sub.2, 0% to 3% of Al.sub.2O.sub.3, 0% to 1% of MgO, 0% to less than 0.7% of CaO, 0% to 1% of Li.sub.2O, 10% to 20% of Na.sub.2O, 0% to 2% of K.sub.2O, 6% to 10% of TiO.sub.2, and 15% to 20% of ZrO.sub.2, and has a value for (Na.sub.2O+K.sub.2O)/(MgO+CaO) of 6.0 or more.
Glass fiber and method for producing same
Provided is a glass fiber having a low spinning temperature and a low liquidus temperature, and besides, having a large difference between the liquidus temperature and the spinning temperature, and a method of manufacturing the same. The glass fiber of the present invention includes as a glass composition, in terms of mass % on an oxide basis, 50% to 65% of SiO.sub.2, 0% to 3% of Al.sub.2O.sub.3, 0% to 1% of MgO, 0% to less than 0.7% of CaO, 0% to 1% of Li.sub.2O, 10% to 20% of Na.sub.2O, 0% to 2% of K.sub.2O, 6% to 10% of TiO.sub.2, and 15% to 20% of ZrO.sub.2, and has a value for (Na.sub.2O+K.sub.2O)/(MgO+CaO) of 6.0 or more.
GLASS WITH NANOSCALE SURFACE FEATURES FROM THERMAL POLING AND METHODS FOR FORMING THE SAME
A glass substrate with modified surface regions is disclosed. The glass substrate includes a first side and an opposite second side, an alkali-containing bulk disposed between the first and second sides, and a first alkali-depleted region formed in the alkali-containing bulk on the first side. The first alkali-depleted region defines at least a portion of a first topographical feature. The first topographic feature includes a height that extends in a first direction from a base portion of the first topographical feature to an outermost portion of the first topographical feature. The first direction is oriented parallel to a thickness of the glass substrate between the first and second sides. The first topographic feature also includes a width that extends in a second direction between at least two, spaced apart wall portions of the first topographical feature. The second direction is oriented normal to the first direction.
Alkali-free borosilicate glasses with low post-HF etch roughness
An article comprises a glass substrate. The glass substrate has a first surface having a plurality of vias therein, and a second surface parallel to the first surface. At least one of the first surface and the second surface is an etched surface having a surface roughness (Ra) of 0.75 nm or less. The glass substrate comprises, in mol percent on an oxide basis: 65 mol %≤SiO.sub.2≤75 mol %; 7 mol %≤Al.sub.2O.sub.3≤15 mol %; 26.25 mol %≤RO+Al.sub.2O.sub.3−B.sub.2O.sub.3; 0 mol %≤R.sub.2O≤2 mol %. RO=MgO+CaO+SrO+BaO+ZnO. R.sub.2O=Li.sub.2O+Na.sub.2O+K.sub.2O+Rb.sub.2O+Cs.sub.2O.
Alkali-free borosilicate glasses with low post-HF etch roughness
An article comprises a glass substrate. The glass substrate has a first surface having a plurality of vias therein, and a second surface parallel to the first surface. At least one of the first surface and the second surface is an etched surface having a surface roughness (Ra) of 0.75 nm or less. The glass substrate comprises, in mol percent on an oxide basis: 65 mol %≤SiO.sub.2≤75 mol %; 7 mol %≤Al.sub.2O.sub.3≤15 mol %; 26.25 mol %≤RO+Al.sub.2O.sub.3−B.sub.2O.sub.3; 0 mol %≤R.sub.2O≤2 mol %. RO=MgO+CaO+SrO+BaO+ZnO. R.sub.2O=Li.sub.2O+Na.sub.2O+K.sub.2O+Rb.sub.2O+Cs.sub.2O.
METHODS FOR THERMALLY TREATING GLASS ARTICLES
According to one embodiment, a method for thermally treating glass articles may include holding a glass article at a treatment temperature equal to an annealing temperature of the glass article =15° C. for a holding time greater than or equal to 5 minutes. Thereafter, the glass article may be cooled from the treatment temperature through a strain point of the glass article at a first cooling rate CR1 less than 0° C./min and greater than −20° C./min such that a density of the glass article is greater than or equal to 0.003 g/cc after cooling. The glass article is subsequently cooled from below the strain point at a second cooling rate CR.sub.2, wherein |CR.sub.2|>|CR.sub.1|.
METHODS FOR THERMALLY TREATING GLASS ARTICLES
According to one embodiment, a method for thermally treating glass articles may include holding a glass article at a treatment temperature equal to an annealing temperature of the glass article =15° C. for a holding time greater than or equal to 5 minutes. Thereafter, the glass article may be cooled from the treatment temperature through a strain point of the glass article at a first cooling rate CR1 less than 0° C./min and greater than −20° C./min such that a density of the glass article is greater than or equal to 0.003 g/cc after cooling. The glass article is subsequently cooled from below the strain point at a second cooling rate CR.sub.2, wherein |CR.sub.2|>|CR.sub.1|.