Patent classifications
C04B35/50
METHODS AND APPARATUS FOR PLASMA SPRAYING SILICON CARBIDE COATINGS FOR SEMICONDUCTOR CHAMBER APPLICATIONS
Methods and apparatus for producing bulk silicon carbide and producing silicon carbide coatings are provided herein. The method includes feeding a mixture of silicon carbide and ceramic into a plasma sprayer. The plasma generates a stream towards a substrate forming a bulk material or optionally a coating on the substrate such as an article upon contact therewith. In embodiments, the substrate can be removed, leaving a component part fabricated from bulk silicon carbide.
Electret
An electret includes a composite oxide having an ABO.sub.3 type perovskite structure containing two different metal elements A and B. The composite oxide is in a polarized state, at least a part of one of the metal elements A and B is substituted with a dopant element having a lower valence than the one of the metal elements A and B, and the composite oxide has a bandgap energy of 4 eV or more.
Electret
An electret includes a composite oxide having an ABO.sub.3 type perovskite structure containing two different metal elements A and B. The composite oxide is in a polarized state, at least a part of one of the metal elements A and B is substituted with a dopant element having a lower valence than the one of the metal elements A and B, and the composite oxide has a bandgap energy of 4 eV or more.
ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.
ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.
BINDER FOR INJECTION MOULDING COMPOSITION
A binder for an injection moulding composition, the binder includes, in percentage by mass and for a total of 100%: 35% to 60% of a component (a), or polymer base, made of a polymer or a mixture of polymers, each of the polymer being non-amphiphilic and having a mass average molar mass greater than or equal to 5,000 g/mol, 30% to 55% of a component (b), or wax, made of a polymer or a mixture of polymers, each of the polymer being non-amphiphilic and having a mass average molar mass less than 5,000 g/mol, and less than 10% of an amphiphilic component (c), or surfactant, and less than 10% of other components (d). The polymer base comprising 2% to 15% of a styrene-ethylene-butylene-styrene copolymer (SEBS), in percentage by mass based on the mass of the binder.
Ion beam sputtering with ion assisted deposition for coatings on chamber components
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y.sub.2O.sub.3, over 0 mol % to 60 mol % of ZrO.sub.2, and 0 mol % to 9 mol % of Al.sub.2O.sub.3.
Ion beam sputtering with ion assisted deposition for coatings on chamber components
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y.sub.2O.sub.3, over 0 mol % to 60 mol % of ZrO.sub.2, and 0 mol % to 9 mol % of Al.sub.2O.sub.3.
POWDER FOR CERAMIC MANUFACTURING, CERAMIC MANUFACTURED OBJECT, AND MANUFACTURING METHOD THEREOF
Provided are a powder for laser manufacturing which can be stably manufactured and from which a three-dimensional manufactured object ensuring a manufacturing accuracy can be obtained and a using method thereof. A powder for ceramic manufacturing for obtaining a manufactured object by repeatedly sintering or fusing and solidifying in sequence a powder in an irradiation portion with laser light, in which the powder includes a plurality of compositions, at least one composition of the compositions is an absorber that relatively strongly absorbs the laser light compared to other compositions, and at least a part of the absorber changes to a different composition that relatively weakly absorbs the laser light by irradiation with the laser light and a using method of a powder in which the powder is used.
POWDER FOR CERAMIC MANUFACTURING, CERAMIC MANUFACTURED OBJECT, AND MANUFACTURING METHOD THEREOF
Provided are a powder for laser manufacturing which can be stably manufactured and from which a three-dimensional manufactured object ensuring a manufacturing accuracy can be obtained and a using method thereof. A powder for ceramic manufacturing for obtaining a manufactured object by repeatedly sintering or fusing and solidifying in sequence a powder in an irradiation portion with laser light, in which the powder includes a plurality of compositions, at least one composition of the compositions is an absorber that relatively strongly absorbs the laser light compared to other compositions, and at least a part of the absorber changes to a different composition that relatively weakly absorbs the laser light by irradiation with the laser light and a using method of a powder in which the powder is used.