Patent classifications
C04B35/5156
POWDER FOR FILM FORMATION AND MATERIAL FOR FILM FORMATION
The present invention relates a coating powder comprising a rare earth oxyfluoride (Ln-O—F) and having: an average particle size (D.sub.50) of 0.1 to 10 μm, a pore volume of pores having a diameter of 10 μm or smaller of 0.1 to 0.5 cm.sup.3/g as measured by mercury intrusion porosimetry, and a ratio of the maximum peak intensity (S0) assigned to a rare earth oxide (Ln.sub.xO.sub.y) in the 2θ angle range of from 20° to 40° to the maximum peak intensity (S1) assigned to the rare earth oxyfluoride (Ln-O—F) in the same range, S0/S1, of 1.0 or smaller in powder X-ray diffractometry using Cu-Kα rays or Cu-Kα.sub.1 rays.
SINTERED BODY
A sintered body of the present invention contains yttrium oxyfluoride. The yttrium oxyfluoride is preferably YOF and/or Y.sub.5O.sub.4F.sub.7. The sintered body of the present invention preferably contains 50% by mass or more of yttrium oxyfluoride. The sintered body of the present invention has a relative density of preferably 70% or more and an open porosity of preferably 10% or less. Furthermore, the sintered body of the present invention has a three-point bending strength of preferably 10 MPa or more and 300 MPa or less.
SINTERED MATERIAL, SEMICONDUCTOR MANUFACTURING APPARATUS INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE SINTERED MATERIAL
Provided are a sintered material having high corrosion resistance, a method of manufacturing the sintered material, a member for a semiconductor manufacturing apparatus, a method of manufacturing a member for a semiconductor manufacturing apparatus, a semiconductor manufacturing apparatus, and a method of manufacturing a semiconductor manufacturing apparatus. The sintered material according to an embodiment includes 50 mass% or more of yttrium oxyfluoride, has a relative density of 97.0% or more, and has a Vickers hardness of 5.0 GPa or more. The method of manufacturing a sintered material according to an embodiment includes forming a molded body including yttrium oxyfluoride powder having a particle size of 0.3 .Math.m or less, and sintering the molded body under an atmospheric pressure at a temperature of 800° C. or less.
Method of treating a preceramic material
A method of treating a preceramic material includes providing a preceramic polycarbosilane or polycarbosiloxane material that includes a moiety Si—O-M, where Si is silicon, O is oxygen and M is at least one metal that includes at least one transition metal, and thermally converting the preceramic polycarbosilane or polycarbosiloxane that includes the moiety Si—O-M material into a ceramic material.
Process for the preparation of gadolinium oxysulfide (Gd2O2S) scintillation ceramics
The present disclosure is directed to a rapid process for the preparation of gadolinium oxysulfide having a general formula of Gd.sub.2O.sub.2S, referred to as GOS, scintillation ceramics by using the combination of spark plasma primary sintering (SPS) and hot isostatic pressing secondary sintering.
Powder for film formation and material for film formation
The present invention relates a coating powder comprising a rare earth oxyfluoride (Ln-O—F) and having: an average particle size (D.sub.50) of 0.1 to 10 μm, a pore volume of pores having a diameter of 10 μm or smaller of 0.1 to 0.5 cm.sup.3/g as measured by mercury intrusion porosimetry, and a ratio of the maximum peak intensity (S0) assigned to a rare earth oxide (Ln.sub.xO.sub.y) in the 2θ angle range of from 20° to 40° to the maximum peak intensity (S1) assigned to the rare earth oxyfluoride (Ln-O—F) in the same range, S0/S1, of 1.0 or smaller in powder X-ray diffractometry using Cu-Kα rays or Cu-Kα.sub.1 rays.
HIGH PERMITTIVITY ANTIFERROELECTRIC AND MANUFACTURING METHOD THEREOF
A high permittivity antiferroelectric composition and a manufacturing method thereof aim to provide an antiferroelectric, which has a Pb.sub.xLa.sub.1-x([Zr.sub.1-YSn.sub.Y].sub.ZTi.sub.1-Z) composition, is sintered at low temperatures, and has a high density and a high permittivity.
COATINGS THAT CONTAIN FLUORINATED YTTRIUM OXIDE AND A METAL OXIDE, AND METHODS OF PREPARING AND USING THE COATINGS
Described are coatings that contain of fluorinated yttrium oxide and a metal oxide; methods of preparing these coatings; substrates, surfaces, equipment, and components of equipment that include a coating that contains a combination of fluorinated yttrium oxide and a metal oxide; and methods of preparing and using the coatings and coated substrates.
Material For Plasma Spray Comprising Y-O-F Compound Method For Producing The Same And Spray Coating Prepared Using The Same
Disclosed are a material for spray for plasma spray coating having high plasma resistance and a method for producing the same. The material for plasma spray comprises an yttrium compound, and the numbers of moles of Y (yttrium), O (oxygen), and F (fluorine) in the yttrium compound satisfy 1.5<(O+F)/Y<2.0.
SLURRY PLASMA SPRAY OF PLASMA RESISTANT CERAMIC COATING
Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a slurry of ceramic particles into a plasma sprayer. The plasma sprayer generates a stream of particles directed toward the substrate, forming a ceramic coating on the substrate upon contact.