An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

Ceramics are capable of reducing color irregularities and uneven coating, hard to dissolve into glaze, and excellent in fixation. A water-based paint contains a coloring material, first cellulose nanofibers having a lignin content of 20 to 40 mass % and a water retention of 150 to 300%, and second cellulose nanofibers having a higher viscosity compared to the first cellulose nanofibers, and the water-based paint has a B-type viscosity of 600 cps or higher. Ceramic ware or glassware or the like having painting made on a green body of which surface is formed of silicic acid or silicate compound as a main component, with the water-based paint.

Ceramics are capable of reducing color irregularities and uneven coating, hard to dissolve into glaze, and excellent in fixation. A water-based paint contains a coloring material, first cellulose nanofibers having a lignin content of 20 to 40 mass % and a water retention of 150 to 300%, and second cellulose nanofibers having a higher viscosity compared to the first cellulose nanofibers, and the water-based paint has a B-type viscosity of 600 cps or higher. Ceramic ware or glassware or the like having painting made on a green body of which surface is formed of silicic acid or silicate compound as a main component, with the water-based paint.

A concrete product set by pouring a concrete slurry includes a) a concrete mixture; b) a graphene admixture; c) a colloidal silica admixture; and d) at least one reinforcing fiber selected from the group of fibers. As the poured concrete slurry cures, the poured slurry hardens into a composite material product, and the composite material defines capillary structures that at least in part fill with silica and lime, and the surrounding composite material is embedded with graphene. In another exemplary embodiment, the present invention is directed to a process for preparing a concrete product. The process comprises the steps of a) preparing a concrete slurry; b) pouring the concrete slurry; and c) allowing the concrete slurry to cure. In another exemplary embodiment, the present invention is directed to the product itself; namely, a concrete product with or without fibers, or to the admixture(s).

The method includes forming an inner monolithic layer from crystals of beta phase stoichiometric silicon carbide on a carbon substrate in the form of a rod by chemical methylsilane vapor deposition in a sealed tubular hot-wall CVD reactor. The method further includes forming a central composite layer over the inner monolithic layer by twisting continuous beta phase stoichiometric silicon carbide fibers into tows, transporting the tows to a braiding machine, and forming a reinforcing thread framework. A pyrocarbon interface coating is built up by chemical methane vapor deposition in a sealed tubular hot-wall CVD reactor. Then, a matrix is formed by chemical methylsilane vapor deposition in the reactor. A protective outer monolithic layer is formed from crystals of beta phase stoichiometric silicon carbide over the central composite layer by chemical methylsilane vapor deposition in a CVD reactor. And then the carbon substrate is removed from the fabricated semi-finished product.

The method includes forming an inner monolithic layer from crystals of beta phase stoichiometric silicon carbide on a carbon substrate in the form of a rod by chemical methylsilane vapor deposition in a sealed tubular hot-wall CVD reactor. The method further includes forming a central composite layer over the inner monolithic layer by twisting continuous beta phase stoichiometric silicon carbide fibers into tows, transporting the tows to a braiding machine, and forming a reinforcing thread framework. A pyrocarbon interface coating is built up by chemical methane vapor deposition in a sealed tubular hot-wall CVD reactor. Then, a matrix is formed by chemical methylsilane vapor deposition in the reactor. A protective outer monolithic layer is formed from crystals of beta phase stoichiometric silicon carbide over the central composite layer by chemical methylsilane vapor deposition in a CVD reactor. And then the carbon substrate is removed from the fabricated semi-finished product.

The present disclosure discloses a modified calcium silicate board, and belongs to the technical field of floors and decorative boards. A modification method comprises steps of: dipping a calcium silicate board in a silicon dioxide solution with a solid content of 95% or more, completely absorbing the silicon dioxide solution until the calcium silicate board is saturated, and drying the dipped calcium silicate board; and carrying out sizing hardening on any surface of the modified calcium silicate board to obtain the calcium silicate board, so as to enable the triamine impregnated paper to be directly laminated with the calcium silicate board in a hot-pressing manner, and enable the surface bonding strength to reach 1 MPa; wood veneers, fireproof plates and other materials are subjected to coldbonding, the peeling strength of the product meets the requirements, and the practicability of the calcium silicate board is effectively improved.