Patent classifications
C
CHEMISTRY; METALLURGY
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C07
ORGANIC CHEMISTRY
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C07C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
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219/00
Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton
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C07C219/02
having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
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C07C219/02

Resist composition and patterning process
10126647 · 2018-11-13 · ·

A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.

Resist composition and patterning process
10126647 · 2018-11-13 · ·

A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.

RESIST COMPOSITION AND PATTERNING PROCESS
20170075217 · 2017-03-16 · ·

A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.