An eribulin salt formed by combining an eribulin free base with a low molecular weight amine compound through a diacid compound is disclosed. As the diacid compound, edisylic acid, 1,5-naphthalenedisulfonic acid, trans-2-butene-1,4-dicarboxylic acid, pyrophosphoric acid, and combination thereof may be employed. As the amine, ammonia, cyclohexylamine, dicyclohexylamine, and a combination thereof may be employed. The eribulin salt can be crystallized by recrystallization to produce a crystalline eribulin salt with increased purity.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): ##STR00001##
wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): ##STR00001##
wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

The presently claimed invention is directed to 2,2,6-trimethyl-4,5-dihydro-3H-oxepine and its use to impart an aroma impression to a composition. The presently claimed invention also relates to a method of imparting such an aroma impression. The presently claimed invention is further directed to compositions comprising 2,2,6-trimethyl-4,5-dihydro-3H-oxepine and at least one aroma chemical as well as to compositions comprising 2,2,6-trimethyl-4,5-dihydro-3H-oxepine and at least one further component selected from the group consisting of aroma chemicals, surfactants, oil components, antioxidants, deodorant-active agents and solvents.

The presently claimed invention is directed to 2,2,6-trimethyl-4,5-dihydro-3H-oxepine and its use to impart an aroma impression to a composition. The presently claimed invention also relates to a method of imparting such an aroma impression. The presently claimed invention is further directed to compositions comprising 2,2,6-trimethyl-4,5-dihydro-3H-oxepine and at least one aroma chemical as well as to compositions comprising 2,2,6-trimethyl-4,5-dihydro-3H-oxepine and at least one further component selected from the group consisting of aroma chemicals, surfactants, oil components, antioxidants, deodorant-active agents and solvents.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I):

##STR00001##

wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

A process comprising: (a) distilling a melt comprising crude alkanesulfonic acid to completely or partly remove low boilers, wherein the low boilers are drawn off at the top of a distillation column or of a one-stage evaporation apparatus and a material stream comprising alkanesulfonic acid, high boilers and residual low boilers is withdrawn at the bottom of the distillation column or of the one-stage evaporation apparatus, (b) sending the stream comprising alkanesulfonic acid, high boilers and residual low boilers into a melt crystallization as the starting melt to obtain crystals formed from the alkanesulfonic acid, hydrates of the alkanesulfonic acid or a mixture of both suspended in mother liquor, (c) performing a solid-liquid separation to remove the crystals from the mother liquor, and (d) optionally washing the crystals to remove mother liquor adhering to the crystals.

A process comprising: (a) distilling a melt comprising crude alkanesulfonic acid to completely or partly remove low boilers, wherein the low boilers are drawn off at the top of a distillation column or of a one-stage evaporation apparatus and a material stream comprising alkanesulfonic acid, high boilers and residual low boilers is withdrawn at the bottom of the distillation column or of the one-stage evaporation apparatus, (b) sending the stream comprising alkanesulfonic acid, high boilers and residual low boilers into a melt crystallization as the starting melt to obtain crystals formed from the alkanesulfonic acid, hydrates of the alkanesulfonic acid or a mixture of both suspended in mother liquor, (c) performing a solid-liquid separation to remove the crystals from the mother liquor, and (d) optionally washing the crystals to remove mother liquor adhering to the crystals.

The present invention relates to a method for labelling fluorine-18, which is a radioisotope, and more specifically, to a method for labelling a [.sup.18F]fluoride in a method for preparing an organic [.sup.18F]fluoro compound by reacting an alkyl halide or an alkyl sulfonate with a [.sup.18F]fluoride, wherein a [.sup.18F]fluoride supported on a quaternary alkyl ammonium polymer support is eluted using a solution containing a metal salt or a quaternary ammonium salt with an adjusted pH, and a base is not additionally used. The present invention enables a labeling reaction without an additional base after precisely reflecting the concentration of a base absolutely necessary for the nucleophilic substitution of a [.sup.18F]fluoride or eluting a [.sup.18F]fluoride using a [.sup.18F]fluoride eluent with an adjusted pH, thereby stably obtaining a [.sup.18F]fluoride-labelled compound in a high yield, and is thus useful for production of fluorine-18-labelled radioactive medical supplies.

The present invention relates to a method for labelling fluorine-18, which is a radioisotope, and more specifically, to a method for labelling a [.sup.18F]fluoride in a method for preparing an organic [.sup.18F]fluoro compound by reacting an alkyl halide or an alkyl sulfonate with a [.sup.18F]fluoride, wherein a [.sup.18F]fluoride supported on a quaternary alkyl ammonium polymer support is eluted using a solution containing a metal salt or a quaternary ammonium salt with an adjusted pH, and a base is not additionally used. The present invention enables a labeling reaction without an additional base after precisely reflecting the concentration of a base absolutely necessary for the nucleophilic substitution of a [.sup.18F]fluoride or eluting a [.sup.18F]fluoride using a [.sup.18F]fluoride eluent with an adjusted pH, thereby stably obtaining a [.sup.18F]fluoride-labelled compound in a high yield, and is thus useful for production of fluorine-18-labelled radioactive medical supplies.