A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of

##STR00001##

The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.

A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of

##STR00001##

The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.

Described are colour developers of formula (I)

Ar.sup.1—NH—CO—NH—C.sub.6H.sub.4—SO.sub.2—O—C.sub.6H.sub.4—NH—CO—NH—Ar.sup.2   (I),

a heat-sensitive recording material comprising a carrier substrate and also a heat-sensitive, colour-forming layer containing at least one colour former and at least one phenol-free colour developer, wherein the at least one colour developer is the compound of formula (I), and a method for producing this heat-sensitive recording material.

A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of ##STR00001##
The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.

A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of ##STR00001##
The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.

The present invention relates to an N,N′-diurea derivative represented by the following general formula (1) and a method for producing the same. In addition, the present invention relates to a thermosensitive recording material in which a thermosensitive recording layer including a basic dye which is colorless or lightly colored at room temperature and a developer capable of developing color upon contact with the basic dye by heating is provided on a base sheet, wherein the developer is the N,N′-diurea derivative represented by the following general formula (1):

##STR00001##

(wherein R2 is an alkyl group, an aralkyl group, or an aryl group; and A1 is a hydrogen atom or an alkyl group).

The present invention relates to an N,N′-diurea derivative represented by the following general formula (1) and a method for producing the same. In addition, the present invention relates to a thermosensitive recording material in which a thermosensitive recording layer including a basic dye which is colorless or lightly colored at room temperature and a developer capable of developing color upon contact with the basic dye by heating is provided on a base sheet, wherein the developer is the N,N′-diurea derivative represented by the following general formula (1):

##STR00001##

(wherein R2 is an alkyl group, an aralkyl group, or an aryl group; and A1 is a hydrogen atom or an alkyl group).

Thermotropic ionic liquid crystal molecules, comprising a so-called rigid part, a so-called flexible part bonded covalently, directly or via a spacer, to said rigid part, and one or more ionic groups bonded covalently to said rigid part. Said molecules can be used as electrolytes in an electrochemical device, in particular a lithium-ion battery.

Thermotropic ionic liquid crystal molecules, comprising a so-called rigid part, a so-called flexible part bonded covalently, directly or via a spacer, to said rigid part, and one or more ionic groups bonded covalently to said rigid part. Said molecules can be used as electrolytes in an electrochemical device, in particular a lithium-ion battery.

The present disclosure provides compositions that inhibit the SH2-containing inositol 5-phosphatase (SHIP), as well as methods using such compositions for use in treating or ameliorating the effects of a medical condition in a subject.