C07C311/49

COMPOUND AS A UBR BOX DOMAIN LIGAND

The present specification relates to a compound as a UBR box domain ligand. The present specification provides a small molecule compound that binds to the UBR box domain. Further, the present specification provides a composition for inhibiting UBR box domain substrate binding, including a ligand compound that binds to a UBR box domain, a pharmaceutical composition for treating UBR-related disease, and a use thereof.

COMPOUND AS A UBR BOX DOMAIN LIGAND

The present specification relates to a compound as a UBR box domain ligand. The present specification provides a small molecule compound that binds to the UBR box domain. Further, the present specification provides a composition for inhibiting UBR box domain substrate binding, including a ligand compound that binds to a UBR box domain, a pharmaceutical composition for treating UBR-related disease, and a use thereof.

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
20170299963 · 2017-10-19 · ·

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.

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MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
20170299963 · 2017-10-19 · ·

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.

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Onium salt, negative resist composition, and resist pattern forming process

A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER. ##STR00001##

COMPOUNDS CONTAINING A SULFONIC GROUP AS KAT INHIBITORS
20220267260 · 2022-08-25 ·

The present invention provides compounds, pharmaceutically acceptable compositions thereof, and methods of using the same.

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COMPOUNDS CONTAINING A SULFONIC GROUP AS KAT INHIBITORS
20220267260 · 2022-08-25 ·

The present invention provides compounds, pharmaceutically acceptable compositions thereof, and methods of using the same.

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Plasminogen activator inhibitor-1 inhibitors and methods of use thereof

The invention relates to plasminogen activator-1 (PAI-1) inhibitor compounds and uses thereof in the treatment of any disease or disorder associated with elevated PAI-1. The invention includes, but is not limited to, the use of such compounds to prevent or reduce thrombosis and fibrosis, to promote thrombolysis, and to modulate lipid metabolism and treat diseases or disorders associated with elevated PAI-1, cholesterol, or lipid levels.

Plasminogen activator inhibitor-1 inhibitors and methods of use thereof

The invention relates to plasminogen activator-1 (PAI-1) inhibitor compounds and uses thereof in the treatment of any disease or disorder associated with elevated PAI-1. The invention includes, but is not limited to, the use of such compounds to prevent or reduce thrombosis and fibrosis, to promote thrombolysis, and to modulate lipid metabolism and treat diseases or disorders associated with elevated PAI-1, cholesterol, or lipid levels.

Sulfone sulfonylimide combinations for advanced battery chemistries

Disclosed is an electrochemical cell, which may be used for advanced rechargeable batteries. The electrochemical cell comprises two or more electrodes within an electrolyte solution, where the electrolyte solution containing (i) an aliphatic or cyclic sulfone and (ii) a metal perfluoroalkylsulfonylimide salt.