A positive resist composition is provided comprising (A) a specific sulfonium salt as quencher, (B) a sulfonium salt consisting of a fluorinated sulfonate anion and a sulfonium cation as acid generator, and (C) a base polymer comprising repeat units having an acid labile group. The resist composition has a high sensitivity and resolution, improved LWR or CDU, and a broad process window and forms a pattern of good profile after exposure.

A positive resist composition is provided comprising (A) a specific sulfonium salt as quencher, (B) a sulfonium salt consisting of a fluorinated sulfonate anion and a sulfonium cation as acid generator, and (C) a base polymer comprising repeat units having an acid labile group. The resist composition has a high sensitivity and resolution, improved LWR or CDU, and a broad process window and forms a pattern of good profile after exposure.

The disclosure provides crystalline forms for certain synthetic intermediates for making belzutifan, a HIF-2α inhibitor, useful for the treatment of cancer. The disclosure also provides processes for isolating the crystalline forms.

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Compounds having a structure of formula (I), (I-A), (Ia)-(Ie), (A)-(E), and (II) or a pharmaceutically acceptable salt, tautomer or stereoisomer thereof are provided. Uses of such compounds for modulating androgen receptor activity, imaging diagnostics in cancer and therapeutics, and methods for treatment of disorders including prostate cancer are also provided.

Compounds having a structure of formula (I), (I-A), (Ia)-(Ie), (A)-(E), and (II) or a pharmaceutically acceptable salt, tautomer or stereoisomer thereof are provided. Uses of such compounds for modulating androgen receptor activity, imaging diagnostics in cancer and therapeutics, and methods for treatment of disorders including prostate cancer are also provided.

The present disclosure provides inhibitors of microorganisms including viruses and fungi of the formula (I) or (II) wherein the variables are defined herein. Also provided are methods of treatment using these agents in the treatment of infections of microorganisms such as viruses and fungi.

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The present disclosure provides inhibitors of microorganisms including viruses and fungi of the formula (I) or (II) wherein the variables are defined herein. Also provided are methods of treatment using these agents in the treatment of infections of microorganisms such as viruses and fungi.

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Described herein are compounds of formula (I) that are able to provide a long-lasting or substantive odor, in particular floral and/or fruity odor, to the environment. Also described herein is a method of imparting a long-lasting odor, in particular a fresh green, floral and/or fruity odor, to surfaces, such as hard surfaces, fabric, skin or hair. Also described herein are a method of using said compounds in perfumery and perfuming compositions or perfumed articles including the compounds described herein.

Described herein are compounds of formula (I) that are able to provide a long-lasting or substantive odor, in particular floral and/or fruity odor, to the environment. Also described herein is a method of imparting a long-lasting odor, in particular a fresh green, floral and/or fruity odor, to surfaces, such as hard surfaces, fabric, skin or hair. Also described herein are a method of using said compounds in perfumery and perfuming compositions or perfumed articles including the compounds described herein.

An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (I). In General Formula (I), R.sub.a and R.sub.b each independently represent a hydrogen atom or a substituent, provided that R.sub.a and R.sub.b satisfy the following requirement (1) or (2): (1) at least one of R.sub.a or R.sub.b represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, and R.sub.a and R.sub.b may be bonded to each other to form a ring, and (2) R.sub.a and R.sub.b are bonded to each other to form a ring, R.sub.c represents a substituent, L.sub.0 represents a single bond or a divalent linking group, L.sub.1 represents a single bond or a divalent linking group, L.sub.2 represents a single bond or a divalent linking group, nM.sup.+ represents an organic cationic moiety, and n represents an integer of 1 or more.